A simple top-down/bottom-up approach to sectored, ordered arrays of nanoscopic elements using block copolymers.
A top-down/bottom-up approach is demonstrated by combining electron-beam (e-beam) lithography and a solvent annealing process. Micellar arrays of polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) with a high degree of lateral order can be produced on a surface where sectoring is defined by e-beam patterning. The e-beam is used to crosslink the block copolymer (BCP) film immediately after spin-coating when the BCP is disordered or in a highly ordered solvent-annealed film. Any patterns can be written into the BCP by crosslinking. Upon exposure to a preferential solvent for the minor component block followed by drying, cylindrical nanopores are generated within the nonexposed areas by a surface reconstruction process, while, in the exposed areas, the films remain unchanged. Nickel nanodot arrays can be placed over selected areas on a surface by thermal evaporation and lift-off process.
Park
Soojin
S
Department of Polymer Science and Engineering, University of Massachusetts, Amherst, MA 01003, USA.
Yavuzcetin
Ozgur
O
Kim
Bokyung
B
Tuominen
Mark T
MT
Russell
Thomas P
TP
D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D011137:Polystyrenes / Q000737:chemistry*; D011145:Polyvinyls / Q000737:chemistry*; D013499:Surface Properties
D046911:Macromolecular Substances; D011137:Polystyrenes; D011145:Polyvinyls; C521882:poly(styrene)-block-poly(4-vinylpyrindine) diblock copolymer