Generation of metal photomasks by dip-pen nanolithography.
Jang
Jae-Won
JW
Department of Chemistry and International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208-3113, USA.
Sanedrin
Raymond G
RG
Senesi
Andrew J
AJ
Zheng
Zijian
Z
Chen
Xiaodong
X
Hwang
Seongpil
S
Huang
Ling
L
Mirkin
Chad A
CA
D000097:Acetonitriles / Q000737:chemistry; D004566:Electrodes; D006046:Gold / Q000737:chemistry; D008422:Materials Testing; D053768:Metal Nanoparticles / Q000737:chemistry*; D008670:Metals / Q000737:chemistry*; D008853:Microscopy / Q000379:methods; D018625:Microscopy, Atomic Force / Q000379:methods; D008855:Microscopy, Electron, Scanning / Q000379:methods; D036103:Nanotechnology / Q000379:methods*; D053770:Nanowires / Q000737:chemistry; D010777:Photochemistry / Q000379:methods; D011092:Polyethylene Glycols / Q000737:chemistry; D013499:Surface Properties; D013696:Temperature
D000097:Acetonitriles; D008670:Metals; D011092:Polyethylene Glycols; D006046:Gold; C032159:acetonitrile