title: Photodegradation of SF6 on polyisoprene surface: implication on elimination of toxic byproducts.
abstract: Photodegradation of SF(6) was performed on the surface of polyisoprene (PI) based on a brand new mechanism of "controlled release of radicals". Effective decomposition of SF(6) (60% of SF(6) was degraded in 4h) was achieved due to the highly reductive radicals (mainly allylic radicals and excited CC bond) which were generated from the photolysis of PI. No toxic fluoride was detected by FT-IR. The PI irradiated for 200 h in SF(6) circumstance was examined by XPS to be doped with fluorine and sulfur. Fouling due to photoinitiated polymerization on UV lamp was avoided because the radicals were released slowly. Photolysis of SF(6) in pure argon with the presence of irradiated PI showed kinetics of pseudo-first-order reaction and the degradation rate constant was 5.16 x 10(-5)s(-1). Factors which may affect the photolysis process such as introduction of O(2) and H(2)O were also examined.
authors.affiliation: Institute of Environmental Science, Fudan University, Shanghai, PR China.
authors.forename: Xiaoxiao
authors.initials: X
authors.lastname: Song
authors.forename: Xingang
authors.initials: X
authors.lastname: Liu
authors.forename: Zhaolian
authors.initials: Z
authors.lastname: Ye
authors.forename: Jincong
authors.initials: J
authors.lastname: He
authors.forename: Renxi
authors.initials: R
authors.lastname: Zhang
authors.forename: Huiqi
authors.initials: H
authors.lastname: Hou
mesh_terms: D001128:Argon; D002070:Butadienes / Q000737:chemistry*; D005609:Free Radicals; D015386:Hazardous Substances / Q000528:radiation effects; D006256:Hazardous Waste / Q000517:prevention & control; D045782:Hemiterpenes / Q000737:chemistry*; D007700:Kinetics; D010100:Oxygen / Q000737:chemistry; D010420:Pentanes / Q000737:chemistry*; D010782:Photolysis; D013459:Sulfur Hexafluoride / Q000737:chemistry / Q000528:radiation effects*; D014466:Ultraviolet Rays; D014867:Water / Q000737:chemistry
chemical_list: D002070:Butadienes; D005609:Free Radicals; D015386:Hazardous Substances; D006256:Hazardous Waste; D045782:Hemiterpenes; D010420:Pentanes; D014867:Water; C005059:isoprene; D001128:Argon; D010100:Oxygen; D013459:Sulfur Hexafluoride