title: Nanoimprint lithography for nanophotonics in silicon.
abstract: A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
authors.affiliation: Molecular Nanofabrication Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, NL-7500 AE Enschede, The Netherlands.
authors.forename: Christiaan M
authors.initials: CM
authors.lastname: Bruinink
authors.forename: Matteo
authors.initials: M
authors.lastname: Burresi
authors.forename: Meint J
authors.initials: MJ
authors.lastname: de Boer
authors.forename: Frans B
authors.initials: FB
authors.lastname: Segerink
authors.forename: Henri V
authors.initials: HV
authors.lastname: Jansen
authors.forename: E
authors.initials: E
authors.lastname: Berenschot
authors.forename: David N
authors.initials: DN
authors.lastname: Reinhoudt
authors.forename: Jurriaan
authors.initials: J
authors.lastname: Huskens
authors.forename: L
authors.initials: L
authors.lastname: Kuipers