Ordering of PS-b-P4VP on patterned silicon surfaces.
We demonstrate a method to fabricate high-quality patterned micelle arrays using poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) block copolymer. Long-range order of the PS-b-P4VP micelle in hexagonal arrays was induced by topographic grating patterns during solvent annealing. The size and row spacing of block copolymer micelle arrays created in this way were uniform. By controlling the thickness of the polymer on the crests and in the troughs of the grating patterns, we prepared PS-b-P4VP micelle arrays having different sizes.
Park
Soojin
S
Department of Polymer Science & Engineering, University of Massachusetts, Amherst, Massachusetts 01003, USA.
Kim
Bokyung
B
Yavuzcetin
Ozgur
O
Tuominen
Mark T
MT
Russell
Thomas P
TP
D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D011137:Polystyrenes; D011145:Polyvinyls; D011725:Pyridines; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
D046911:Macromolecular Substances; D011137:Polystyrenes; D011145:Polyvinyls; D011725:Pyridines; C509607:polystyrene-block-poly(4-vinylpyridine); D012825:Silicon