title: Semiautomatic measurements of thin-film breakdown voltages.
abstract: A semiautomatic setup is described which provides the destruction-free measurement of breakdown voltages of thin-film structures for applications like process control and quality prediction. The method of measuring the breakdown voltage consists in feeding a constant current to the thin-film device and analyzing the voltage buildup across the device. This method has been described in a recent paper. The setup provides the successive analysis of breakdown behavior of a given matrix of wafer dots by means of a positioning table, an electropneumatic prober, and a microprocessor-controlled measurement unit via handshake commands. The results are given in a histogram form.
authors.affiliation: Hahn-Meitner-Institut fur Kernforschung Berlin GmbH, Bereich Datenverarbeitung und Elektronik, Glienicker Strasse 100, D-1000 Berlin 39, West Germany.
authors.forename: W
authors.initials: W
authors.lastname: Gaebler
authors.forename: R
authors.initials: R
authors.lastname: Conrad
authors.forename: D
authors.initials: D
authors.lastname: Braeunig
authors.forename: W R
authors.initials: WR
authors.lastname: Fahrner
authors.forename: R
authors.initials: R
authors.lastname: Ferretti
authors.forename: F
authors.initials: F
authors.lastname: Wulf