The fabrication of Co-Pt electro-deposited bit patterned media with nanoimprint lithography.
Bit patterned media with 25 nm hole diameter and 50 nm pitch size were fabricated with serial processes comprising master patterning with electron-beam lithography, a Si etching process, multi-layer soft stamp replication, and UV nanoimprinting, followed by Co-Pt magnetic material filling by electro-deposition. From these processes, the designed patterns were well defined, and perpendicular magnetic anisotropy of the fabricated bit patterned media was obtained.
Samsung Advanced Institute of Technology, Yongin-si, Gyeonggi-do, Korea. sohn@samsung.com
Jin-Seung
JS
Sohn
Duhyun
D
Lee
Eunhyoung
E
Cho
Hae-Sung
HS
Kim
Byung-Kyu
BK
Lee
Myung-Bok
MB
Lee
Su-Jeong
SJ
Suh