Hybrid nanoimprint-soft lithography with sub-15 nm resolution.
We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capable of patterning both flat and curved substrates. The key component of the technology is the mold, which consists of rigid features on an elastic poly(dimethylsiloxane) (PDMS) support. The mold was fabricated by imprinting a reverse image onto the PDMS substrate using a UV-curable low-viscosity prepolymer film. Patterns with sub-15-nm resolution were faithfully duplicated on a flat substrate without applying external pressure. Gratings at 200 nm pitch were also successfully imprinted onto the cylindrical surface of a single mode optical fiber with a 125 microm diameter.
Department of Materials Science and Engineering, National Laboratory of Solid State Microstructure, Nanjing University, Nanjing 210093, People's Republic of China.
Zhiwei
Z
Li
Yanni
Y
Gu
Lei
L
Wang
Haixiong
H
Ge
Wei
W
Wu
Qiangfei
Q
Xia
Changsheng
C
Yuan
Yanfeng
Y
Chen
Bo
B
Cui
R Stanley
RS
Williams