title: On the calibration process of film dosimetry: OLS inverse regression versus WLS inverse prediction.
abstract: The purpose of this study was both putting forward a statistically correct model for film calibration and the optimization of this process. A reliable calibration is needed in order to perform accurate reference dosimetry with radiographic (Gafchromic) film. Sometimes, an ordinary least squares simple linear (in the parameters) regression is applied to the dose-optical-density (OD) curve with the dose as a function of OD (inverse regression) or sometimes OD as a function of dose (inverse prediction). The application of a simple linear regression fit is an invalid method because heteroscedasticity of the data is not taken into account. This could lead to erroneous results originating from the calibration process itself and thus to a lower accuracy. In this work, we compare the ordinary least squares (OLS) inverse regression method with the correct weighted least squares (WLS) inverse prediction method to create calibration curves. We found that the OLS inverse regression method could lead to a prediction bias of up to 7.3 cGy at 300 cGy and total prediction errors of 3% or more for Gafchromic EBT film. Application of the WLS inverse prediction method resulted in a maximum prediction bias of 1.4 cGy and total prediction errors below 2% in a 0-400 cGy range. We developed a Monte-Carlo-based process to optimize calibrations, depending on the needs of the experiment. This type of thorough analysis can lead to a higher accuracy for film dosimetry.
authors.affiliation: Department of Medical Physics, Ghent University, Proeftuinstraat 86, B-9000 Gent, Belgium. Frederik.Crop@ugent.be
authors.forename: F
authors.initials: F
authors.lastname: Crop
authors.forename: B
authors.initials: B
authors.lastname: Van Rompaye
authors.forename: L
authors.initials: L
authors.lastname: Paelinck
authors.forename: L
authors.initials: L
authors.lastname: Vakaet
authors.forename: H
authors.initials: H
authors.lastname: Thierens
authors.forename: C
authors.initials: C
authors.lastname: De Wagter
mesh_terms: D016477:Artifacts; D002138:Calibration; D005373:Film Dosimetry / Q000379:methods*; D016018:Least-Squares Analysis; D012044:Regression Analysis; D012680:Sensitivity and Specificity; D016526:Workload