title: Spatial dose uniformity monitor for electrically scanned ion beam.
abstract: A technique is described for direct and precise monitoring of the spatial dose uniformity of an electrically scanned ion beam. The method employs a two-dimensional 10x10 array of Faraday cups, individually connected to a current integrator, to measure local dose distribution. It also employs a microprocessor for rapid data processing and topographic data display. The technique is applicable to high quality ion implantation processes as a uniformity monitor with an accuracy of 1%. In addition, a new concept for uniform ion beam scanning is proposed.
authors.affiliation: Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185, Japan.
authors.forename: N
authors.initials: N
authors.lastname: Natsuaki
authors.forename: K
authors.initials: K
authors.lastname: Ohyu
authors.forename: T
authors.initials: T
authors.lastname: Tokuyama