Polarization selective electro-optic polymer waveguide devices by direct electron beam writing.
A novel technique for the fabrication of polarization selective electro-optic polymer waveguide devices with direct electron beam writing was described. Birefringence induced by the electric field poling in the electro-optic polymer film was erased in the electron beam exposed regions. The formed waveguides had stronger confinement for the light polarized along the poling direction. High fabrication resolution on the 100 nm scale or smaller could be achieved. Fabrication of polymer polarizer and polarization selective microring resonators with this technique was reported. The highest polarization extinction ratio was measured to be 21.4 dB.
Sun
Haishan
H
Department of Electrical Engineering, University of Washington, Seattle, Washington 98195, USA.
Chen
Antao
A
Olbricht
Benjamin C
BC
Davies
Joshua A
JA
Sullivan
Philip A
PA
Liao
Yi
Y
Shi
Zhengwei
Z
Luo
Jingdong
J
Jen
Alex K
AK
Dalton
Larry R
LR
D001718:Birefringence; D003198:Computer Simulation; D004574:Electromagnetic Fields; D004581:Electronics / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008027:Light; D008962:Models, Theoretical; D055095:Optics and Photonics / Q000295:instrumentation*; D011108:Polymers / Q000737:chemistry* / Q000528:radiation effects; D012031:Refractometry / Q000295:instrumentation*; D012542:Scattering, Radiation
D011108:Polymers