title: UV-VIS spectra and photoinitiation behaviors of acylphosphine oxide and bisacylphosphine oxide derivatives in unfilled, light-cured dental resins.
abstract: The aims of this study were to investigate the photoinitiation behaviors of acylphosphine oxide (APO) and bisacylphosphine oxide (BAPO) derivatives in comparison to D,L-camphorquinone (CQ)/tertiary amine (EDAB) system. Fifty six kinds of experimental unfilled, light-cured resins were prepared using APO, BAPO, CQ, EDAB, resin monomers, and adhesive monomers. The measurements of ultraviolet-visible (UV-VIS) spectroscopy, photopolymerization with differential scanning calorimeter (photo-DSC) and degree of conversion (DC) determination were performed. Results showed that the UV-VIS spectra of all APO and BAPO derivatives possessed lambda max ranging between 365 and 416 nm. Their photoinitiation behaviors were not influenced by acidic adhesive monomers formulated in unfilled Bis-GMA-based resins (p < 0.05). Although BAPO exhibited higher reactivity than CQ/EDAB in unfilled 6-methacryloyloxyhexcyl phosphonoacetate (6-MHPA)/ 2-hydroxyethyl methacrylate (HEMA) and 6-MHPA/glycerol monomethacrylate (GM)-based resins, it was found that there were no statistically significant differences in DC (%) between BAPO [44.2(6.5)-51.2(4.3)] and CQ/EDAB [42.4(4.4)-47.5(3.7)] (p < 0.05). It was concluded that APO and BAPO photoinitiators exhibited reactivity comparable to that of CQ/tertiary amine system.
authors.affiliation: Department of Research and Development, Shofu Inc., 11 Kamitakamatsu-cho, Fukuine, Higashiyama-ku, Kyoto 605-0983, Japan. k-ikemura@shofu.co.jp
authors.forename: Kunio
authors.initials: K
authors.lastname: Ikemura
authors.forename: Kensuke
authors.initials: K
authors.lastname: Ichizawa
authors.forename: Mariko
authors.initials: M
authors.lastname: Yoshida
authors.forename: So
authors.initials: S
authors.lastname: Ito
authors.forename: Takeshi
authors.initials: T
authors.lastname: Endo
mesh_terms: D017438:Bisphenol A-Glycidyl Methacrylate / Q000737:chemistry / Q000528:radiation effects; D002152:Calorimetry, Differential Scanning; D003188:Composite Resins / Q000737:chemistry / Q000528:radiation effects*; D003764:Dental Materials / Q000737:chemistry / Q000528:radiation effects*; D006801:Humans; D008027:Light; D008422:Materials Testing; D008689:Methacrylates / Q000737:chemistry / Q000528:radiation effects; D010720:Phosphines / Q000737:chemistry / Q000528:radiation effects*; D010746:Phosphonoacetic Acid / Q000737:chemistry / Q000528:radiation effects; D011092:Polyethylene Glycols / Q000737:chemistry / Q000528:radiation effects; D011108:Polymers / Q000737:chemistry / Q000528:radiation effects; D011109:Polymethacrylic Acids / Q000737:chemistry / Q000528:radiation effects; D013056:Spectrophotometry, Ultraviolet; D013729:Terpenes / Q000737:chemistry / Q000528:radiation effects; D014233:Tricarboxylic Acids / Q000737:chemistry / Q000528:radiation effects
chemical_list: C111562:4-acryloxyethyltrimellitic acid; D003188:Composite Resins; D003764:Dental Materials; D008689:Methacrylates; D010720:Phosphines; D011108:Polymers; D011109:Polymethacrylic Acids; D013729:Terpenes; D014233:Tricarboxylic Acids; C020946:triethylene glycol dimethacrylate; D011092:Polyethylene Glycols; D017438:Bisphenol A-Glycidyl Methacrylate; C048339:camphoroquinone; C005044:hydroxyethyl methacrylate; C034139:4-methacryloxyethyltrimellitic acid anhydride; D010746:Phosphonoacetic Acid