title: Quantum electron transport through ultrathin Si films: effects of interface passivation on Fermi-level pinning.
abstract: We report first-principles calculations on electron transport through ultrathin silicon films between aluminum electrodes. The passivation of interface Si atoms at one side of the film with hydrogen makes the current-voltage characteristics asymmetric with quasirectifying properties. The low conductivity in this case can be explained by the weakened metal-induced gap states due to the passivation. We also demonstrate that the applied bias changes the strength of Fermi-level pinning for the passivated interface.
authors.affiliation: Institut für Theoretische Chemie, Universität Ulm, Ulm, Germany. gohda@phys.s.u-tokyo.ac.jp
authors.forename: Y
authors.initials: Y
authors.lastname: Gohda
authors.forename: S
authors.initials: S
authors.lastname: Watanabe
authors.forename: A
authors.initials: A
authors.lastname: Gross