Nanomechanical mass sensor for spatially resolved ultrasensitive monitoring of deposition rates in stencil lithography.
Arcamone
Julien
J
Instituto de Microelectronica de Barcelona, CNM-IMB, CSIC, Bellaterra, Spain.
Sansa
Marc
M
Verd
Jaume
J
Uranga
Arantxa
A
Abadal
Gabriel
G
Barniol
Núria
N
van den Boogaart
Marc
M
Brugger
Juergen
J
Pérez-Murano
Francesc
F
D002138:Calibration; D004867:Equipment Design; D008670:Metals / Q000737:chemistry; D053758:Nanoparticles / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D053770:Nanowires / Q000737:chemistry* / Q000648:ultrastructure*; D009991:Oscillometry; D010087:Oxides / Q000737:chemistry; D013499:Surface Properties
D008670:Metals; D010087:Oxides