Direct electron beam writing of electro-optic polymer microring resonators.
Electro-optic polymer waveguides in electron beam sensitive polymethyl methacrylate (PMMA) polymer matrix doped with organic nonlinear chromophores could be directly patterned by electron beam exposure with high resolution and smoothness. The polymer in the exposed regions was removed with standard electron beam resist developer and without damaging the chromophore containing polymer waveguides. Feature sizes on the order of 100 nm could be clearly resolved. High quality microring resonators made of YL124/PMMA electro-optic polymer were successfully fabricated with this technique. The measured resonance extinction ratios were more than 16 dB and quality factors were in the range of 10(3) approximately 10(4).
Department of Electrical Engineering, University of Washington, Seattle, Washington 98195, USA.
Haishan
H
Sun
Antao
A
Chen
Benjamin C
BC
Olbricht
Joshua A
JA
Davies
Philip A
PA
Sullivan
Yi
Y
Liao
Larry R
LR
Dalton
D004583:Electrons; D055095:Optics and Photonics / Q000295:instrumentation*; D011108:Polymers / Q000737:chemistry*; D013057:Spectrum Analysis
D011108:Polymers