title: Density multiplication and improved lithography by directed block copolymer assembly.
abstract: Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the thermodynamic driving forces for self-assembly are small, and low-energy defects can get easily trapped. We directed the assembly of defect-free arrays of isolated block copolymer domains at densities up to 1 terabit per square inch on chemically patterned surfaces. In comparing the assembled structures to the chemical pattern, the density is increased by a factor of four, the size is reduced by a factor of two, and the dimensional uniformity is vastly improved.
authors.affiliation: Hitachi Global Storage Technologies, San Jose Research Center, 3403 Yerba Buena Road, San Jose, CA 95135, USA. Ricardo.Ruiz@hitachigst.com
authors.forename: Ricardo
authors.initials: R
authors.lastname: Ruiz
authors.forename: Huiman
authors.initials: H
authors.lastname: Kang
authors.forename: François A
authors.initials: FA
authors.lastname: Detcheverry
authors.forename: Elizabeth
authors.initials: E
authors.lastname: Dobisz
authors.forename: Dan S
authors.initials: DS
authors.lastname: Kercher
authors.forename: Thomas R
authors.initials: TR
authors.lastname: Albrecht
authors.forename: Juan J
authors.initials: JJ
authors.lastname: de Pablo
authors.forename: Paul F
authors.initials: PF
authors.lastname: Nealey