title: Silane nanopatterns via gas-phase soft lithography.
authors.affiliation: Departamento de Micro- y Nanosistemas, Instituto de Microelectrónica de Barcelona (CNM-IMB, CSIC), Campus UAB 08193, Bellaterra, Barcelona. roberto.delarica@gmail.com
authors.forename: Roberto
authors.initials: R
authors.lastname: de la Rica
authors.forename: Antonio
authors.initials: A
authors.lastname: Baldi
authors.forename: Ernest
authors.initials: E
authors.lastname: Mendoza
authors.forename: Alvaro San
authors.initials: AS
authors.lastname: Paulo
authors.forename: Andreu
authors.initials: A
authors.lastname: Llobera
authors.forename: César
authors.initials: C
authors.lastname: Fernández-Sánchez
mesh_terms: D004058:Diffusion; D004129:Dimethylpolysiloxanes; D005740:Gases; D018625:Microscopy, Atomic Force; D036103:Nanotechnology; D017646:Organosilicon Compounds; D011437:Propylamines; D012821:Silanes; D013499:Surface Properties
chemical_list: D004129:Dimethylpolysiloxanes; D005740:Gases; D017646:Organosilicon Compounds; D011437:Propylamines; D012821:Silanes; C088294:3-aminopropyltrimethoxysilane; C013830:baysilon; C102833:(3-mercaptopropyl)trimethoxysilane