title: Experimental demonstration of a cross-order echelle grating triplexer based on an amorphous silicon nanowire platform.
abstract: We present the design, fabrication, and characterization of an ultracompact silicon-on-insulator-based echelle grating triplexer. It is based on the cross-order design, which utilizes different diffraction orders to cover a large spectral range from 1.3 to 1.5 microm with three channels located at 1310, 1490, and 1550 nm and with a footprint of 150 micromx130 microm.
authors.affiliation: Joint Research Center of Photonics of the Royal Institute of Technology, Department of Microelectronics and Applied Physics, Kista, Sweden. ningz@kth.se
authors.forename: Ning
authors.initials: N
authors.lastname: Zhu
authors.forename: Jun
authors.initials: J
authors.lastname: Song
authors.forename: Lech
authors.initials: L
authors.lastname: Wosinski
authors.forename: Sailing
authors.initials: S
authors.lastname: He
authors.forename: Lars
authors.initials: L
authors.lastname: Thylen