title: Combining convective/capillary deposition and AFM oxidation lithography for close-packed directed assembly of colloids.
abstract: We combine convective/capillary deposition and oxidation lithography by atomic force microscopy to direct the close-packed assembly of colloids on SiOx patterns fabricated on silicon substrates previously functionalized with a hydrophobic monolayer of octadecyltrimethoxysilane. The efficiency of this original generic method, which is well adapted to integrate colloids into silicon devices, is demonstrated for 100 nm colloidal latex nanoparticles and Escherichia coli bacteria in aqueous suspensions. A three-step mechanism involving convective flow and capillary forces appears to be responsible for these close-packed assemblies of colloids onto SiOx patterns.
authors.affiliation: Université de Toulouse, INSA-CNRS-UPS, LPCNO, 135 avenue de Rangueil, 31077 Toulouse Cedex 4, France. laurence.ressier@insa-toulouse.fr
authors.forename: L
authors.initials: L
authors.lastname: Ressier
authors.forename: B
authors.initials: B
authors.lastname: Viallet
authors.forename: A
authors.initials: A
authors.lastname: Beduer
authors.forename: D
authors.initials: D
authors.lastname: Fabre
authors.forename: L
authors.initials: L
authors.lastname: Fabie
authors.forename: E
authors.initials: E
authors.lastname: Palleau
authors.forename: E
authors.initials: E
authors.lastname: Dague
mesh_terms: D003102:Colloids / Q000737:chemistry*; D004926:Escherichia coli / Q000737:chemistry; D018625:Microscopy, Atomic Force / Q000379:methods; D053758:Nanoparticles / Q000737:chemistry; D010084:Oxidation-Reduction; D017655:Silicon Compounds / Q000737:chemistry; D013499:Surface Properties; D013535:Suspensions / Q000737:chemistry
chemical_list: D003102:Colloids; D017655:Silicon Compounds; D013535:Suspensions