Lock release lithography for 3D and composite microparticles.
We present a method called "Lock Release Lithography (LRL)" that utilizes a combination of channel topography, mask design, and pressure-induced channel deformation to form and release particles in a cycled fashion. This technique provides a means for the high-throughput production of particles with complex 3D morphologies and composite particles with spatially configurable chemistries. In this work, we demonstrate a diverse set of functional particles including those displaying heterogeneous swelling characteristics and containing functional entities such as nucleic acids, proteins and beads.
Bong
Ki Wan
KW
Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.
Pregibon
Daniel C
DC
Doyle
Patrick S
PS
D001274:Atmospheric Pressure; D004129:Dimethylpolysiloxanes / Q000737:chemistry; D004548:Elasticity; D005456:Fluorescent Dyes / Q000737:chemistry; D021621:Imaging, Three-Dimensional; D008832:Microchemistry / Q000379:methods*; D049329:Nanostructures / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D011092:Polyethylene Glycols / Q000737:chemistry; D012235:Rhodamines / Q000737:chemistry
D004129:Dimethylpolysiloxanes; D005456:Fluorescent Dyes; D012235:Rhodamines; C437167:poly(ethylene glycol)diacrylate; D011092:Polyethylene Glycols; C013830:baysilon