Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation.
We have successfully fabricated low-loss silicon-on-oxidized-porous-silicon (SOPS) strip waveguides with high-index contrast using focused proton-beam irradiation and electrochemical etching. Smooth surface quality with rms roughness of 3.1 nm is achieved for a fluence of 1x10(15)/cm(2) after postoxidation treatment. Optical characterization at a wavelength of 1550 nm shows a loss of 1.1+/-0.4 dB/cm and 1.2+/-0.4 dB/cm in TE and TM polarization respectively, which we believe is the lowest reported loss for SOPS waveguides. This opens up new opportunities for all-silicon-based optoelectronics applications.
Teo
E J
EJ
Centre for Ion Beam Applications, Department of Physics, National University of Singapore, Singapore. phytej@nus.edu.sg
Bettiol
A A
AA
Yang
P
P
Breese
M B H
MB
Xiong
B Q
BQ
Mashanovich
G Z
GZ
Headley
W R
WR
Reed
G T
GT