Determination of copper in water and plant samples by flame atomic absorption spectrometry after preconcentration on octadecyl silica membrane disks modified with a recently synthesized Schiff's base.
A simple, selective, reliable, and sensitive method for the determination of trace amounts of CU2+ ions in aqueous samples is proposed. The Cu2+ ions are adsorbed quantitatively during the passage of aqueous samples through an octadecyl (C18) silica membrane disk modified by a symmetrical tetradentate Schiff base ligand, N,N'-bis(4-phenylazo salicylaldimine) 3-chloro-1,2-phenylenediamine (H2L). The retained Cu2+ ions were then stripped from the disk by elution with the minimal amount of nitric acid solution and determined by flame atomic absorption spectrometry. Various parameters, such as the effect of pH, flow rate, type and amount of eluent, and the effects of various cationic interferences on the recovery of ions were studied. The proposed method permitted large enrichment factors (about 550 and higher). The limit of detection of the method was 1.5 x 10(-2) microg/L. The use of the same disk modified with 6 mg H2L for at least 30 times showed no change in the recovery of Cu2+ ions. The accuracy of the method was confirmed by determination of Cu2+ ions in standard samples [National Institute of Environmental Studies (NIES) No. 2 and Nippon Keikinzoku Kogyo (NKK) No. 920]. The results demonstrated good agreement with certified values.
Shamspur
Tayebeh
T
Shahid Bahonar University, Department of Chemistry, PO Box 76175-133, Kerman, Iran.
Mostafavi
Ali
A
Sheikhshoaie
Iran
I
D003300:Copper / Q000032:analysis*; D006863:Hydrogen-Ion Concentration; D007202:Indicators and Reagents; D008567:Membranes, Artificial; D010944:Plants / Q000737:chemistry*; D012015:Reference Standards; D012545:Schiff Bases; D012822:Silicon Dioxide; D012996:Solutions; D013054:Spectrophotometry, Atomic; D014881:Water Supply / Q000032:analysis*
D007202:Indicators and Reagents; D008567:Membranes, Artificial; D012545:Schiff Bases; D012996:Solutions; C026679:octadecylsilica; D012822:Silicon Dioxide; D003300:Copper