Simultaneous measurement method of total and self-interference for the volumetric thickness-profilometer.
A simultaneous measurement method for the total interference and self-interference of a sample is proposed. The proposed method is capable of making separate measurements of the thickness and surface profile of micro-patterned thin film. The system is an extension of a full-field wavelength scanning interferometer with a single acousto-optic tunable filter (AOTF) as a spectral imaging device. Separate measurements are realized via the polarization-sensitive diffraction of non-collinear acousto-optic interaction. That is, the diffraction angle of an AOTF is separated into different directions depending on the polarization state of the incident light. In so doing, the polarization states of a reference and a sample light were manipulated differently so that a single AOTF can generate the total interference and the self-interference signal in different directions simultaneously. Thus, a compact and light-efficient system is realized with an AOTF, a beam splitter and two CCDs. Thus, a compact system with light-efficiency of two to four times higher than the previously reported system is realized with an AOTF, a beam splitter and two CCDs. Details of the calibration procedures such as wavelength-frequency relation, image shift and registration between two CCDs are provided for the proposed setup. Experimental results are provided and compared to those using commercial equipment that demonstrate the efficiency of the proposed system for the high-speed measurements of the thickness and the surface profile of micro-patterned thin film.
You
Jang-Woo
JW
Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Yusong-gu, Daejeon, Republic of Korea.
Kim
Daesuk
D
Ryu
Sung Yoon
SY
Kim
Soohyun
S