title: Electrochemical masking of large amounts of copper in dpasv and the determination of thallium in the presence of a large excess of copper.
abstract: The influence of the following surfactants on the peak of copper in 0.2M EDTA at pH 4.5 was investigated: polyoxyethylated alkylphenols having an average of 3 and 9.5 ethylene oxide units; polyoxyethylene alcohols having 4 and 7 ethylene oxide units; poly(ethylene glycols) having M.W. 4000, 9000 and 20000; hexadecyltributylphosphonium bromide (HDTBPB), tetraphenylphosphonium bromide (TPPB),N,N,N,N,N',N',N-examethylhexamethylenediammonium bromide (HMB), benzyl(di-isobutylphenoxyethoxy) dimethylammonium chloride (Hyamine 1622), hexadecyltrimethylammonium bromide (HDTMAB), hexadecyldimethylbenzylammonium chloride (HDDMBAC) and tetrabutylammonium chloride (TBAC). HDDMBAC, as well as all the substances examined which contained an ethylene oxide chain, completely suppressed the copper peak. HDTBPB and TPPB partially suppressed the peak, whereas HDTMAB, HMB and Hyamine 1622 enhanced it. TBAC was without effect. In 0.2M EDTA at pH 4.5 containing TBAC at 0.01M concentration and 10 ppm of Rokafenol N-3, Cu(II), Pb(II) and Bi(III) can be tolerated at concentrations of up to 0.05M, the height of the thallium peak being unaffected. The precision of the determination (3-10%) and the recovery are satisfactory. A 10(3)-fold ratio of Fe(III) to Tl(I) does not interfere with the determination.
authors.affiliation: Institute of General Chemistry, Technical University of Poznan, 60-965 Poznań, Poland.
authors.forename: A
authors.initials: A
authors.lastname: Ciszewski
authors.forename: Z
authors.initials: Z
authors.lastname: Lukaszewski