Direct patterning of zinc oxide with control of reflected color through nano-oxidation using an atomic force microscope.
Atomic force microscope oxidation on Zn creating amorphous ZnO (a-ZnO) with the a-ZnO showing multiple colors under white light at different oxidation voltages was successfully demonstrated. Simulation of reflected colors at different thicknesses of a-ZnO was also conducted. The presented technique can not only be applied to near diffraction limit multilevel optical data storage, but also makes it possible to represent the color spectra observed in nature at near diffraction limits. It can also be used for device fabrication in situations exploiting the semiconductor nature of ZnO.
Hwang
Jih-Shang
JS
Institute of Optoelectronic Sciences, National Taiwan Ocean University, Keelung, Taiwan. hjsspin@mail.ntou.edu.tw
Chen
Li-Wei
LW
Chen
Te-Chang
TC
Kuo
Chi-Wen
CW
Hu
Zhan-Shuo
ZS
Tsai
Tsong-Ru
TR
Wu
Yuen-Jung
YJ
Lin
Tai-Yuan
TY
Jhuo
Yuan-Yu
YY
Cheng
Chih-Yung
CY
Lin
Chih-Ming
CM
Liu
Yi-Hung
YH
D003116:Color; D006244:Hardness; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008846:Micromanipulation / Q000379:methods*; D018625:Microscopy, Atomic Force / Q000379:methods*; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D012031:Refractometry / Q000379:methods; D013499:Surface Properties; D015034:Zinc Oxide / Q000737:chemistry*
D046911:Macromolecular Substances; D015034:Zinc Oxide