title: Ordering of PS-b-P4VP on patterned silicon surfaces.
abstract: We demonstrate a method to fabricate high-quality patterned micelle arrays using poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) block copolymer. Long-range order of the PS-b-P4VP micelle in hexagonal arrays was induced by topographic grating patterns during solvent annealing. The size and row spacing of block copolymer micelle arrays created in this way were uniform. By controlling the thickness of the polymer on the crests and in the troughs of the grating patterns, we prepared PS-b-P4VP micelle arrays having different sizes.
authors.affiliation: Department of Polymer Science & Engineering, University of Massachusetts, Amherst, Massachusetts 01003, USA.
authors.forename: Soojin
authors.initials: S
authors.lastname: Park
authors.forename: Bokyung
authors.initials: B
authors.lastname: Kim
authors.forename: Ozgur
authors.initials: O
authors.lastname: Yavuzcetin
authors.forename: Mark T
authors.initials: MT
authors.lastname: Tuominen
authors.forename: Thomas P
authors.initials: TP
authors.lastname: Russell
mesh_terms: D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D011137:Polystyrenes; D011145:Polyvinyls; D011725:Pyridines; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D011137:Polystyrenes; D011145:Polyvinyls; D011725:Pyridines; C509607:polystyrene-block-poly(4-vinylpyridine); D012825:Silicon