Structure of the buried metal-molecule interface in organic thin film devices.
By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 A titanium and 100 A aluminum. By comparison of XR data for the five-layer Pb2+ arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (approximately 5 nm) is completely destroyed due to the metal deposition.
Hansen
Christian R
CR
Danish National Research Foundations Centre for Molecular Movies, Nano-Science Center, Niels Bohr Institute, and Department of Chemistry, University of Copenhagen, Universitetsparken 5, DK-2100, Denmark.
Sørensen
Thomas J
TJ
Glyvradal
Magni
M
Larsen
Jacob
J
Eisenhardt
Sara H
SH
Bjørnholm
Thomas
T
Nielsen
Martin M
MM
Feidenhans'l
Robert
R
Laursen
Bo W
BW
D000465:Algorithms; D000535:Aluminum / Q000737:chemistry; D004537:Eicosanoic Acids / Q000737:chemistry; D004566:Electrodes; D004583:Electrons; D004867:Equipment Design; D007854:Lead / Q000737:chemistry; D053768:Metal Nanoparticles / Q000737:chemistry; D008962:Models, Theoretical; D008968:Molecular Conformation; D036103:Nanotechnology / Q000379:methods*; D009930:Organic Chemicals / Q000737:chemistry; D013499:Surface Properties; D014965:X-Rays
D004537:Eicosanoic Acids; D009930:Organic Chemicals; D007854:Lead; D000535:Aluminum; C094477:arachidic acid