Thickness microscopy based on photothermal radiometry for the measurement of thin films.
The photothermal detection technique is an innovative and non-contact method to investigate the properties of films on workpieces. This paper describes a novel experimental set-up for thickness microscopy based on photothermal radiometry. The correlation between the thermal wave signal and the film thickness is deduced and evaluated to determine the film thickness with a lateral resolution of less than 1mm. Results indicate that the thickness microscopy is a useful method to characterize thin films and has the potential to be applied in-process.
Wang
Liping
L
College of Chemistry and Molecular Science, Wuhan University, Wuhan, Hubei Province 430072, People's Republic of China. liping_wang-2002@yahoo.com
Prekel
Helmut
H
Liu
Hengbiao
H
Deng
Yanzhuo
Y
Hu
Jiming
J
Goch
Gert
G
D008422:Materials Testing / Q000379:methods; D008853:Microscopy / Q000379:methods*; D010777:Photochemistry; D011874:Radiometry / Q000379:methods*; D013499:Surface Properties; D015040:Zirconium / Q000737:chemistry
D015040:Zirconium; C028541:zirconium oxide