title: Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation.
abstract: We have successfully fabricated low-loss silicon-on-oxidized-porous-silicon (SOPS) strip waveguides with high-index contrast using focused proton-beam irradiation and electrochemical etching. Smooth surface quality with rms roughness of 3.1 nm is achieved for a fluence of 1x10(15)/cm(2) after postoxidation treatment. Optical characterization at a wavelength of 1550 nm shows a loss of 1.1+/-0.4 dB/cm and 1.2+/-0.4 dB/cm in TE and TM polarization respectively, which we believe is the lowest reported loss for SOPS waveguides. This opens up new opportunities for all-silicon-based optoelectronics applications.
authors.affiliation: Centre for Ion Beam Applications, Department of Physics, National University of Singapore, Singapore. phytej@nus.edu.sg
authors.forename: E J
authors.initials: EJ
authors.lastname: Teo
authors.forename: A A
authors.initials: AA
authors.lastname: Bettiol
authors.forename: P
authors.initials: P
authors.lastname: Yang
authors.forename: M B H
authors.initials: MB
authors.lastname: Breese
authors.forename: B Q
authors.initials: BQ
authors.lastname: Xiong
authors.forename: G Z
authors.initials: GZ
authors.lastname: Mashanovich
authors.forename: W R
authors.initials: WR
authors.lastname: Headley
authors.forename: G T
authors.initials: GT
authors.lastname: Reed