title: Extreme-ultraviolet-induced oxidation of Mo/Si multilayers.
abstract: The extreme-ultraviolet (EUV)-induced oxidation of Mo/Si multilayer mirrors was characterized by several methods: EUV reflectivity, x-ray photoelectron spectroscopy, small-angle x-ray reflectometry, atomic force microscopy, and EUV scattering measurements. Based on the results of the different investigation techniques, an oxidation model was developed to explain the degradation of the mirrors under EUV radiation.
authors.affiliation: Fraunhofer-Institut für Angewandte Optik und Feinmechanik, Jena, Germany.
authors.forename: Nicolas
authors.initials: N
authors.lastname: Benoit
authors.forename: Sven
authors.initials: S
authors.lastname: Schröder
authors.forename: Sergiy
authors.initials: S
authors.lastname: Yulin
authors.forename: Torsten
authors.initials: T
authors.lastname: Feigl
authors.forename: Angela
authors.initials: A
authors.lastname: Duparré
authors.forename: Norbert
authors.initials: N
authors.lastname: Kaiser
authors.forename: Andreas
authors.initials: A
authors.lastname: Tünnermann