Direct patterning of zinc oxide with control of reflected color through nano-oxidation using an atomic force microscope.
Atomic force microscope oxidation on Zn creating amorphous ZnO (a-ZnO) with the a-ZnO showing multiple colors under white light at different oxidation voltages was successfully demonstrated. Simulation of reflected colors at different thicknesses of a-ZnO was also conducted. The presented technique can not only be applied to near diffraction limit multilevel optical data storage, but also makes it possible to represent the color spectra observed in nature at near diffraction limits. It can also be used for device fabrication in situations exploiting the semiconductor nature of ZnO.
Institute of Optoelectronic Sciences, National Taiwan Ocean University, Keelung, Taiwan. hjsspin@mail.ntou.edu.tw
Jih-Shang
JS
Hwang
Li-Wei
LW
Chen
Te-Chang
TC
Chen
Chi-Wen
CW
Kuo
Zhan-Shuo
ZS
Hu
Tsong-Ru
TR
Tsai
Yuen-Jung
YJ
Wu
Tai-Yuan
TY
Lin
Yuan-Yu
YY
Jhuo
Chih-Yung
CY
Cheng
Chih-Ming
CM
Lin
Yi-Hung
YH
Liu
D003116:Color; D006244:Hardness; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008846:Micromanipulation / Q000379:methods*; D018625:Microscopy, Atomic Force / Q000379:methods*; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D012031:Refractometry / Q000379:methods; D013499:Surface Properties; D015034:Zinc Oxide / Q000737:chemistry*
D046911:Macromolecular Substances; D015034:Zinc Oxide