Inverse design for phase mask lithography.
We have developed a method for designing the diffractive optics used in phase mask lithography. Genetic algorithms were used to inverse-design a grating's relief profile and associated exposure conditions so that desired periodic structures are formed. An experimentally promising grating designed to produce helices is demonstrated.
Department of Materials Science and Engineering and the Beckman Institute for Advanced Science and Technology, University of Illinois, Urbana, Illinois 61801, USA.
James W
JW
Rinne
Sidhartha
S
Gupta
Pierre
P
Wiltzius
D003198:Computer Simulation; D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008962:Models, Theoretical; D010781:Photography / Q000379:methods*; D012031:Refractometry / Q000295:instrumentation* / Q000379:methods*