title: Development of micromachining technology in ion microbeam system at TIARA, JAEA.
abstract: An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.
authors.affiliation: Department of Advanced Radiation Technology, Japan Atomic Energy Agency (JAEA) 1233, Watanuki-machi, Takasaki, Gunma 370-1292, Japan. kamiya.tomihiro@jaea.go.jp
authors.forename: T
authors.initials: T
authors.lastname: Kamiya
authors.forename: H
authors.initials: H
authors.lastname: Nishikawa
authors.forename: T
authors.initials: T
authors.lastname: Satoh
authors.forename: J
authors.initials: J
authors.lastname: Haga
authors.forename: M
authors.initials: M
authors.lastname: Oikawa
authors.forename: Y
authors.initials: Y
authors.lastname: Ishii
authors.forename: T
authors.initials: T
authors.lastname: Ohkubo
authors.forename: N
authors.initials: N
authors.lastname: Uchiya
authors.forename: Y
authors.initials: Y
authors.lastname: Furuta