Extreme-ultraviolet-induced oxidation of Mo/Si multilayers.
The extreme-ultraviolet (EUV)-induced oxidation of Mo/Si multilayer mirrors was characterized by several methods: EUV reflectivity, x-ray photoelectron spectroscopy, small-angle x-ray reflectometry, atomic force microscopy, and EUV scattering measurements. Based on the results of the different investigation techniques, an oxidation model was developed to explain the degradation of the mirrors under EUV radiation.
Benoit
Nicolas
N
Fraunhofer-Institut für Angewandte Optik und Feinmechanik, Jena, Germany.
Schröder
Sven
S
Yulin
Sergiy
S
Feigl
Torsten
T
Duparré
Angela
A
Kaiser
Norbert
N
Tünnermann
Andreas
A