Design of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials by genetic algorithm.
Designs of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials are optimized using a genetic algorithm. Co-sputtered and low-refractive-index materials allow the fine-tuning of refractive index, which is required to achieve optimum anti-reflection characteristics. The algorithm minimizes reflection over a wide range of wavelengths and incident angles, and includes material dispersion. Designs of antireflection coatings for silicon-based image sensors and solar cells, as well as triple-junction GaInP/GaAs/Ge solar cells are presented, and are shown to have significant performance advantages over conventional coatings. Nano-porous low-refractive-index layers are found to comprise generally half of the layers in an optimized antireflection coating, which underscores the importance of nano-porous layers for high-performance broadband and omnidirectional antireflection coatings.
Future Chips Constellation, Rensselaer Polytechnic Institute, Troy, NY 12180, USA.
Martin F
MF
Schubert
Frank W
FW
Mont
Sameer
S
Chhajed
David J
DJ
Poxson
Jong Kyu
JK
Kim
E Fred
EF
Schubert
D000465:Algorithms; D003198:Computer Simulation; D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008422:Materials Testing; D008957:Models, Genetic; D008962:Models, Theoretical; D055095:Optics and Photonics / Q000295:instrumentation*; D012031:Refractometry / Q000295:instrumentation* / Q000379:methods*