Fabrication of large-area patterned porous silicon distributed Bragg reflectors.
A process to fabricate porous silicon Bragg reflectors patterned on a micrometer lateral scale over wafer areas of several square centimeters is described. This process is based on a new type of projection system involving a megavolt accelerator and a quadrupole lens system to project a uniform distribution of MeV ions over a wafer surface, which is coated with a multilevel mask. In conjunction with electrochemical anodisation, this enables the rapid production of high-density arrays of a variety of optical and photonic components in silicon such as waveguides and optical microcavities for applications in high-definition reflective displays and optical communications.
Mangaiyarkarasi
D
D
Department. of Physics, National University of Singapore, Centre for Ion Beam Applications, Singapore.
Sheng
Ow Y
OY
Breese
Mark B
MB
Fuh
Vincent L
VL
Xioasong
Eric T
ET
D004867:Equipment Design; D019544:Equipment Failure Analysis; D008422:Materials Testing; D016062:Porosity; D012031:Refractometry / Q000295:instrumentation*; D012542:Scattering, Radiation; D012825:Silicon / Q000737:chemistry*
D012825:Silicon