title: Adsorption kinetics of organophosphonic acids on plasma-modified oxide-covered aluminum surfaces.
abstract: Tailoring of oxide chemistry on aluminum by means of low-pressure water and argon plasma surface modification was performed to influence the kinetics of the self-assembly process of octadecylphosphonic acid monolayers. The plasma-induced surface chemistry was studied by in situ FTIR reflection-absorption spectroscopy (IRRAS). Ex situ IRRAS and X-ray photoelectron spectroscopy were applied for the analysis of the adsorbed self-assembled monolayers. The plasma-induced variation of the hydroxide to oxide ratio led to different adsorption kinetics of the phosphonic acid from dilute ethanol solutions as measured by means of a quartz crystal microbalance. Water plasma treatment caused a significant increase in the density of surface hydroxyl groups in comparison to that of the argon-plasma-treated surface. The hydroxyl-rich surface led to significantly accelerated adsorption kinetics of the phosphonic acid with a time of monolayer formation of less than 1 min. On the contrary, decreasing the surface hydroxyl density slowed the adsorption kinetics.
authors.affiliation: Department for Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Strasse 1, Düsseldorf, Germany.
authors.forename: M
authors.initials: M
authors.lastname: Giza
authors.forename: P
authors.initials: P
authors.lastname: Thissen
authors.forename: G
authors.initials: G
authors.lastname: Grundmeier