title: In situ SEM indentation experiments: instruments, methodology, and applications.
abstract: The purpose of this article is to present the design and capabilities of two in situ scanning electron microscope (SEM) indentation instruments covering a large load range from microN to N. The capabilities and advantages of in situ SEM indentation are illustrated by two applications: indentation of a thin film and a nanowire. All the experiments were performed on electrodeposited cobalt, whose outstanding magnetic properties make it a candidate material for MEMS and NEMS devices.
authors.affiliation: Laboratory for Mechanics of Materials and Nanostructures, EMPA - Swiss Federal Laboratories for Materials Testing and Research, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland.
authors.forename: Rudy
authors.initials: R
authors.lastname: Ghisleni
authors.forename: Karolina
authors.initials: K
authors.lastname: Rzepiejewska-Malyska
authors.forename: Laetitia
authors.initials: L
authors.lastname: Philippe
authors.forename: Patrick
authors.initials: P
authors.lastname: Schwaller
authors.forename: Johann
authors.initials: J
authors.lastname: Michler
mesh_terms: D004867:Equipment Design; D008280:Magnetics; D008855:Microscopy, Electron, Scanning / Q000295:instrumentation* / Q000379:methods*; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D013499:Surface Properties