title: Superhydrophobic and low light reflectivity silicon surfaces fabricated by hierarchical etching.
abstract: Silicon is employed in a variety of electronic and optical devices such as integrated circuits, photovoltaics, sensors, and detectors. In this paper, Au-assisted etching of silicon has been used to prepare superhydrophobic surfaces that may add unique properties to such devices. Surfaces were characterized by contact angle and contact angle hysteresis. Superhydrophobic surfaces with reduced hysteresis were prepared by Au-assisted etching of pyramid-structured silicon surfaces to generate hierarchical surfaces. Consideration of the Laplace pressure on hydrophobized hierarchical surfaces gives insight into the manner by which contact is established at the liquid/composite surface interface. Light reflectivity from the etched surfaces was also investigated to assess application of these structures to photovoltaic devices.
authors: School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 311 Ferst Drive, Atlanta, GA 30332-0100, USA.
authors: Yonghao
authors: Y
authors: Xiu
authors: Shu
authors: S
authors: Zhang
authors: Vijay
authors: V
authors: Yelundur
authors: Ajeet
authors: A
authors: Rohatgi
authors: Dennis W
authors: DW
authors: Hess
authors: C P
authors: CP
authors: Wong