Density multiplication and improved lithography by directed block copolymer assembly.
Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the thermodynamic driving forces for self-assembly are small, and low-energy defects can get easily trapped. We directed the assembly of defect-free arrays of isolated block copolymer domains at densities up to 1 terabit per square inch on chemically patterned surfaces. In comparing the assembled structures to the chemical pattern, the density is increased by a factor of four, the size is reduced by a factor of two, and the dimensional uniformity is vastly improved.
Ruiz
Ricardo
R
Hitachi Global Storage Technologies, San Jose Research Center, 3403 Yerba Buena Road, San Jose, CA 95135, USA. Ricardo.Ruiz@hitachigst.com
Kang
Huiman
H
Detcheverry
François A
FA
Dobisz
Elizabeth
E
Kercher
Dan S
DS
Albrecht
Thomas R
TR
de Pablo
Juan J
JJ
Nealey
Paul F
PF