title: Novel approaches to the design of halftone masks for analog lithography.
abstract: We report novel approaches to the design of halftone masks for analog lithography. The approaches are derived from interferometric phase contrast. In a first step we show that the interferometric phase-contrast method with detour holograms can be reduced into a single binary mask. In a second step we introduce the interferometric phase-contrast method by interference of the object wavefront with the conjugate object wavefront. This method also allows for a design of a halftone mask. To use kinoform holograms as halftone phase masks, we show in a third step the combination of the zeroth-order phase-contrast technique with the interferometric phase-contrast method.
authors.affiliation: Fachgebiet Technische Optik, Institut für Mikro- und Nanotechnologien, Technische Universität Ilmenau, P.O. Box 10 05 65, 98684 Ilmenau, Germany. marcel.teschke@tu-ilmenau.de
authors.forename: Marcel
authors.initials: M
authors.lastname: Teschke
authors.forename: Stefan
authors.initials: S
authors.lastname: Sinzinger