title: Secondary particle collection in ion implantation dose measurement.
abstract: The measurement of ion implantation doses in the presence of secondary ions and electrons emitted from the target is discussed. A circuit and electrode geometry for obtaining accurate ion beam current measurements in the presence of both positive and negative secondary particles is presented.
authors.affiliation: Hughes Research Laboratories, 3011 Malibu Canyon Road, Malibu, CA 90265, USA.
authors.forename: D M
authors.initials: DM
authors.lastname: Jamba
mesh_terms: D004566:Electrodes; D004581:Electronics / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007477:Ions; D010316:Particle Size; D011829:Radiation Dosage; D011874:Radiometry / Q000295:instrumentation*; D014159:Transducers
chemical_list: D007477:Ions