Elaboration and characterization of barium silicate thin films.
Room temperature depositions of barium on a thermal silicon oxide layer were performed in ultra high vacuum (UHV). In-situ X-ray photoelectron spectroscopy (XPS) analyses were carried out as well after exposure to air as after subsequent annealings. These analyses were ex-situ completed by secondary ion mass spectrometry (SIMS) profiles and transmission electron microscopy (TEM) cross-sectional images. The results showed that after air exposure, the barium went carbonated. Annealing at sufficient temperature permitted to decompose the carbonate to benefit of a barium silicate. The silicate layer was formed by interdiffusion of barium with the initial SiO2 layer.
Genevès
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ICB, UMR 5209 CNRS-Université de Bourgogne, BP 47870, F-21078 Dijon, France. thomas.geneves@u-bourgogne.fr
Domenichini
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Imhoff
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Potin
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Heintz
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Peterlé
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Bourgeois
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