title: Photolithographic process for the patterning of quantum dots.
abstract: Recently, quantum dots have been used as molecular probes substituting for conventional organic fluorophores. Quantum dots are stable against photobleaching and have more controllable emission bands, broader absorption spectra, and higher quantum yields. In this study, an array of ZnS-coated CdSe quantum dots on a slide glass has been prepared by photolithographic method. The array pattern was prepared using a positive photoresist (AZ1518) and developer (AZ351). The patterned glass was silanized with 3-aminopropyltriethoxysilane (APTES), and carboxyl-coated quantum dots were selectively attached onto the array pattern. The silanization was examined by measuring contact angle and the surface of the array pattern was analyzed using AFM and fluorescent microscope.
authors.affiliation: Department of Chemical and Bioengineering, Kyungwon University, Seongnam-si, Gyeonggi-Do 461-701, Republic of Korea.
authors.forename: Young Joo
authors.initials: YJ
authors.lastname: Na
authors.forename: Sang Joon
authors.initials: SJ
authors.lastname: Park
authors.forename: Sang Wha
authors.initials: SW
authors.lastname: Lee
authors.forename: Jong Sung
authors.initials: JS
authors.lastname: Kim