title: Materials with on-demand refractive indices in the terahertz range.
abstract: We demonstrate the possibility to create materials with chosen refractive indices and a strong birefringence in the terahertz range by etching of patterns with appropriate filling factors in a dielectric substrate. We show that by using deep inductive plasma etching of silicon wafers, it is possible to achieve a birefringence as high as 1.2 in an 80 microm thick layer. The resulting stacks were used as building blocks for a photonic crystal displaying sharp defect mode peaks in transmittance.
authors.affiliation: Institute of Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic.
authors.forename: Christelle
authors.initials: C
authors.lastname: Kadlec
authors.forename: Filip
authors.initials: F
authors.lastname: Kadlec
authors.forename: Petr
authors.initials: P
authors.lastname: Kuzel
authors.forename: Karine
authors.initials: K
authors.lastname: Blary
authors.forename: Patrick
authors.initials: P
authors.lastname: Mounaix