title: A practical, self-catalytic, atomic layer deposition of silicon dioxide.
authors.affiliation: Institute of Applied Physics, Hamburg University, Jungiusstrasse 11, 20355 Hamburg, Germany. julien.bachmann@physik.uni-hamburg.de
authors.forename: Julien
authors.initials: J
authors.lastname: Bachmann
authors.forename: Robert
authors.initials: R
authors.lastname: Zierold
authors.forename: Yuen Tung
authors.initials: YT
authors.lastname: Chong
authors.forename: Roland
authors.initials: R
authors.lastname: Hauert
authors.forename: Chris
authors.initials: C
authors.lastname: Sturm
authors.forename: Rüdiger
authors.initials: R
authors.lastname: Schmidt-Grund
authors.forename: Bernd
authors.initials: B
authors.lastname: Rheinländer
authors.forename: Marius
authors.initials: M
authors.lastname: Grundmann
authors.forename: Ulrich
authors.initials: U
authors.lastname: Gösele
authors.forename: Kornelius
authors.initials: K
authors.lastname: Nielsch