Study of the new ellipsometric measurement method using integrated analyzer in parallel mode.
A new type of ellipsometer using an integrated analyzer composed of 12 sub-analyzers with different azimuth angles was constructed and studied. By using a two-dimensional CCD array camera to measure the light intensity emerging in parallel from each sub-analyzer with the azimuth angles uniformly distributed in the range of about 180 degrees , the ellipsometric parameters were extracted within the data acquisition time less than 1 second. The ellipsometric parameters for the polished bulk Si sample were measured to show good agreement with the results measured by using another two ellipsometric methods. The new method having the merits of high speed and reliability in the optical data measurement can be potentially used in the fields where the in situ data acquisition with high precision is the key issue as required.
The Key Lab of Advanced Photonic Materials and Devices, Department of Optical Science and Engineering, Fudan University, 200433 Shanghai, China.
Peng-Hui
PH
Mao
Yu-Xiang
YX
Zheng
Yue-Rui
YR
Chen
Qing-Yuan
QY
Cai
Rong-Jun
RJ
Zhang
Liang-Yao
LY
Chen