Elucidating the role of surface hydrolysis in preparing organosilane nanostructures via particle lithography.
A new method of particle lithography is described for preparing rings or nanoporous films of organosilanes. Millions of exquisitely uniform and precisely spaced nanostructures with designed surface chemistry can be rapidly produced using vapor deposition through mesoparticle masks. Nanoscopic amounts of water are essential for initiating surface hydrosilation. Thus, the key step for preparing covalently bonded nanostructures of organosilanes is to control drying parameters to spatially direct the placement of water on surfaces.
Department of Chemistry and the Center for BioModular Multi-Scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, USA.
Jie-Ren
JR
Li
Jayne C
JC
Garno
D000588:Amines / Q000737:chemistry; D006868:Hydrolysis; D018625:Microscopy, Atomic Force; D008958:Models, Molecular; D015394:Molecular Structure; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D010316:Particle Size; D012821:Silanes / Q000737:chemistry*; D013499:Surface Properties
D000588:Amines; D012821:Silanes