title: Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures.
abstract: The combination of selective chemical etching and atomic force microscopy has been used for the first time to make ultra-high spatial resolution (20 nm) index of refraction profiles of femtosecond laser modified structures in silica glass.
authors.forename: Rod
authors.initials: R
authors.lastname: Taylor
authors.forename: C
authors.initials: C
authors.lastname: Hnatovsky
authors.forename: E
authors.initials: E
authors.lastname: Simova
authors.forename: D
authors.initials: D
authors.lastname: Rayner
authors.forename: M
authors.initials: M
authors.lastname: Mehandale
authors.forename: V
authors.initials: V
authors.lastname: Bhardwaj
authors.forename: P
authors.initials: P
authors.lastname: Corkum