Ultrahigh vacuum low- and high-temperature silicon-glass cell for thermal infrared and intense CO2 laser pulses.
A durable flame sealed silicon glass infrared cell for use at ultrahigh vacuum (< or approximately 4 x 10(-8) Pa) and temperatures between 77 and 600 K is described. The cell is suitable for thermal infrared as well as MW/cm(2) CO(2) laser pulses of 1 J energy. It can be fused directly onto a glass to stainless steel seal on a standard Conflat flange, thus making a variable temperature metal seal onto a metal UHV system. The integral leak rate and the ir transmission of the cell were measured. Infrared chemical applications are described.
Heidberg
J
J
Institut für Physikalische und Theoretische Chemie der Universität, Erlangen-Nürnberg, Erlangen, West Germany.
Hussla
I
I
Hoefs
E
E
Stein
H
H
Nestmann
A
A