Fabrication of photonic crystals with functional defects by one-step holographic lithography.
A one-step introduction of functional defects into a photonic crystal is demonstrated. By using a multi-beam phase-controlled holographic lithography, line-defects in a Bragg structure and embedded waveguides in a two-dimensional photonic crystal are fabricated. Intrinsic defect introduction into a 3-dimensional photonic crystal is also proposed. This technique gives rise to a substantial reduction of the fabrication complexity and a significant improvement on the accuracy of the functional defects in photonic crystals.
Li
Juntao
J
State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, Guangzhou 510275, China.
Liu
Yikun
Y
Xie
Xiangsheng
X
Zhang
Peiqing
P
Liang
Bing
B
Yan
Li
L
Zhou
Jianying
J
Kurizki
Gershon
G
Jacobs
Daniel
D
Wong
Kam Sing
KS
Zhong
Yongchun
Y
D003460:Crystallization / Q000379:methods*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D006696:Holography / Q000379:methods*; D008420:Manufactured Materials; D055095:Optics and Photonics / Q000295:instrumentation*; D010781:Photography / Q000379:methods*; D017785:Photons; D012031:Refractometry / Q000295:instrumentation* / Q000379:methods