title: Fabrication of photonic crystals with functional defects by one-step holographic lithography.
abstract: A one-step introduction of functional defects into a photonic crystal is demonstrated. By using a multi-beam phase-controlled holographic lithography, line-defects in a Bragg structure and embedded waveguides in a two-dimensional photonic crystal are fabricated. Intrinsic defect introduction into a 3-dimensional photonic crystal is also proposed. This technique gives rise to a substantial reduction of the fabrication complexity and a significant improvement on the accuracy of the functional defects in photonic crystals.
authors: State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, Guangzhou 510275, China.
authors: Juntao
authors: J
authors: Li
authors: Yikun
authors: Y
authors: Liu
authors: Xiangsheng
authors: X
authors: Xie
authors: Peiqing
authors: P
authors: Zhang
authors: Bing
authors: B
authors: Liang
authors: Li
authors: L
authors: Yan
authors: Jianying
authors: J
authors: Zhou
authors: Gershon
authors: G
authors: Kurizki
authors: Daniel
authors: D
authors: Jacobs
authors: Kam Sing
authors: KS
authors: Wong
authors: Yongchun
authors: Y
authors: Zhong
mesh_terms: D003460:Crystallization / Q000379:methods*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D006696:Holography / Q000379:methods*; D008420:Manufactured Materials; D055095:Optics and Photonics / Q000295:instrumentation*; D010781:Photography / Q000379:methods*; D017785:Photons; D012031:Refractometry / Q000295:instrumentation* / Q000379:methods