[Heavy metals distribution characteristics and risk assessment of water below an electroplating factory].
Surface water and shallow groundwater within the flow of an electroplating factory was analyzed in order to study the resulting impact. The analysis method of ICP-AES was used to analyze content of zinc, manganese, chromium, copper and nickel in surface water and groundwater samples. The results indicate acidic pollutants of zinc, manganese, chromium, copper and nickel were discharged from the factory with concentrations of 1.34, 3.77, 28.1, 6.40 and 9.37 mg x L(-1), respectively; and pH was 2.32. They all exceeded permissible levels according to Integrated Wastewater Discharge Standard except zinc. Factory discharge is responsible for the longitudinal distribution characteristics of heavy metals in the stream water downstream from the factory. Heavy metals variations in the well water do not suggest they were affected by heavy metals in the stream, indicating that the migration rates of heavy metals in soils were relatively low. Risk assessment shows surface water quality significantly deteriorated. Nickel and manganese in the stream water exceeded the standard levels seriously, and chromium and copper in some samples were also above Grade III standard levels according to Environmental Quality Standard for Surface Water. Moreover, all studied heavy metals in 14 groundwater samples measured within drinking water standard, except manganese in 4 groundwater samples, which were Grade IV according to Quality Standard for Ground water.
Hang
Xiao-Shuai
XS
State Key Laboratory of Soil and Sustainable Agriculture, Institute of Soil Science, Chinese Academy of Sciences, Nanjing 210008, China. xshang@issas.ac.cn
Wang
Huo-Yan
HY
Zhou
Jian-Min
JM
D002681:China; D004595:Electroplating; D007220:Industrial Waste / Q000032:analysis*; D019216:Metals, Heavy / Q000032:analysis*; D018570:Risk Assessment; D014874:Water Pollutants, Chemical / Q000032:analysis*
D007220:Industrial Waste; D019216:Metals, Heavy; D014874:Water Pollutants, Chemical