title: Compensation of reflectance response deviations of guided-mode resonant filters induced by overetching fabrication.
abstract: Unless the fabrication error control is well treated, it easily causes overetched fabrication errors, which causes the resonant peak value deviation during the fabrication process of guided-mode resonant filters (GMRFs). Hence, the fabrication error control becomes a key point for improving the performance of GMRF. We find that, within the range of the groove depth from 93 to 105 nm, the relationship between the overetched error and the resonant peak value deviation is nearly linear, which means that we can compensate the reflectance response deviation and reduce the resonant peak value deviation by the method of covering the layer film on the GMRF. Simulation results show that the deviation is compensated perfectly by this way.
authors.affiliation: Shanghai Key Laboratory of Contemporary Optics System, College of Optics and Electronics, University of Shanghai for Science and Technology, Shanghai, China.
authors.forename: Qi
authors.initials: Q
authors.lastname: Wang
authors.forename: Dawei
authors.initials: D
authors.lastname: Zhang
authors.forename: Hongbo
authors.initials: H
authors.lastname: He
authors.forename: Yuanshen
authors.initials: Y
authors.lastname: Huang
authors.forename: Jiabi
authors.initials: J
authors.lastname: Chen
authors.forename: Lin
authors.initials: L
authors.lastname: Chen
authors.forename: Yiming
authors.initials: Y
authors.lastname: Zhu
authors.forename: Songlin
authors.initials: S
authors.lastname: Zhuang