Titanium dioxide thin films deposited by plasma enhanced atomic layer deposition for OLED passivation.
Plasma enhanced atomic layer deposition (PEALD) of titanium dioxide thin films was conducted using Tetrakis dimethylamino titanium (TDMATi) and an oxygen plasma on a polyethersulfon (PES) substrate at a deposition temperature of 90 degrees C. The effects of the induced plasma power on passivation properties were investigated according to film thickness. The growth rate of the titanium dioxide film was 0.8 A/cycle, and the water vapor transmission rate (WTVR) for a 80 nm titanium dioxide film was 0.023 g/m2 day. The passivation performance of the titanium dioxide film was investigated using an organic light-emitting diode (OLED). The coated OLED lifetime was 90 h, 15 times longer than that of an uncoated sample.
Kim
Woong-Sun
WS
Department of Materials Science and Engineering, Hanyang University, Seoul, 133-791, Republic of Korea.
Ko
Myoung-Gyun
MG
Kim
Tae-Sub
TS
Park
Sang-Kyun
SK
Moon
Yeon-Keon
YK
Lee
Su-Hwan
SH
Park
Jae-Gun
JG
Park
Jong-Wan
JW