Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures.
The combination of selective chemical etching and atomic force microscopy has been used for the first time to make ultra-high spatial resolution (20 nm) index of refraction profiles of femtosecond laser modified structures in silica glass.
Taylor
Rod
R
Hnatovsky
C
C
Simova
E
E
Rayner
D
D
Mehandale
M
M
Bhardwaj
V
V
Corkum
P
P