title: Electron beam lithography-assisted fabrication of Au nano-dot array as a substrate of a correlated AFM and confocal Raman spectroscopy.
abstract: This paper documents a study of an Au nano-dot array that was fabricated by electron beam lithography on a glass wafer. The patterns that had features of 100 nm dots in diameter with a 2-mum pitch comprised a total area of 200 x 200 microm(2). The dot-shaped Cr underlayer was open to the air after developing Poly(methyl methacrylate) (PMMA). When dipped into the Cr etchant, the exposed Cr layer was eliminated from the glass wafer in a short period of time. In order to ultimately fabricate the Ti/Au dot arrays, Ti and Au were deposited onto the arrays with a thickness of 2 and 40 nm, respectively. The lift-off procedure was carried out in the Cr etchant using sonication in order to completely remove the residual Cr/PMMA layer. The fabricated Au nano-dot array was then immersed in an Ag enhancing solution and then into an ethanol solution containing (N-(6-(Biotinamido)hexyl)-3'-(2'-pyridyldithio)-propionamide (Biotin-HPDP). The substrate was analyzed using a correlated atomic force microscopy (AFM) and confocal Raman spectroscopy. Through this procedure, position-dependent surface-enhanced Raman spectroscopy (SERS) signals could be obtained.
authors.affiliation: Korea Institute of Machinery and Materials, 171 Jang-dong Yusung-ku, DaeJeon, 305-600, Republic of Korea.
authors.forename: Seung Woo
authors.initials: SW
authors.lastname: Lee
authors.forename: Yong-Beom
authors.initials: YB
authors.lastname: Shin
authors.forename: Ki Seok
authors.initials: KS
authors.lastname: Jeon
authors.forename: Seung Min
authors.initials: SM
authors.lastname: Jin
authors.forename: Yung Doug
authors.initials: YD
authors.lastname: Suh
authors.forename: Sanghyo
authors.initials: S
authors.lastname: Kim
authors.forename: Jae Jong
authors.initials: JJ
authors.lastname: Lee
authors.forename: Min-Gon
authors.initials: MG
authors.lastname: Kim