H2SO4-silica-promoted 'on-column' removal of benzylidene, isopropylidene, trityl and tert-butyldimethylsilyl groups.
H(2)SO(4)-silica-promoted removal of benzylidene, isopropylidene, trityl and tert-butyldimethylsilyl groups from sugar derivatives was accomplished by following an 'on-column' protocol in a virtually waste-free condition.
Roy
Bimalendu
B
Indian Institute of Science Education and Research-Kolkata, HC-VII, Sector-III, Salt Lake City, Kolkata 700 106, India.
Verma
Priya
P
Mukhopadhyay
Balaram
B
D000475:Alkenes / Q000737:chemistry / Q000302:isolation & purification*; D001597:Benzylidene Compounds / Q000737:chemistry / Q000302:isolation & purification*; D006868:Hydrolysis; D015394:Molecular Structure; D017646:Organosilicon Compounds / Q000737:chemistry / Q000302:isolation & purification*; D012822:Silicon Dioxide / Q000737:chemistry*; D013431:Sulfates / Q000737:chemistry*; D014320:Triphenylmethyl Compounds / Q000737:chemistry / Q000302:isolation & purification*
D000475:Alkenes; D001597:Benzylidene Compounds; D017646:Organosilicon Compounds; D013431:Sulfates; D014320:Triphenylmethyl Compounds; C009660:t-butyldimethylsilyl compounds; D012822:Silicon Dioxide; C013658:propylene