Submicrometer chemical patterning with high throughput using magnetolithography.
This letter demonstrates the ability to pattern surfaces chemically with submicrometer resolution by applying the simple and inexpensive magnetolithography (ML) method. This method allows fast patterning of large surfaces without having to face contamination problems or the need to remove the substrate from the solution. With ML it is possible to obtain pattern whose width is narrower than the width of the lines in the mask. By applying the green fluorescent protein (GFP), we were able to probe a 30 nm line of hydrophobic molecules patterned on a substrate coated with a hydrophilic monolayer.
Bardea
Amos
A
Department of Chemical Physics, The Weizmann Institute, Rehovot 76110, Israel.
Naaman
Ron
R