Synthesis of silicon nanowires and nanofin arrays using interference lithography and catalytic etching.
We report results on the synthesis of silicon nanostructures that were fabricated using a combination of interference lithography and catalytic etching. With this technique, we were able to create nanostructures that are perfectly periodic over very large areas (1 cm(2) or more), where the cross-sectional shapes and the array ordering can be varied. Furthermore this technique can readily and independently control the sizes and spacings of the nanostructures down to spacings of 200 nm or less. These characteristics cannot be achieved using other known techniques.
Choi
W K
WK
Advanced Materials for Micro- and Nano-Systems Programme, Singapore-MIT Alliance, Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117576. elechoi@nus.edu.sg
Liew
T H
TH
Dawood
M K
MK
Smith
Henry I
HI
Thompson
C V
CV
Hong
M H
MH