title: Selective photochromic dye patterning using spiroxazine compound.
abstract: We have studied a selective dye patterning system using light stamping lithography (LSL) method, where the photochromic colorant was applied to confirm the prepared micro patterns. The steps of this process consist of substrate (glass slide) preparation, polydimethylsiloxane (PDMS) transfer and final photochromic dye deposition on the patterns. To determine the designed pattern images, the photochromic spiroxazine compound having rapid color absorption and desirable light fastness properties was selected and synthesized. The resulting deposition characteristics of this spiroxazine dye pattern were characterized using UV-spectrophotometer and image analysis. It is proposed that this selective photochromic dye pattern was obtained by physical and hydrophobic interactions between PDMS mold and spiroxazine molecules. This fabricated spiroxazine dye patterns show a good response with repeated UV light stimuli and visible light on-off test.
authors.affiliation: Department of Chemical Engineering, Chungnam National University, Daejeon 305-764, Korea.
authors.forename: Chang-Soo
authors.initials: CS
authors.lastname: Lee
authors.forename: Young-Min
authors.initials: YM
authors.lastname: Park
authors.forename: Bo-Yeol
authors.initials: BY
authors.lastname: Kim
authors.forename: Young-A
authors.initials: YA
authors.lastname: Son