title: Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires.
abstract: We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.
authors.affiliation: Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027, USA. xl2165@columbia.edu
authors.forename: Xiaoping
authors.initials: X
authors.lastname: Liu
authors.forename: William M J
authors.initials: WM
authors.lastname: Green
authors.forename: Xiaogang
authors.initials: X
authors.lastname: Chen
authors.forename: I-Wei
authors.initials: IW
authors.lastname: Hsieh
authors.forename: Jerry I
authors.initials: JI
authors.lastname: Dadap
authors.forename: Yurii A
authors.initials: YA
authors.lastname: Vlasov
authors.forename: Richard M
authors.initials: RM
authors.lastname: Osgood