Chemical shift of electron energy-loss near-edge structure on the nitrogen K-edge and titanium L3-edge at TiN/Ti interface.
We investigated the chemical shift of the electron energy-loss near-edge structure (ELNES) for the nitrogen K-edge and titanium L3-edge measured from the interface region between a titanium nitride layer and a titanium layer. Both the titanium nitride and titanium layers were prepared by a sputtering method. Elemental analysis for nitride and titanium in the vicinity of the interface region was performed using a standard technique in electron energy-loss spectroscopy. It was demonstrated that both the ELNES of nitrogen K-edge and titanium L3-edge presented the chemical shift, more or less, depending on the composition of TiNx. The experimental findings were interpreted using a first-principles band structure calculation. The chemical shifts of nitrogen K-edge and titanium L3-edge can be used as fingerprinting for readily distinguishing the composition of TiNx.
Terada
Shohei
S
Materials Research Laboratory, Hitachi Ltd., 7-1-1 Omika, Hitachi, Ibaraki 319-1292, Japan. shohei.terada.cq@hitachi.com
Asayama
Kyoichiro
K
Tsujimoto
Masahiko
M
Kurata
Hiroki
H
Isoda
Seiji
S
D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D009584:Nitrogen / Q000737:chemistry*; D046590:Spectroscopy, Electron Energy-Loss / Q000379:methods*; D014025:Titanium / Q000737:chemistry*
C041500:titanium nitride; D014025:Titanium; D009584:Nitrogen