Spatial dose uniformity monitor for electrically scanned ion beam.
A technique is described for direct and precise monitoring of the spatial dose uniformity of an electrically scanned ion beam. The method employs a two-dimensional 10x10 array of Faraday cups, individually connected to a current integrator, to measure local dose distribution. It also employs a microprocessor for rapid data processing and topographic data display. The technique is applicable to high quality ion implantation processes as a uniformity monitor with an accuracy of 1%. In addition, a new concept for uniform ion beam scanning is proposed.
Natsuaki
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N
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185, Japan.
Ohyu
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K
Tokuyama
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T