Energy flow in light-coupling masks for lensless optical lithography.
We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist.
Martin
O
O
Piller
N
N
Schmid
H
H
Biebuyck
H
H
Michel
B
B