Development of micromachining technology in ion microbeam system at TIARA, JAEA.
An ion-beam-lithography technique has been progressed in the microbeam systems at Japan Atomic Energy Agency (JAEA) Takasaki. In order to obtain a high-precision measure for microbeam size estimation with a high precision, we applied this technique combined with the electroplating process to make a Ni relief pattern as a resolution standard used in secondary electron imaging. As a result, the smallest beam size could be recorded. The scattering of ions in the materials influenced the spatial resolution and this is also discussed.
Kamiya
T
T
Department of Advanced Radiation Technology, Japan Atomic Energy Agency (JAEA) 1233, Watanuki-machi, Takasaki, Gunma 370-1292, Japan. kamiya.tomihiro@jaea.go.jp
Nishikawa
H
H
Satoh
T
T
Haga
J
J
Oikawa
M
M
Ishii
Y
Y
Ohkubo
T
T
Uchiya
N
N
Furuta
Y
Y