title: Nanopatterned carbon films with engineered morphology by direct carbonization of UV-stabilized block copolymer films.
abstract: Nanopatterned thin carbon films were prepared by direct and expeditious carbonization of the block copolymer polystyrene- block-poly(2-vinylpyridine) (PS- b-P2VP) without the necessity of slow heating to the process temperature and of addition of further carbon precursors. Carbonaceous films having an ordered "dots-on-film" surface topology were obtained from reverse micelle monolayers. The regular nanoporous morphology of PS- b-P2VP films obtained by subjecting reverse micelle monolayers to swelling-induced surface reconstruction could likewise be transferred to carbon films thus characterized by ordered nanopit arrays. Stabilization of PS- b-P2VP by UV irradiation and the concurrent carbonization of both blocks were key to the conservation of the film topography. The approach reported here may enable the realization of a broad range of nanoscaled architectures for carbonaceous materials using a block copolymer ideally suited as a template because of the pronounced repulsion between its blocks and its capability to form highly ordered microdomain structures.
authors.affiliation: Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle, Germany. yongwang@mpi-halle.de
authors.forename: Yong
authors.initials: Y
authors.lastname: Wang
authors.forename: Jinquan
authors.initials: J
authors.lastname: Liu
authors.forename: Silke
authors.initials: S
authors.lastname: Christiansen
authors.forename: Dong Ha
authors.initials: DH
authors.lastname: Kim
authors.forename: Ulrich
authors.initials: U
authors.lastname: Gösele
authors.forename: Martin
authors.initials: M
authors.lastname: Steinhart