PlasMOStor: a metal-oxide-Si field effect plasmonic modulator.
Realization of chip-based all-optical and optoelectronic computational networks will require ultracompact Si-compatible modulators, ideally comprising dimensions, materials, and functionality similar to electronic complementary metal-oxide-semiconductor (CMOS) components. Here we demonstrate such a modulator, based on field-effect modulation of plasmon waveguide modes in a MOS geometry. Near-infrared transmission between an optical source and drain is controlled by a gate voltage that drives the MOS into accumulation. Using the gate oxide as an optical channel, electro-optic modulation is achieved in device volumes of half of a cubic wavelength with femtojoule switching energies and the potential for gigahertz modulation frequencies.
Dionne
Jennifer A
JA
California Institute of Technology, Pasadena, California 91125, USA.
Diest
Kenneth
K
Sweatlock
Luke A
LA
Atwater
Harry A
HA