Focusing mirror for x-ray free-electron lasers.
We present the design, fabrication, and evaluation of a large total-reflection mirror for focusing x-ray free-electron laser beams to nanometer dimensions. We used an elliptical focusing mirror made of silicon that was 400 mm long and had a focal length of 550 mm. Electrolytic in-process dressing grinding was used for initial-step figuring and elastic emission machining was employed for final figuring and surface smoothing. A figure accuracy with a peak-to-valley height of 2 nm was achieved across the entire area. Characterization of the focused beam was performed at BL29XUL of SPring-8. The focused beam size was 75 nm at 15 keV, which is almost equal to the theoretical size.
Mimura
Hidekazu
H
Department of Precision Science and Technology, Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan.
Morita
Shinya
S
Kimura
Takashi
T
Yamakawa
Daisuke
D
Lin
Weimin
W
Uehara
Yoshihiro
Y
Matsuyama
Satoshi
S
Yumoto
Hirokatsu
H
Ohashi
Haruhiko
H
Tamasaku
Kenji
K
Nishino
Yoshinori
Y
Yabashi
Makina
M
Ishikawa
Tetsuya
T
Ohmori
Hitoshi
H
Yamauchi
Kazuto
K