title: Hafnium carbamates and ureates: new class of precursors for low-temperature growth of HfO2 thin films.
abstract: Novel volatile compounds of hafnium, namely tetrakis-N,O-dialkylcarbamato hafnium(iv) [Hf((i)PrNC(O)O(i)Pr)(4)] () and tetrakis-N,N,N'-trialkylureato hafnium(iv) [Hf((i)PrNC(O)N-(Me)Et)(4)] (), have been synthesized through the simple insertion reaction of isopropyl isocyanate into hafnium isopropoxide and hafnium ethylmethylamide, respectively; based on the promising thermal properties, compound has been evaluated as a precursor for metalorganic chemical vapor deposition (MOCVD) of HfO(2) thin films, which resulted in the growth of stoichiometric and crystalline layers with a uniform morphology at temperature as low as 250 degrees C.
authors.affiliation: Lehrstuhl für Anorganische Chemie II, Inorganic Materials Chemistry Group, Ruhr-University Bochum, D-44780, Bochum, Germany.
authors.forename: Ramasamy
authors.initials: R
authors.lastname: Pothiraja
authors.forename: Andrian P
authors.initials: AP
authors.lastname: Milanov
authors.forename: Davide
authors.initials: D
authors.lastname: Barreca
authors.forename: Alberto
authors.initials: A
authors.lastname: Gasparotto
authors.forename: Hans-Werner
authors.initials: HW
authors.lastname: Becker
authors.forename: Manuela
authors.initials: M
authors.lastname: Winter
authors.forename: Roland A
authors.initials: RA
authors.lastname: Fischer
authors.forename: Anjana
authors.initials: A
authors.lastname: Devi