Enhancement effect of water activity on enzymatic synthesis of cephalexin.
The effect of water activity (a(w)) of the reaction medium on the enzymatic synthesis of cephalexin (CEX) from 7-amino-3-deacetoxycephalosporanic acid (7-ADCA) and D-alpha-phenylglycine methyl ester (PGM) was investigated using the alpha-amino acid ester hydrolase enzyme from Xanthomonas citri. It was found that the synthetic activity of the enzyme and the conversion yield were markedly improved when the a(w) of the reaction medium was lowered to about 0.97. The water activity depressing agents evaluated were glycerol, sucrose, and sorbitol, and the conversion yields were improved up to 170% with 15% glycerol, 230% with 30% sucrose, and 270% with 20% sorbitol, respectively. The extent of favorable effect of a(w) on the conversion yield was not the same among the a(w) depressors, probably due to other unknown interactions between the enzyme and depressors. However, optimal a(w) values corresponding to the maximum conversion yield coincided for all a(w) depressors used. The conversion yield of CEX showed an increasing trend with increasing a(w) up to the optimal a(w) value (0.96-0.97) which corresponds to the maximum conversion yield and a decreasing trend beyond the optimal a(w). There appears to be a delicate balance between the hydrolytic reaction of PGM and synthetic reaction of CEX. The increasing a(w)-[E . PGM] complex and the branched reaction pathway fluxes from [E . PGM] to PG (D-alpha-phenyl glycine) and CEX are balanced in such a way that the maximum CEX conversion yield is obtained at a(w) value of 0.96-0.97. The a(w) depressors stabilized the enzyme somewhat, but this positive effect was considered to be only a minor contribution to the substantial yield enhancement. The a(w) depressor effect on viscosity and in turn the mass transfer rate limitation was ruled out since the change in conversion due to the viscosity change was found to be insignificant.
Hyun
C K
CK
Department of Biotechnology, Korea Advanced Institute of Science and Technology, Taejon 305-606, Korea.
Kim
J H
JH
Ryu
D D
DD