title: Elaboration and characterization of barium silicate thin films.
abstract: Room temperature depositions of barium on a thermal silicon oxide layer were performed in ultra high vacuum (UHV). In-situ X-ray photoelectron spectroscopy (XPS) analyses were carried out as well after exposure to air as after subsequent annealings. These analyses were ex-situ completed by secondary ion mass spectrometry (SIMS) profiles and transmission electron microscopy (TEM) cross-sectional images. The results showed that after air exposure, the barium went carbonated. Annealing at sufficient temperature permitted to decompose the carbonate to benefit of a barium silicate. The silicate layer was formed by interdiffusion of barium with the initial SiO2 layer.
authors.affiliation: ICB, UMR 5209 CNRS-Université de Bourgogne, BP 47870, F-21078 Dijon, France. thomas.geneves@u-bourgogne.fr
authors.forename: T
authors.initials: T
authors.lastname: Genevès
authors.forename: B
authors.initials: B
authors.lastname: Domenichini
authors.forename: L
authors.initials: L
authors.lastname: Imhoff
authors.forename: V
authors.initials: V
authors.lastname: Potin
authors.forename: O
authors.initials: O
authors.lastname: Heintz
authors.forename: P M
authors.initials: PM
authors.lastname: Peterlé
authors.forename: S
authors.initials: S
authors.lastname: Bourgeois