Weak epitaxy growth of copper hexadecafluorophthalocyanine (F16CuPc) on p-sexiphenyl monolayer film.
Weak epitaxy growth (WEG) behavior and mechanism of copper hexadecafluorophthalocyanine (F16CuPc) on p-sexiphenyl (p-6P) monolayer film were investigated by atomic force microscopy (AFM), selected area electron diffraction (SEAD), and wide-angle X-ray diffraction (WAXD). High-quality F16CuPc films with high order, large size, and molecular-level smoothness were obtained successfully by WEG method. It was identified that there exists incommensurate epitaxial relation between highly oriented F16CuPc and p-6P films. The geometrical channels of p-6P monolayer surface induce the nucleation and growth of F16CuPc molecules. Two kinds of in-plane structures, referred to as "phase I" and "phase II", coexist in the initial few molecular layers. As thin-film thickness increases, the distance of (001) plane diminishes and phase I disappears. Furthermore, coalescence, dislocation, and high-angle grain boundary between F16CuPc neighboring domains were observed by high-resolution AFM.
Wang
Tong
T
State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Graduate School of Chinese Academy of Sciences, Changchun 130022, People's Republic of China.
Ebeling
Daniel
D
Yang
Junliang
J
Du
Chuan
C
Chi
Lifeng
L
Fuchs
Harald
H
Yan
Donghang
D