title: Lock release lithography for 3D and composite microparticles.
abstract: We present a method called "Lock Release Lithography (LRL)" that utilizes a combination of channel topography, mask design, and pressure-induced channel deformation to form and release particles in a cycled fashion. This technique provides a means for the high-throughput production of particles with complex 3D morphologies and composite particles with spatially configurable chemistries. In this work, we demonstrate a diverse set of functional particles including those displaying heterogeneous swelling characteristics and containing functional entities such as nucleic acids, proteins and beads.
authors.affiliation: Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA.
authors.forename: Ki Wan
authors.initials: KW
authors.lastname: Bong
authors.forename: Daniel C
authors.initials: DC
authors.lastname: Pregibon
authors.forename: Patrick S
authors.initials: PS
authors.lastname: Doyle
mesh_terms: D001274:Atmospheric Pressure; D004129:Dimethylpolysiloxanes / Q000737:chemistry; D004548:Elasticity; D005456:Fluorescent Dyes / Q000737:chemistry; D021621:Imaging, Three-Dimensional; D008832:Microchemistry / Q000379:methods*; D049329:Nanostructures / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D011092:Polyethylene Glycols / Q000737:chemistry; D012235:Rhodamines / Q000737:chemistry
chemical_list: D004129:Dimethylpolysiloxanes; D005456:Fluorescent Dyes; D012235:Rhodamines; C437167:poly(ethylene glycol)diacrylate; D011092:Polyethylene Glycols; C013830:baysilon