Generation of oxide nanopatterns by combining self-assembly of S-layer proteins and area-selective atomic layer deposition.
We report an effective method to fabricate two-dimensional (2D) periodic oxide nanopatterns using S-layer proteins as a template. Specifically, S-layer proteins with a unit cell dimension of 20 nm were reassembled on silicon substrate to form 2D arrays with ordered pores of nearly identical sizes (9 nm). Octadecyltrichlorosilane (ODTS) was utilized to selectively react with the S-layer proteins, but not the Si surface exposed through the pores defined by the proteins. Because of the different surface functional groups on the ODTS-modified S-layer proteins and Si surface, area-selective atomic layer deposition of metal oxide-based high-k materials, such as hafnium oxide, in the pores was achieved. The periodic metal oxide nanopatterns were generated on Si substrate after selective removal of the ODTS-modified S-layer proteins. These nanopatterns of high-k materials are expected to facilitate further downscaling of logic and memory nanoelectronic devices.
Liu
Jiurong
J
Department of Chemical and Biomolecular Engineering, University of California, Los Angeles, California 90095, USA.
Mao
Yuanbing
Y
Lan
Esther
E
Banatao
Diosdado Rey
DR
Forse
G Jason
GJ
Lu
Jun
J
Blom
Hans-Olof
HO
Yeates
Todd O
TO
Dunn
Bruce
B
Chang
Jane P
JP
D001426:Bacterial Proteins / Q000737:chemistry* / Q000235:genetics / Q000378:metabolism / Q000648:ultrastructure; D003851:Deoxyribonucleases / Q000737:chemistry* / Q000235:genetics / Q000378:metabolism / Q000648:ultrastructure; D018625:Microscopy, Atomic Force; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D010087:Oxides / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry; D013053:Spectrophotometry; D017550:Spectroscopy, Fourier Transform Infrared; D013499:Surface Properties
D001426:Bacterial Proteins; D010087:Oxides; C061563:SbcC protein, Bacteria; D003851:Deoxyribonucleases; D012825:Silicon