title: Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination.
abstract: We report the demonstration of a reflection microscope that operates at 13.2 nm wavelength with a spatial resolution of 55+/-3 nm. The microscope uses illumination from a tabletop extreme ultraviolet laser to acquire aerial images of photolithography masks with a 20 s exposure time. The modulation transfer function of the optical system was characterized.
authors.affiliation: National Science Foundation Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO 80523, USA. brizuela@engr.colostate.edu
authors.forename: F
authors.initials: F
authors.lastname: Brizuela
authors.forename: Y
authors.initials: Y
authors.lastname: Wang
authors.forename: C A
authors.initials: CA
authors.lastname: Brewer
authors.forename: F
authors.initials: F
authors.lastname: Pedaci
authors.forename: W
authors.initials: W
authors.lastname: Chao
authors.forename: E H
authors.initials: EH
authors.lastname: Anderson
authors.forename: Y
authors.initials: Y
authors.lastname: Liu
authors.forename: K A
authors.initials: KA
authors.lastname: Goldberg
authors.forename: P
authors.initials: P
authors.lastname: Naulleau
authors.forename: P
authors.initials: P
authors.lastname: Wachulak
authors.forename: M C
authors.initials: MC
authors.lastname: Marconi
authors.forename: D T
authors.initials: DT
authors.lastname: Attwood
authors.forename: J J
authors.initials: JJ
authors.lastname: Rocca
authors.forename: C S
authors.initials: CS
authors.lastname: Menoni