Polyethylene glycol as a novel resist and sacrificial material for generating positive and negative nanostructures.
Sanedrin
Raymond G
RG
Department of Chemistry and International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208-3113, USA.
Huang
Ling
L
Jang
Jae-Won
JW
Kakkassery
Joseph
J
Mirkin
Chad A
CA
D000097:Acetonitriles / Q000737:chemistry; D004867:Equipment Design; D008422:Materials Testing; D018625:Microscopy, Atomic Force / Q000379:methods; D008855:Microscopy, Electron, Scanning; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000295:instrumentation* / Q000379:methods*; D011092:Polyethylene Glycols / Q000737:chemistry; D011108:Polymers / Q000737:chemistry; D014867:Water / Q000737:chemistry
D000097:Acetonitriles; D011108:Polymers; D014867:Water; D011092:Polyethylene Glycols; C032159:acetonitrile