Anomalous diffusion mediated by atom deposition into a porous substrate.
Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.
Brault
Pascal
P
Groupe de Recherches sur l'Energétique des Milieux Ionisés, UMR6606, Université d'Orléans, France.
Josserand
Christophe
C
Bauchire
Jean-Marc
JM
Caillard
Amaël
A
Charles
Christine
C
Boswell
Rod W
RW