title: Three-port beam splitter of a binary fused-silica grating.
abstract: A deep-etched polarization-independent binary fused-silica phase grating as a three-port beam splitter is designed and manufactured. The grating profile is optimized by use of the rigorous coupled-wave analysis around the 785 nm wavelength. The physical explanation of the grating is illustrated by the modal method. Simple analytical expressions of the diffraction efficiencies and modal guidelines for the three-port beam splitter grating design are given. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results are in good agreement with the theoretical values.
authors.affiliation: Information Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, Shanghai, China.
authors.forename: Jijun
authors.initials: J
authors.lastname: Feng
authors.forename: Changhe
authors.initials: C
authors.lastname: Zhou
authors.forename: Bo
authors.initials: B
authors.lastname: Wang
authors.forename: Jiangjun
authors.initials: J
authors.lastname: Zheng
authors.forename: Wei
authors.initials: W
authors.lastname: Jia
authors.forename: Hongchao
authors.initials: H
authors.lastname: Cao
authors.forename: Peng
authors.initials: P
authors.lastname: Lv