Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires.
We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.
Liu
Xiaoping
X
Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027, USA. xl2165@columbia.edu
Green
William M J
WM
Chen
Xiaogang
X
Hsieh
I-Wei
IW
Dadap
Jerry I
JI
Vlasov
Yurii A
YA
Osgood
Richard M
RM