title: Photoreactive chemisorbed monolayer suppressing polymer dewetting in thermal nanoimprint lithography.
abstract: We describe reactive-monolayer-assisted thermal nanoimprint lithography. The reactive monolayer inducing the graft reaction with thermoplastic poly(styrene) by ultraviolet light exposure was formed from 4-((10-mercaptodecyl)oxy)benzophenone on a gold thin film. The photochemical graft reaction suppressed the thermally induced dewetting of a poly(styrene) thin film on the modified gold surface. As a result, the poly(styrene) thin film used as a resist layer for wet etching could be patterned by thermal nanoimprint lithography, and 100-nm-scale patterns of a gold thin film could be prepared simply by wet etching.
authors.affiliation: Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, Japan.
authors.forename: Hirokazu
authors.initials: H
authors.lastname: Oda
authors.forename: Tomoyuki
authors.initials: T
authors.lastname: Ohtake
authors.forename: Toshiaki
authors.initials: T
authors.lastname: Takaoka
authors.forename: Masaru
authors.initials: M
authors.lastname: Nakagawa