title: Effects of optical variables in immersion lens-based near-field optics.
abstract: We analyze the effects of optical variables, such as illumination state, focal position variation, near-field air-gap height, and refractive index mismatch, in immersion lens-based near-field optics on the resultant field propagation characteristics, including spot size, focal depth, and aberrations. First, to investigate the general behaviors of various incident polarization states, focused fields near the focal planes in simple two- or three-layered media structures are calculated under considerations of refractive index mismatch, geometric focal position variations, and air-gap height in a multi-layered medium. Notably, for solid immersion near-field optics, although purely TM polarized illumination generates a stronger and 15% smaller beam spot size in the focal region than in the case of circularly polarized incident light, the intensity of the focused field decreases sharply from the interface between air and the third medium. For the same optical configurations, we show that changes in geometric focal position to the recording or detecting medium increases focal depth. Finally, through focused field analysis on a ROM (read-only memory) and a RW (rewritable) medium, compound effects of considered variables are discussed. The resultant field propagation behaviors described in this study may be applicable to the design of either highly efficient reflection or transmission near-field optics for immersion lens based information storage, microscopy and lithographic devices.
authors.affiliation: Center for Information Storage Device, Yonsei University, Seoul, Korea.
authors.forename: Wan-Chin
authors.initials: WC
authors.lastname: Kim
authors.forename: Yong-Joong
authors.initials: YJ
authors.lastname: Yoon
authors.forename: Hyun
authors.initials: H
authors.lastname: Choi
authors.forename: No-Cheol
authors.initials: NC
authors.lastname: Park
authors.forename: Young-Pil
authors.initials: YP
authors.lastname: Park
mesh_terms: D003198:Computer Simulation; D017076:Computer-Aided Design; D019544:Equipment Failure Analysis / Q000379:methods*; D007090:Image Interpretation, Computer-Assisted; D007909:Lenses; D008853:Microscopy / Q000295:instrumentation* / Q000379:methods*; D008962:Models, Theoretical; D012680:Sensitivity and Specificity