title: Rotational UV lithography device for cylindrical substrate exposure.
abstract: Optical photolithograhy is a well developed technique, which is normally restricted to planar substrates used in microelectronics or microelectromechanical system fabrication. For other applications--e.g., patterning of stents--photolithography would be an attractive alternative to techniques such as laser structuring provided that the planar technique could be adapted to cylindrical geometries. This study presents the development of a three-dimensional UV photolithography exposure method using a synchronizing movement between a planar Cr mask and a circular substrate. This technique was successfully applied to tubes with outer diameters between 1 and 5 mm. A lateral resolution for a 5 microm feature size of 4.8 microm was achieved, which is close to the resolution of 4.6 microm for similar planar films.
authors.affiliation: Faculty of Engineering, Institute for Material Science, University of Kiel, Kaiserstr. 2, 24143 Kiel, Germany.
authors.forename: Rodrigo
authors.initials: R
authors.lastname: Lima de Miranda
authors.forename: Christiane
authors.initials: C
authors.lastname: Zamponi
authors.forename: Eckhard
authors.initials: E
authors.lastname: Quandt