High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets.
In this paper we report the development of nanosecond-pulsed fiber laser technology for the next generation EUV lithography sources. The demonstrated fiber laser system incorporates large core fibers and arbitrary optical waveform generation, which enables achieving optimum intensities and other critical beam characteristics on a laser-plasma target. Experiment demonstrates efficient EUV generation with conversion efficiency of up to 2.07% for in-band 13.5-nm radiation using mass-limited Sn-doped droplet targets. This result opens a new technological path towards fiber laser based high power EUV sources for high-throughput lithography steppers.
Hou
Kai-Chung
KC
Center for Ultrafast Optical Science, University of Michigan, 2200 Bonisteel Boulevard, Ann Arbor, Michigan 48109, USA. kchou@umich.edu
George
Simi
S
Mordovanakis
Aghapi G
AG
Takenoshita
Kazutoshi
K
Nees
John
J
Lafontaine
Bruno
B
Richardson
Martin
M
Galvanauskas
Almantas
A
D005336:Fiber Optic Technology / Q000295:instrumentation*; D007834:Lasers; D010781:Photography / Q000295:instrumentation* / Q000379:methods; D014001:Tin / Q000737:chemistry*; D014867:Water / Q000737:chemistry*; D015018:Ytterbium / Q000737:chemistry*
D014867:Water; D014001:Tin; D015018:Ytterbium