title: Nanoscale lithography with frequency-modulation atomic force microscopy.
abstract: A lithographic method to draw nanoscale structures by repetitive depositions of the tip material by field evaporation has been developed based on frequency-modulation atomic force microscopy (FM-AFM). Because of high stiffness of quartz tuning forks, a force sensor in the AFM, unwanted mechanical contact of the AFM tip with the substrate was prevented. Precise control of the tip-substrate gap distance with FM-AFM and a gold tip sharpened with focused ion beam enable us to deposit gold dots as small as approximately 20 nm in size and construct nanoscale patterns.
authors.affiliation: The Institute for Solid State Physics, the University of Tokyo, Kashiwa-no-ha 5-1-5, Kashiwa, Chiba 277-8581, Japan.
authors.forename: Masayuki
authors.initials: M
authors.lastname: Hamada
authors.forename: T
authors.initials: T
authors.lastname: Eguchi
authors.forename: K
authors.initials: K
authors.lastname: Akiyama
authors.forename: Y
authors.initials: Y
authors.lastname: Hasegawa