title: Monolayer resist for patterned contact printing of aligned nanowire arrays.
abstract: Large-area, patterned printing of nanowires by using fluorinated self-assembled monolayers as the resist layer is demonstrated. By projecting a light pattern on the surface of the monolayer resist in an oxygen-rich environment, sticky and nonsticky regions on the surface are directly defined in a single-step process which then enables the highly specific and patterned transfer of the nanowires by the contact printing process, without the need for a subsequent lift-off step. This work demonstrates a simple route toward scalable, patterned printing of nanowires on substrates by utilizing light-tunable, nanoscale chemical interactions and demonstrates the versatility of molecular monolayers for use as a resist layer.
authors.affiliation: Department of Electrical Engineering and Computer Sciences, University of California at Berkeley, Berkeley, California 94720, USA.
authors.forename: Toshitake
authors.initials: T
authors.lastname: Takahashi
authors.forename: Kuniharu
authors.initials: K
authors.lastname: Takei
authors.forename: Johnny C
authors.initials: JC
authors.lastname: Ho
authors.forename: Yu-Lun
authors.initials: YL
authors.lastname: Chueh
authors.forename: Zhiyong
authors.initials: Z
authors.lastname: Fan
authors.forename: Ali
authors.initials: A
authors.lastname: Javey