title: Ultrahigh vacuum low- and high-temperature silicon-glass cell for thermal infrared and intense CO2 laser pulses.
abstract: A durable flame sealed silicon glass infrared cell for use at ultrahigh vacuum (< or approximately 4 x 10(-8) Pa) and temperatures between 77 and 600 K is described. The cell is suitable for thermal infrared as well as MW/cm(2) CO(2) laser pulses of 1 J energy. It can be fused directly onto a glass to stainless steel seal on a standard Conflat flange, thus making a variable temperature metal seal onto a metal UHV system. The integral leak rate and the ir transmission of the cell were measured. Infrared chemical applications are described.
authors.affiliation: Institut für Physikalische und Theoretische Chemie der Universität, Erlangen-Nürnberg, Erlangen, West Germany.
authors.forename: J
authors.initials: J
authors.lastname: Heidberg
authors.forename: I
authors.initials: I
authors.lastname: Hussla
authors.forename: E
authors.initials: E
authors.lastname: Hoefs
authors.forename: H
authors.initials: H
authors.lastname: Stein
authors.forename: A
authors.initials: A
authors.lastname: Nestmann