Large area, few-layer graphene films on arbitrary substrates by chemical vapor deposition.
In this work we present a low cost and scalable technique, via ambient pressure chemical vapor deposition (CVD) on polycrystalline Ni films, to fabricate large area ( approximately cm2) films of single- to few-layer graphene and to transfer the films to nonspecific substrates. These films consist of regions of 1 to approximately 12 graphene layers. Single- or bilayer regions can be up to 20 mum in lateral size. The films are continuous over the entire area and can be patterned lithographically or by prepatterning the underlying Ni film. The transparency, conductivity, and ambipolar transfer characteristics of the films suggest their potential as another materials candidate for electronics and opto-electronic applications.
Reina
Alfonso
A
Department of Materials Science and Engineering, Department of Electrical Engineering and Computer Science, Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
Jia
Xiaoting
X
Ho
John
J
Nezich
Daniel
D
Son
Hyungbin
H
Bulovic
Vladimir
V
Dresselhaus
Mildred S
MS
Kong
Jing
J
D003460:Crystallization / Q000379:methods*; D005740:Gases / Q000737:chemistry; D006108:Graphite / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D013499:Surface Properties
D005740:Gases; D046911:Macromolecular Substances; D008567:Membranes, Artificial; D006108:Graphite