title: Dip-pen-nanolithographic patterning of metallic, semiconductor, and metal oxide nanostructures on surfaces.
abstract: Dip-pen nanolithography (DPN) is a powerful method to pattern nanostructures on surfaces by the controlled delivery of an "ink" coating the tip of an atomic force microscope upon scanning and contacting with surfaces. The growing interest in the use of nanoparticles as structural and functional elements for the fabrication of nanodevices suggests that the DPN-stimulated patterning of nanoparticles on surfaces might be a useful technique to assemble hierarchical architectures of nanoparticles that could pave methodologies for functional nanocircuits or nanodevices. This Review presents different methodologies for the nanolithographic patterning of metallic, semiconductor, and metal oxide nanostructures on surfaces. The mechanisms involved in the formation of the nanostructures are discussed and the effects that control the dimensions of the resulting patterns are reviewed. The possible applications of the nanostructures are also addressed.
authors.affiliation: Center for Micro- and Nanostructures, Vienna University of Technology, 1040 Vienna, Austria. basnar@tuwien.ac.at
authors.forename: Bernhard
authors.initials: B
authors.lastname: Basnar
authors.forename: Itamar
authors.initials: I
authors.lastname: Willner
mesh_terms: D053768:Metal Nanoparticles / Q000737:chemistry*; D045663:Quantum Dots; D013499:Surface Properties