title: Single-element elliptical hard x-ray micro-optics.
abstract: Using micro-fabrication techniques, we have manufactured a single element kinoform lens in single-crystal silicon with an elliptical profile for 12.398 keV (1A) x-rays. By fabricating a lens that is optimized at fixed wavelengths, absorption in the lens material can be significantly reduced by removing 2_ phase-shifting regions. This permits short focal length devices to be fabricated with small radii of curvatures at the lens apex. This feature allows one to obtain a high demagnification of a finite synchrotron electron source size. The reduced absorption loss also enables optics with a larger aperture, and hence improved resolution for focusing and imaging applications. Our first trial of these lenses has resulted in a one micron line focus (fwhm) at the National Synchrotron Light Source X13B beamline.
authors.forename: Kenneth
authors.initials: K
authors.lastname: Evans-Lutterodt
authors.forename: James
authors.initials: J
authors.lastname: Ablett
authors.forename: Aaron
authors.initials: A
authors.lastname: Stein
authors.forename: Chi-Chang
authors.initials: CC
authors.lastname: Kao
authors.forename: Don
authors.initials: D
authors.lastname: Tennant
authors.forename: Fred
authors.initials: F
authors.lastname: Klemens
authors.forename: Ashley
authors.initials: A
authors.lastname: Taylor
authors.forename: Chris
authors.initials: C
authors.lastname: Jacobsen
authors.forename: Peter
authors.initials: P
authors.lastname: Gammel
authors.forename: Harold
authors.initials: H
authors.lastname: Huggins
authors.forename: Greg
authors.initials: G
authors.lastname: Bogart
authors.forename: Scott
authors.initials: S
authors.lastname: Ustin
authors.forename: Leo
authors.initials: L
authors.lastname: Ocola