Effects of process conditions on the synthesis and microstructure of nano-scale metal-containing amorphous carbon thin films.
Thin films of metal-containing amorphous carbon (a-C:Me) were deposited on a number of substrates, including silicon, Pt coated silicon, carbon coated silicon, polymer, and glass. The deposition was performed in a dc reactive sputter deposition system equipped with one single magnetron gun. The gases used were various mixtures of CH4 + Ar. The gas mixture was admitted to the deposition chamber at constant flow rate and ratio. Self-assembled alternating layer structure was observed under certain deposition conditions. Correlation between the self-assembled alternating layer structure and deposition parameters is presented and discussed. The role of carbon energy in the segregation of metal and carbon to form the layer structure is addressed.
Department of Materials Science and Engineering, National Cheng Kung University, 701 Tainan, Taiwan.
Wan-Yu
WY
Wu
Jyh-Ming
JM
Ting