title: Low loss high index contrast nanoimprinted polysiloxane waveguides.
abstract: Nanoimprint lithography is gaining rapid acceptance in fields as diverse as microelectronics and microfluidics due to its simplicity high resolution and low cost. These properties are critically important for the fabrication of photonic devices, where cost is often the major inhibiting deployment factor for high volume applications. We report here on the use of nanoimprint technology to fabricate low loss broadband high index contrast waveguides in a Polysiloxane polymer system for the first time.
authors.affiliation: Laser Physics Center, Australian National University, ACT 0200, Australia. tih111@rsphysse.anu.edu.au
authors.forename: Ting
authors.initials: T
authors.lastname: Han
authors.forename: Steve
authors.initials: S
authors.lastname: Madden
authors.forename: Mathew
authors.initials: M
authors.lastname: Zhang
authors.forename: Robbie
authors.initials: R
authors.lastname: Charters
authors.forename: Barry
authors.initials: B
authors.lastname: Luther-Davies
mesh_terms: D008027:Light; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D012031:Refractometry / Q000379:methods*; D012542:Scattering, Radiation; D012833:Siloxanes / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D012833:Siloxanes