Vapor-deposited thin films with negative real refractive index in the visible regime.
A thin film comprising parallel tilted nanorods was deposited by directing silver vapor obliquely towards a plane substrate. The reflection and transmission coefficients of the thin film were measured at three wavelengths in the visible regime for normal-illumination conditions, using ellipsometry and walk-off interferometry. The thin film was found to display a negative real refractive index. Since vapor deposition is a well-established industrial technique to deposit thin films, this finding is promising for large-scale production of negatively refracting metamaterials.
Department of Electro-Optical Engineering, National Taipei University of Technology, Taipei, Taiwan. jyjun@ntut.edu.tw
Yi-Jun
YJ
Jen
Akhlesh
A
Lakhtakia
Ching-Wei
CW
Yu
Chin-Te
CT
Lin