Subwavelength imaging with anisotropic structure comprising alternately layered metal and dielectric films.
Subwavelength imaging can be obtained with alternately layered metallodielectric films structure, even when the permittivity of metal and dielectric are not matched. This occurs as the effective transversal permittivity tends to be zero or the vertical one approaches infinity, depending on the permittivity value of the utilized dielectric and metal material. Evanescent waves can be amplified through the structure, but not in a manner of fully compensating the exponentially decaying property in dielectric. Numerical illustration of subwavelength imaging is presented for variant configuration of anisotropic permittivity with finite layer number of metallodielectric films.
State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O.box 350, Chengdu 610209, China.
Changtao
C
Wang
Yanhui
Y
Zhao
Dachun
D
Gan
Chunlei
C
Du
Xiangang
X
Luo
D000465:Algorithms; D016880:Anisotropy; D003198:Computer Simulation; D008567:Membranes, Artificial; D008670:Metals / Q000737:chemistry*; D008962:Models, Theoretical; D012031:Refractometry / Q000379:methods*; D020349:Surface Plasmon Resonance / Q000379:methods*; D013499:Surface Properties
D008567:Membranes, Artificial; D008670:Metals