Metallic nanowires by full wafer stencil lithography.
Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70 nm wide and 5 mum long have been achieved showing a resistivity of 10 microOmegacm for Al and 5 microOmegacm for Au and maximum current density of approximately 10(8) A/cm(2). This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.
Vazquez-Mena
O
O
Microsystems Laboratory, Ecole Polytechnique Federale de Lausanne, 1015 Lausanne, Switzerland. oscar.vazquez@epfl.ch
Villanueva
G
G
Savu
V
V
Sidler
K
K
van den Boogaart
M A F
MA
Brugger
J
J
D000535:Aluminum / Q000737:chemistry*; D006046:Gold / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D053770:Nanowires / Q000737:chemistry* / Q000648:ultrastructure*; D012825:Silicon / Q000737:chemistry
D006046:Gold; D000535:Aluminum; D012825:Silicon