Effect of materials for micro-electro-mechanical systems on PCR yield.
In this study we analyzed the surface properties of different silicon-based materials used for micro-electro-mechanical systems (MEMS) production, such as thermally grown silicon oxide, plasma-enhanced chemical vapor deposition (PECVD)-treated silicon oxide, reactive-ion etch (RIE)-treated silicon oxide, and Pyrex. Substrates were characterized by atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) to define the surface chemical and morphological properties, and by fluorescence microscopy to directly assess the absorption of the different polymerase chain reaction (PCR) components. By using microchips fabricated with the same materials we investigated their compatibility with PCR reactions, exploiting the use of different enzymes and reagents or proper surface treatments. We established the best conditions for DNA amplification in silicon/Pyrex microdevices depending on the type of device and fabrication method used and the quality of reagents, rather than on the passivation treatment or increment in standard Taq polymerase concentration.
Potrich
Cristina
C
Fondazione Bruno Kessler (FBK), Center for Materials and Microsystems, via Sommarive 18, Povo (Trento), Italy. cpotrich@fbk.eu
Lunelli
Lorenzo
L
Forti
Stefania
S
Vozzi
Diego
D
Pasquardini
Laura
L
Vanzetti
Lia
L
Panciatichi
Cristina
C
Anderle
Mariano
M
Pederzolli
Cecilia
C
D004247:DNA / Q000737:chemistry*; D055617:Micro-Electrical-Mechanical Systems / Q000379:methods*; D018625:Microscopy, Atomic Force / Q000379:methods*; D056951:Photoelectron Spectroscopy / Q000379:methods; D016133:Polymerase Chain Reaction / Q000379:methods* / Q000528:radiation effects; D012825:Silicon / Q000737:chemistry* / Q000528:radiation effects; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties / Q000187:drug effects
D012822:Silicon Dioxide; D004247:DNA; D012825:Silicon