Nanoimprint lithography for nanophotonics in silicon.
A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
Bruinink
Christiaan M
CM
Molecular Nanofabrication Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, NL-7500 AE Enschede, The Netherlands.
Burresi
Matteo
M
de Boer
Meint J
MJ
Segerink
Frans B
FB
Jansen
Henri V
HV
Berenschot
E
E
Reinhoudt
David N
DN
Huskens
Jurriaan
J
Kuipers
L
L