Inverse design for phase mask lithography.
We have developed a method for designing the diffractive optics used in phase mask lithography. Genetic algorithms were used to inverse-design a grating's relief profile and associated exposure conditions so that desired periodic structures are formed. An experimentally promising grating designed to produce helices is demonstrated.
Rinne
James W
JW
Department of Materials Science and Engineering and the Beckman Institute for Advanced Science and Technology, University of Illinois, Urbana, Illinois 61801, USA.
Gupta
Sidhartha
S
Wiltzius
Pierre
P
D003198:Computer Simulation; D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008962:Models, Theoretical; D010781:Photography / Q000379:methods*; D012031:Refractometry / Q000295:instrumentation* / Q000379:methods*