Polarization selective electro-optic polymer waveguide devices by direct electron beam writing.
A novel technique for the fabrication of polarization selective electro-optic polymer waveguide devices with direct electron beam writing was described. Birefringence induced by the electric field poling in the electro-optic polymer film was erased in the electron beam exposed regions. The formed waveguides had stronger confinement for the light polarized along the poling direction. High fabrication resolution on the 100 nm scale or smaller could be achieved. Fabrication of polymer polarizer and polarization selective microring resonators with this technique was reported. The highest polarization extinction ratio was measured to be 21.4 dB.
Department of Electrical Engineering, University of Washington, Seattle, Washington 98195, USA.
Haishan
H
Sun
Antao
A
Chen
Benjamin C
BC
Olbricht
Joshua A
JA
Davies
Philip A
PA
Sullivan
Yi
Y
Liao
Zhengwei
Z
Shi
Jingdong
J
Luo
Alex K
AK
Jen
Larry R
LR
Dalton
D001718:Birefringence; D003198:Computer Simulation; D004574:Electromagnetic Fields; D004581:Electronics / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008027:Light; D008962:Models, Theoretical; D055095:Optics and Photonics / Q000295:instrumentation*; D011108:Polymers / Q000737:chemistry* / Q000528:radiation effects; D012031:Refractometry / Q000295:instrumentation*; D012542:Scattering, Radiation
D011108:Polymers