title: High precision high voltage divider and its application to electron beam ion traps.
abstract: A high precision high voltage divider has been developed for the electron beam ion trap in Shanghai. The uncertainty caused by the temperature coefficient of resistance (TCR) and the voltage coefficient of resistance has been studied in detail and was minimized to the level of ppm (10(-6)) range. Once the TCR was matched between the resistors, the precision of the dividing ratio finally reached the ppm range also. We measured the delay of the divider caused by the capacitor introduced to minimize voltage ripple to be 2.35 ms. Finally we applied the divider to an experiment to measure resonant energies for some dielectronic recombination processes for highly charged xenon ions. The final energies include corrections for both space charge and fringe field effects are mostly under 0.03%.
authors.affiliation: Shanghai EBIT Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433, People's Republic of China.
authors.forename: W D
authors.initials: WD
authors.lastname: Chen
authors.forename: J
authors.initials: J
authors.lastname: Xiao
authors.forename: Y
authors.initials: Y
authors.lastname: Shen
authors.forename: Y Q
authors.initials: YQ
authors.lastname: Fu
authors.forename: F C
authors.initials: FC
authors.lastname: Meng
authors.forename: C Y
authors.initials: CY
authors.lastname: Chen
authors.forename: Y
authors.initials: Y
authors.lastname: Zou
authors.forename: R
authors.initials: R
authors.lastname: Hutton