title: Thickness microscopy based on photothermal radiometry for the measurement of thin films.
abstract: The photothermal detection technique is an innovative and non-contact method to investigate the properties of films on workpieces. This paper describes a novel experimental set-up for thickness microscopy based on photothermal radiometry. The correlation between the thermal wave signal and the film thickness is deduced and evaluated to determine the film thickness with a lateral resolution of less than 1mm. Results indicate that the thickness microscopy is a useful method to characterize thin films and has the potential to be applied in-process.
authors.affiliation: College of Chemistry and Molecular Science, Wuhan University, Wuhan, Hubei Province 430072, People's Republic of China. liping_wang-2002@yahoo.com
authors.forename: Liping
authors.initials: L
authors.lastname: Wang
authors.forename: Helmut
authors.initials: H
authors.lastname: Prekel
authors.forename: Hengbiao
authors.initials: H
authors.lastname: Liu
authors.forename: Yanzhuo
authors.initials: Y
authors.lastname: Deng
authors.forename: Jiming
authors.initials: J
authors.lastname: Hu
authors.forename: Gert
authors.initials: G
authors.lastname: Goch
mesh_terms: D008422:Materials Testing / Q000379:methods; D008853:Microscopy / Q000379:methods*; D010777:Photochemistry; D011874:Radiometry / Q000379:methods*; D013499:Surface Properties; D015040:Zirconium / Q000737:chemistry
chemical_list: D015040:Zirconium; C028541:zirconium oxide