Wrinkled-up nanochannel networks: long-range ordering, scalability, and X-ray investigation.
Highly ordered two-dimensional self-organized nanochannel networks as well as free-standing nanomembranes are produced on rigid substrates by means of III-V semiconductor compressively strained layers grown on top of an etchant-sensitive material. The releasing process is controlled by regularly spaced pits obtained from photolithography and a subsequent wet chemical etching. By tuning basic film parameters such as strain and thickness, one obtains periodic arrays of two-dimensional nanochannel networks with symmetries defined by the shape and periodicity of the photolithographic starting pits. Such nanochannel networks with a submicroscale lateral feature size exhibit a surprising flexibility with respect to the crystal lattice symmetry, retaining the original film crystalline quality as confirmed by X-ray grazing-incidence diffraction (GID) measurements. Finite element modeling helps in understanding the particular process of the cross-nanochannel formation.
Malachias
Angelo
A
Max-Planck-Institut fur Festkorperforschung, Stuttgart, Germany.
Mei
Yongfeng
Y
Annabattula
Ratna K
RK
Deneke
Christoph
C
Onck
Patrick R
PR
Schmidt
Oliver G
OG
D003198:Computer Simulation; D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008956:Models, Chemical; D008958:Models, Molecular; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D012666:Semiconductors; D013499:Surface Properties; D014961:X-Ray Diffraction / Q000379:methods*
D046911:Macromolecular Substances