Effect of surface manufacturing error of cubic phase mask in wavefront coding system.
The degenerated performance of extend depth of field (EDoF) in wavefront coding system which using cubic phase mask is simulated. A periodical rotationally symmetric surface error structure is presented and combined with comparison the similarity of point spread function (PSF). The peak to valley (PV) error of the cubic surface is needed smaller than 15% compare with the sag of the cubic surface for low period error existed.
Chang
Chuan-Chung
CC
Department of Optics and Photonics, National Central University, Chung-Li 320, Taiwan. chuanchungchang@itri.org.tw
Lee
Cheng-Chung
CC
D003198:Computer Simulation; D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007909:Lenses; D008027:Light; D008962:Models, Theoretical; D015203:Reproducibility of Results; D012542:Scattering, Radiation; D012680:Sensitivity and Specificity