title: Nanomechanical mass sensor for spatially resolved ultrasensitive monitoring of deposition rates in stencil lithography.
authors.affiliation: Instituto de Microelectronica de Barcelona, CNM-IMB, CSIC, Bellaterra, Spain.
authors.forename: Julien
authors.initials: J
authors.lastname: Arcamone
authors.forename: Marc
authors.initials: M
authors.lastname: Sansa
authors.forename: Jaume
authors.initials: J
authors.lastname: Verd
authors.forename: Arantxa
authors.initials: A
authors.lastname: Uranga
authors.forename: Gabriel
authors.initials: G
authors.lastname: Abadal
authors.forename: Núria
authors.initials: N
authors.lastname: Barniol
authors.forename: Marc
authors.initials: M
authors.lastname: van den Boogaart
authors.forename: Juergen
authors.initials: J
authors.lastname: Brugger
authors.forename: Francesc
authors.initials: F
authors.lastname: Pérez-Murano
mesh_terms: D002138:Calibration; D004867:Equipment Design; D008670:Metals / Q000737:chemistry; D053758:Nanoparticles / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D053770:Nanowires / Q000737:chemistry* / Q000648:ultrastructure*; D009991:Oscillometry; D010087:Oxides / Q000737:chemistry; D013499:Surface Properties
chemical_list: D008670:Metals; D010087:Oxides