Accurate frequency alignment in fabrication of high-order microring-resonator filters.
Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6 GHz to 0.28 GHz.
Sun
Jie
J
Research Laboratory of Electronics, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA. sunjie@mit.edu
Holzwarth
Charles W
CW
Dahlem
Marcus
M
Hastings
Jeffrey T
JT
Smith
Henry I
HI
D003198:Computer Simulation; D017076:Computer-Aided Design / Q000295:instrumentation; D004583:Electrons; D004867:Equipment Design / Q000295:instrumentation*; D005374:Filtration / Q000295:instrumentation*; D007909:Lenses; D008855:Microscopy, Electron, Scanning / Q000295:instrumentation; D055095:Optics and Photonics / Q000295:instrumentation*; D012031:Refractometry / Q000295:instrumentation; D015203:Reproducibility of Results; D014159:Transducers