The effects of oxygen content on bonding configurations and properties of low-k organosilicate glass dielectric films.
The low dielectric constant SiOC:H films of plasma enhanced chemical vapor deposition method have been developed with various precursor ratio. The reduction of the dielectric constant has been achieved by increasing the porosity in the films through the change of precursor ratio. In order to clarify the relation between dielectric constant and film porosity, the small angle X-ray scattering technique has been applied for characterizing pore size in the porous low-k dielectric films. The effects of the oxygen on the bonding configuration and electrical properties were investigated by adjusting TMS/O2 gas ratios. The porous SiOC:H film displays the small pore sizes and lower dielectric constant. It is found that the pore size of SiOC:H film is significant smaller than 1 nm and the pore size attributed to Si-O-Si cage structure change.
Department of Materials Science and Engineering, National Cheng Kung University, Tainan, Taiwan.
Sheng-Wen
SW
Chen
Chuan-Pu
CP
Liu
Shiu-Ko
SK
JangJian
Ying-Lang
YL
Wang