Robust microstructures using UV photopatternable semiconductor nanocrystals.
We report an approach to produce predefined patterns of quantum dots and multipod nanocrystals using optical lithography for direct writing of films for optoelectronic and electronic devices. To obtain photopatternability, the nanostructures (for example, CdSe, CdTe, and PbSe nanocrystals) were functionalized by incorporation of the functional ligand t-butoxycarbonyl (t-BOC) which has an acid-labile moiety. This change in the surface chemistry results in the ability to photopattern the semiconductor nanocrystals where desired for a number of optoelectronic device geometries. We demonstrate that the ultimate resolution (line width and spacing) of this technique is below 5 microm (the limit of our optical apparatus used for writing).
Kim
Won Jin
WJ
Institute for Lasers, Photonics and Biophotonics, Department of Chemistry, University at Buffalo, The State University of New York, Buffalo, New York 14260, USA.
Kim
Sung Jin
SJ
Lee
Kwang-Sup
KS
Samoc
Marek
M
Cartwright
Alexander N
AN
Prasad
Paras N
PN
D002244:Carbon / Q000737:chemistry; D004563:Electrochemistry / Q000379:methods; D004581:Electronics; D004867:Equipment Design; D008027:Light; D046529:Microscopy, Electron, Transmission; D053758:Nanoparticles / Q000737:chemistry*; D049329:Nanostructures; D036103:Nanotechnology / Q000379:methods*; D055095:Optics and Photonics; D045663:Quantum Dots; D012666:Semiconductors; D013499:Surface Properties; D014466:Ultraviolet Rays
D002244:Carbon