Synthesis of superhydrophobic silicon oxide nanowires surface on silicon wafer.
High roughness of several hundreds of nanometers and low free energy introduced the superhydrophobic surface with a high water contact angle of approximatelt 160 degrees for the chemically modified silicon oxide nanowires on silicon wafer. Particularly, a very small rolling angle of < 5 degrees with the annealed sample was observed. The nano-structure with high roughness and organic perfluoroalkysilane coating with CF2/CF3 groups contributed the superhydrophobicity. The present superhydrophobic nanowires surface on silicon wafer suggests the potential applications in self-cleaning semiconductor devices such as radar surface, solar cell.
School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, PR China.
Jun Jie
JJ
Niu
Jian Nong
JN
Wang
Qian Feng
QF
Xu