title: Fabrication of silicon nanopillar teradot arrays by electron-beam patterning for nanoimprint molds.
authors.affiliation: Department of Materials Science and Engineering, Seoul National University, San 56-1, Sillim-dong, Gwanak-gu, Seoul 151-742, Korea.
authors.forename: Jung-Sub
authors.initials: JS
authors.lastname: Wi
authors.forename: Hyo-Sung
authors.initials: HS
authors.lastname: Lee
authors.forename: Kipil
authors.initials: K
authors.lastname: Lim
authors.forename: Sung-Wook
authors.initials: SW
authors.lastname: Nam
authors.forename: Hyun-Mi
authors.initials: HM
authors.lastname: Kim
authors.forename: Soo-Yeon
authors.initials: SY
authors.lastname: Park
authors.forename: Jae Jong
authors.initials: JJ
authors.lastname: Lee
authors.forename: Chris Daehoon
authors.initials: CD
authors.lastname: Hong
authors.forename: Sungho
authors.initials: S
authors.lastname: Jin
authors.forename: Ki-Bum
authors.initials: KB
authors.lastname: Kim
mesh_terms: D006858:Hydrofluoric Acid / Q000737:chemistry; D046228:Microarray Analysis / Q000295:instrumentation*; D008855:Microscopy, Electron, Scanning / Q000379:methods; D036103:Nanotechnology / Q000379:methods*; D043942:Nanotubes / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D000644:Quaternary Ammonium Compounds / Q000737:chemistry; D012825:Silicon / Q000737:chemistry*
chemical_list: D000644:Quaternary Ammonium Compounds; C027917:tetramethylammonium; D006858:Hydrofluoric Acid; D012825:Silicon