title: Micro- and nanopatterned copper structures using directed self-assembly on templates fabricated from phase-separated mixed Langmuir-Blodgett films.
abstract: We report a versatile method to confine metal thin films in micro- and nanopatterns using directed self-assembly on the templates fabricated from phase-separated mixed Langmuir-Blodgett (LB) films. The pattern of the mixed LB films can be tuned by adjusting intermolecular interaction between the film-forming molecules in the LB films and by varying the fabrication conditions of the films such as the mixing ratio, subphase temperature, and surface pressure. We use the patterned LB films for templates to confine metal in patterned regions, taking advantage of the difference between the surface free energy of the patterned regions and that of the self-assembled monolayer of the silane coupling agent. Au nanoparticles are confined onto the patterned films as a catalyst for the succeeding Cu electroless deposition. The atomic force microscopic images, Auger electron spectra, and scanning Auger electron maps of a Cu-deposited film show that Cu is selectively deposited on the patterns of phase separation of the original mixed LB films.
authors.affiliation: Departments of Materials Science and Technology, Tokyo University of Science, Yamazaki 2641, Noda, Japan.
authors.forename: Satoshi
authors.initials: S
authors.lastname: Watanabe
authors.forename: Hideto
authors.initials: H
authors.lastname: Kimura
authors.forename: Takahiro
authors.initials: T
authors.lastname: Sato
authors.forename: Hirobumi
authors.initials: H
authors.lastname: Shibata
authors.forename: Fumitaka
authors.initials: F
authors.lastname: Sakamoto
authors.forename: Reiko
authors.initials: R
authors.lastname: Azumi
authors.forename: Hideki
authors.initials: H
authors.lastname: Sakai
authors.forename: Masahiko
authors.initials: M
authors.lastname: Abe
authors.forename: Mutsuyoshi
authors.initials: M
authors.lastname: Matsumoto