title: Anomalous diffusion mediated by atom deposition into a porous substrate.
abstract: Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time.
authors.affiliation: Groupe de Recherches sur l'Energétique des Milieux Ionisés, UMR6606, Université d'Orléans, France.
authors.forename: Pascal
authors.initials: P
authors.lastname: Brault
authors.forename: Christophe
authors.initials: C
authors.lastname: Josserand
authors.forename: Jean-Marc
authors.initials: JM
authors.lastname: Bauchire
authors.forename: Amaël
authors.initials: A
authors.lastname: Caillard
authors.forename: Christine
authors.initials: C
authors.lastname: Charles
authors.forename: Rod W
authors.initials: RW
authors.lastname: Boswell