title: New masking procedure for selective complexometric determination of copper(II).
abstract: A study has been made of a new masking procedure for highly selective complexometric determination of copper(II), based on decomposition of the copper-EDTA complex at pH 5-6. Among the various combinations of masking agents tried, ternary masking mixtures comprising a main complexing agent (thiourea), a reducing agent (ascorbic acid) and an auxiliary complexing agent (thiosemicarbazide or a small amount of 1,10-phenanthroline or 2,2'-dipyridyl) have been found most suitable. An excess of EDTA is added and the surplus EDTA is back-titrated with lead (or zinc) nitrate with Xylenol Orange as indicator (pH 5-6). A masking mixture is then added to decompose the copper-EDTA complex and the liberated EDTA is again back-titrated with lead (or zinc) nitrate. The following cations do not interfere: Ag(+), Hg(2+), Pb(2+), Ni(2+), Bi(3+), As(3+), Al(3+), Sb(3+), Sn(4+), Cd(2+), Co(2+), Cr(3+) and moderate amounts of Fe(3+) and Mn(2+). The notable feature is that consecutive determination of Hg(2+) and Cu(2+) can be conveniently carried out in the presence of other cations.
authors.affiliation: Department of Chemistry, Panjabi University, Patiala, India.
authors.forename: R P
authors.initials: RP
authors.lastname: Singh