In situ preparation of an ultra-thin nanomask on a silicon wafer.
Porous nanomasks have been prepared in situ on an insulating silicon wafer by anodization of an aluminum film grown on it. Ultra-thin nanomasks, around 50 nm thick, were fabricated by utilizing a stop signal, a vivid color appearing at the air-electrolyte interface, and the process involved showed excellent repeatability. Finally, 2D nanoscale p-n junction arrays were fabricated on a silicon on insulator (SOI) wafer using the ultra-thin nanomasks prepared. The experimental results are in good agreement with the simulated results on the characteristics of the anodization process involved.
Mao
R W
RW
Department of Electrical Engineering and Computer Science, and Institute for Surface and Interface Science, University of California, Irvine, CA 92697, USA.
Lin
S K
SK
Tsai
C S
CS