title: An understanding of enhanced osteoblast adhesion on various nanostructured polymeric and metallic materials prepared by ionic plasma deposition.
abstract: The development of new materials through novel surface modification techniques to enhance orthopedic implant lifetimes (hence, decreasing the need for revision surgery) is of great interest to the medical community. The purpose of this in vitro study was to treat common metallic implant materials [such as titanium (Ti) and a titanium alloy (Ti6Al4V)] and traditional polymeric materials (like polyethylene terephthalate, polyvinyl chloride, polyurethane, polytetrafluoroethylene, ultra-high molecular weight polyethylene (UHMWPE) and nylon) with either nanoparticulate alumina or titanium using novel (i) ionic plasma deposition (IPD) and (ii) nitrogen ion immersion plasma deposition (NIIPD) techniques. The treated surfaces were characterized by scanning electron microscopy, atomic force microscopy and surface energy, demonstrating greater nanoscale roughness on the modified surfaces regardless of the underlying material or coating applied. These surface-modified substrates were also tested for cytocompatibility properties with osteoblasts (or bone-forming cells). Results showed increased osteoblast adhesion on modified compared to control (traditional or untreated) materials. Since the adhesion of osteoblasts is the first crucial step for new bone synthesis, these results are very promising and suggest that the plasma deposition processes used in this study should be further investigated to improve the longevity of orthopedic implants.
authors.affiliation: Department of Orthopedics, Division of Engineering, Brown University, Providence, Rhode Island 02912, USA.
authors.forename: Rajesh A
authors.initials: RA
authors.lastname: Pareta
authors.forename: Alexander B
authors.initials: AB
authors.lastname: Reising
authors.forename: Tiffany
authors.initials: T
authors.lastname: Miller
authors.forename: Dan
authors.initials: D
authors.lastname: Storey
authors.forename: Thomas J
authors.initials: TJ
authors.lastname: Webster