title: Intrinsic and extrinsic performance limits of graphene devices on SiO2.
abstract: The linear dispersion relation in graphene gives rise to a surprising prediction: the resistivity due to isotropic scatterers, such as white-noise disorder or phonons, is independent of carrier density, n. Here we show that electron-acoustic phonon scattering is indeed independent of n, and contributes only 30 Omega to graphene's room-temperature resistivity. At a technologically relevant carrier density of 1 x1012 cm-2, we infer a mean free path for electron-acoustic phonon scattering of >2 microm and an intrinsic mobility limit of 2 x 105 cm2 V-1 s-1. If realized, this mobility would exceed that of InSb, the inorganic semiconductor with the highest known mobility ( approximately 7.7 x 104 cm2 V-1 s-1; ref. 9) and that of semiconducting carbon nanotubes ( approximately 1 x 105 cm2 V-1 s-1; ref. 10). A strongly temperature-dependent resistivity contribution is observed above approximately 200 K (ref. 8); its magnitude, temperature dependence and carrier-density dependence are consistent with extrinsic scattering by surface phonons at the SiO2 substrate and limit the room-temperature mobility to approximately 4 x 104 cm2 V-1 s-1, indicating the importance of substrate choice for graphene devices.
authors.affiliation: Materials Research Science and Engineering Center, University of Maryland, College Park, Maryland 20742, USA.
authors.forename: Jian-Hao
authors.initials: JH
authors.lastname: Chen
authors.forename: Chaun
authors.initials: C
authors.lastname: Jang
authors.forename: Shudong
authors.initials: S
authors.lastname: Xiao
authors.forename: Masa
authors.initials: M
authors.lastname: Ishigami
authors.forename: Michael S
authors.initials: MS
authors.lastname: Fuhrer
mesh_terms: D000162:Acoustics; D002244:Carbon / Q000737:chemistry*; D003198:Computer Simulation; D008027:Light; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008956:Models, Chemical; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation* / Q000379:methods*; D010316:Particle Size; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D002244:Carbon; D012825:Silicon