A practical, self-catalytic, atomic layer deposition of silicon dioxide.
Bachmann
Julien
J
Institute of Applied Physics, Hamburg University, Jungiusstrasse 11, 20355 Hamburg, Germany. julien.bachmann@physik.uni-hamburg.de
Zierold
Robert
R
Chong
Yuen Tung
YT
Hauert
Roland
R
Sturm
Chris
C
Schmidt-Grund
Rüdiger
R
Rheinländer
Bernd
B
Grundmann
Marius
M
Gösele
Ulrich
U
Nielsch
Kornelius
K