title: Fully cross-linked and chemically patterned self-assembled monolayers.
abstract: Mechanically stable monolayers with chemically functional patterns are fabricated by the combination of spatially resolved chemical lithography with complete cross-linking of aromatic self-assembled monolayers (SAMs). The process starts with a local electron exposure of a SAM of 4'-nitro-1,1'-biphenyl-4-thiol that converts the nitro into amino groups and, additionally, generates a pattern of cross-linked and non cross-linked regions. In the next step, molecules in the non cross-linked regions are exchanged for 1,1'-biphenyl-4-thiol. A subsequent electron exposure cross-links these regions, yielding a fully cross-linked, chemically patterned SAM. The reverse process that generates chemically complementary patterns is also demonstrated. For both processes, X-ray photoelectron spectroscopy and atomic force microscopy are used to monitor the fabrication steps and to determine the kinetics of the thiol exchange. The functionality of the fully cross-linked, chemically patterned monolayer is tested by the site selective derivatisation with pentanoic acid chloride.
authors.affiliation: Universität Bielefeld, Fakultät für Physik, Physik Supramolekularer Systeme, Postfach 10 01 31, 33501, Bielefeld, Germany. beyer@physik.uni-bielefeld.de
authors.forename: André
authors.initials: A
authors.lastname: Beyer
authors.forename: Adelheid
authors.initials: A
authors.lastname: Godt
authors.forename: Ihsan
authors.initials: I
authors.lastname: Amin
authors.forename: Christoph T
authors.initials: CT
authors.lastname: Nottbohm
authors.forename: Christian
authors.initials: C
authors.lastname: Schmidt
authors.forename: Jinkai
authors.initials: J
authors.lastname: Zhao
authors.forename: Armin
authors.initials: A
authors.lastname: Gölzhäuser