A photosensitive polyimide based method for an easy fabrication of multichannel neural electrodes.
To develop practical and inexpensive multichannel neural electrodes, we designed and fabricated photosensitive polyimide based flexible multichannel neural electrodes using MEMS technologies. Compared to a conventional micromachining with non-photosensitive materials, the advantage of applying photosensitive polyimide is the elimination of the dry etching, which involves the complex multilevel processes for controlling the etching conditions to define the outline of the neural electrodes and expose the microelectrodes. Thus, photosensitive polyimide allows more options in optimization of the configuration and size of neural electrodes depending on experimental purposes, and enables fabrication at a lower cost with improvement of process yields.
Kato
Yasuhiro X
YX
NTT Communication Science Laboratories, Nippon Telegraph and Telephone Corporation, Japan. xige@brl.ntt.co.jp
Maki
Katuhiro
K
Furukawa
Shigeto
S
Kashino
Makio
M
D000200:Action Potentials / Q000502:physiology*; D000818:Animals; D002540:Cerebral Cortex / Q000502:physiology*; D004567:Electrodes, Implanted; D004569:Electroencephalography / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008027:Light; D055617:Micro-Electrical-Mechanical Systems / Q000295:instrumentation; D008839:Microelectrodes; D009415:Nerve Net / Q000502:physiology; D009474:Neurons / Q000502:physiology*; D010777:Photochemistry / Q000379:methods; D051381:Rats; D015203:Reproducibility of Results; D012117:Resins, Synthetic / Q000737:chemistry* / Q000528:radiation effects; D012680:Sensitivity and Specificity
D012117:Resins, Synthetic; C029945:polyimide resin