title: Metallic nanowires by full wafer stencil lithography.
abstract: Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70 nm wide and 5 mum long have been achieved showing a resistivity of 10 microOmegacm for Al and 5 microOmegacm for Au and maximum current density of approximately 10(8) A/cm(2). This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.
authors.affiliation: Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, 1015 Lausanne, Switzerland. oscar.vazquez@epfl.ch
authors.forename: O
authors.initials: O
authors.lastname: Vazquez-Mena
authors.forename: G
authors.initials: G
authors.lastname: Villanueva
authors.forename: V
authors.initials: V
authors.lastname: Savu
authors.forename: K
authors.initials: K
authors.lastname: Sidler
authors.forename: M A F
authors.initials: MA
authors.lastname: van den Boogaart
authors.forename: J
authors.initials: J
authors.lastname: Brugger
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D006046:Gold / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D053770:Nanowires / Q000737:chemistry* / Q000648:ultrastructure*; D012825:Silicon / Q000737:chemistry
chemical_list: D006046:Gold; D000535:Aluminum; D012825:Silicon