title: Photoinduced acceleration of the effluent rate of developing solvents in azobenzene-tethered silica gel.
abstract: The switching of a molecular length of azobenzene between its trans and cis forms by photoirradiation originates various photoresponsive systems in the molecular level and/or nanolevel. Recently, we and another group separately reported that some azobenzene-modified mesoporous silicas remarkably promote the release of molecules from the inside of the mesopore to the outside, when the lights, both UV and visible lights, were irradiated simultaneously. In these cases, the release rates of molecules were enhanced by the impeller-like effect of molecular motion of azobenzene moiety attributed to the continuous photoisomerization between the trans and cis isomers. This paper presents that azobenzene-substituent-tethered amorphous silica gel could promote the development of solvents in chromatography systems by photoirradiation. In column chromatography system where azobenzene-tethered silica gel was packed, the irradiation of both UV and visible lights increased the effluent rate of the developing solvents. The single irradiation of UV light scarcely enhanced the rate, while the visible light irradiation longer than 400 nm in wavelength also accelerated the development of the solvent moderately. The same kinds of phenomena were observed when this photopromoted chromatography system was applied to thin layer chromatography (TLC). Hydrocarbon developing solvents in the regions, where UV and visible lights were irradiated, moved up the TLC plate higher than those without photoirradiation. When the pyrene solution in the developing solvent was utilized in the chromatography systems, the similar photoacceleration of pyrene development was observed at the same level as the developing solvents.
authors.affiliation: National Institute of Advanced Industrial Science and Technology, Kansai Center (Nanotechnology Research Institute), Ikeda, Osaka 563-8577, Japan. m-fujiwara@aist.go.jp
authors.forename: Masahiro
authors.initials: M
authors.lastname: Fujiwara
authors.forename: Minako
authors.initials: M
authors.lastname: Akiyama
authors.forename: Momoko
authors.initials: M
authors.lastname: Hata
authors.forename: Kumi
authors.initials: K
authors.lastname: Shiokawa
authors.forename: Ryoki
authors.initials: R
authors.lastname: Nomura
mesh_terms: D001391:Azo Compounds / Q000737:chemistry* / Q000528:radiation effects; D003460:Crystallization / Q000379:methods*; D005782:Gels / Q000737:chemistry / Q000528:radiation effects; D008027:Light; D046911:Macromolecular Substances / Q000737:chemistry / Q000528:radiation effects; D008422:Materials Testing; D008968:Molecular Conformation / Q000528:radiation effects; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D010777:Photochemistry / Q000379:methods*; D012822:Silicon Dioxide / Q000737:chemistry* / Q000528:radiation effects; D012997:Solvents / Q000737:chemistry / Q000528:radiation effects; D013499:Surface Properties / Q000528:radiation effects
chemical_list: D001391:Azo Compounds; D005782:Gels; D046911:Macromolecular Substances; D012997:Solvents; D012822:Silicon Dioxide; C009850:azobenzene