title: Tuning curvature in flow lithography: a new class of concave/convex particles.
abstract: Polymeric particles of complex shapes and chemistry have been used for a wide variety of applications in the materials and bioengineering fields. An interesting means of introducing complexity is through curvature. In this work, stop-flow lithography is used to generate concave/convex particles at high throughputs of 3x10(4) particles/h. These particles have finely tuned curvature in the plane orthogonal to the plane of projection of light. The shape in the plane of projection of light is determined by the mask shape. The chemical programmability of this technique is further demonstrated by creating multifunctional particles, i.e., patchy and capped particles. The directed assembly of these particles can find potential application in a variety of fields like biology, photonics, and liquid crystals.
authors.affiliation: Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, USA.
authors.forename: Priyadarshi
authors.initials: P
authors.lastname: Panda
authors.forename: Kai P
authors.initials: KP
authors.lastname: Yuet
authors.forename: T Alan
authors.initials: TA
authors.lastname: Hatton
authors.forename: Patrick S
authors.initials: PS
authors.lastname: Doyle
mesh_terms: D000179:Acrylates / Q000737:chemistry*; D053758:Nanoparticles / Q000737:chemistry*; D011092:Polyethylene Glycols / Q000737:chemistry*
chemical_list: D000179:Acrylates; C437167:poly(ethylene glycol)diacrylate; D011092:Polyethylene Glycols; C027993:trimethylolpropane triacrylate