Experimental demonstration of a cross-order echelle grating triplexer based on an amorphous silicon nanowire platform.
We present the design, fabrication, and characterization of an ultracompact silicon-on-insulator-based echelle grating triplexer. It is based on the cross-order design, which utilizes different diffraction orders to cover a large spectral range from 1.3 to 1.5 microm with three channels located at 1310, 1490, and 1550 nm and with a footprint of 150 micromx130 microm.
Zhu
Ning
N
Joint Research Center of Photonics of the Royal Institute of Technology, Department of Microelectronics and Applied Physics, Kista, Sweden. ningz@kth.se
Song
Jun
J
Wosinski
Lech
L
He
Sailing
S
Thylen
Lars
L