title: Extended arrays of vertically aligned sub-10 nm diameter [100] Si nanowires by metal-assisted chemical etching.
abstract: Large-area high density silicon nanowire (SiNW) arrays were fabricated by metal-assisted chemical etching of silicon, utilizing anodic aluminum oxide (AAO) as a patterning mask of a thin metallic film on a Si (100) substrate. Both the diameter of the pores in the AAO mask and the thickness of the metal film affected the diameter of SiNWs. The diameter of the SiNWs decreased with an increase of thickness of the metal film. Large-area SiNWs with average diameters of 20 nm down to 8 nm and wire densities as high as 10 (10) wires/cm (2) were accomplished. These SiNWs were single crystalline and vertically aligned to the (100) substrate. It was revealed by transmission electron microscopy that the SiNWs were of high crystalline quality and showed a smooth surface.
authors.affiliation: Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle Germany.
authors.forename: Zhipeng
authors.initials: Z
authors.lastname: Huang
authors.forename: Xuanxiong
authors.initials: X
authors.lastname: Zhang
authors.forename: Manfred
authors.initials: M
authors.lastname: Reiche
authors.forename: Lifeng
authors.initials: L
authors.lastname: Liu
authors.forename: Woo
authors.initials: W
authors.lastname: Lee
authors.forename: Tomohiro
authors.initials: T
authors.lastname: Shimizu
authors.forename: Stephan
authors.initials: S
authors.lastname: Senz
authors.forename: Ulrich
authors.initials: U
authors.lastname: Gösele