title: The competition between the liquid-liquid dewetting and the liquid-solid dewetting.
abstract: We investigate the dewetting behavior of the bilayer of air/PS/PMMA/silanized Si wafer and find the two competing dewetting pathways in the dewetting process. The upper layer dewets on the lower layer (dewetting pathway 1, the liquid-liquid dewetting) and the two layers rupture on the solid substrate (dewetting pathway 2, the liquid-solid dewetting). To the two competing dewetting pathways, the process of forming holes and the process of hole growth, influence their competing relation. In the process of forming holes, the time of forming holes is a main factor that influences their competing relation. During the process of hole growth, the dewetting velocity is a main factor that influences their competing relation. The liquid-liquid interfacial tension, the film thickness of the polymer, and the viscosity of the polymer are important factors that influence the time of forming holes and the dewetting velocity. When the liquid-liquid dewetting pathway and the liquid-solid dewetting pathway compete in the dewetting process, the competing relation can be controlled by changing the molecular weight of the polymer, the film thickness, and the annealing temperature. In addition, it is also found that the rim growth on the solid substrate is by a rolling mechanism in the process of hole growth.
authors.affiliation: State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, People's Republic of China.
authors.forename: Lin
authors.initials: L
authors.lastname: Xu
authors.forename: Tongfei
authors.initials: T
authors.lastname: Shi
authors.forename: Lijia
authors.initials: L
authors.lastname: An
mesh_terms: D006358:Hot Temperature; D018625:Microscopy, Atomic Force; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*; D014297:Trimethylsilyl Compounds / Q000737:chemistry; D014783:Viscosity; D017155:Wettability
chemical_list: D011137:Polystyrenes; D014297:Trimethylsilyl Compounds; C039293:trimethylchlorosilane; D019904:Polymethyl Methacrylate