Replication of DNA submicron patterns by combining nanoimprint lithography and contact printing.
We describe a high throughput method of printing DNA submicron patterns on solid substrates. Combining nanoimprint lithography and contact printing, uniform DNA patterns can be produced with feature sizes from 2 microm down to 250 nm. In this method, poly(methylmethacrylate) (PMMA) with submicron line or dot patterns (produced by nanoimprint lithography) is first chemically functionalized with poly(ethyleneimine) (PEI) to aminate the surface and then a DNA pattern is prepared on the surface. PEI modification leads to higher DNA immobilization and DNA hybridization efficiency due to a higher density of amine functional groups provided by PEI. Next, complementary target DNA hybridized to the PMMA surface can be transferred to an aminated glass slide through contact printing. The transfer mechanism is due to electrostatic attraction (between DNA and amine groups) which can overcome hydrogen bonds between two hybridized DNA molecules. DNA transferred from the PMMA to the glass slide still can hybridize with DNA having a complementary sequence. This method provides a facile and high throughput means of preparing uniform DNA submicron patterns which are difficult to prepare by using conventional solution-based methods.
Wang
Yadong
Y
Department of Chemical and Biomolecular Engineering, National University of Singapore, 4 Engineering Drive 4, Singapore 117576.
Goh
Shook Hui
SH
Bi
Xinyan
X
Yang
Kun-Lin
KL
D004247:DNA / Q000737:chemistry*; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D010316:Particle Size; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D013499:Surface Properties
D004247:DNA; D019904:Polymethyl Methacrylate