title: Low-temperature atomic layer deposition of copper metal thin films: self-limiting surface reaction of copper dimethylamino-2-propoxide with diethylzinc.
abstract: A uniform, conformal, pure copper metal thin film was grown at very low substrate temperatures (100-120 degrees C) on Si(100) substrates by atomic layer deposition involving the ligand exchange of [Cu(OCHMeCH(2)NMe(2))(2)] with Et(2)Zn (see scheme). Patterned copper thin films of Cu nanotubes (diameter 150 nm, length 12 microm) were fabricated.
authors.affiliation: Department of Chemistry, Hanyang University, Seoul 133-791, Korea.
authors.forename: Byoung H
authors.initials: BH
authors.lastname: Lee
authors.forename: Jae K
authors.initials: JK
authors.lastname: Hwang
authors.forename: Jae W
authors.initials: JW
authors.lastname: Nam
authors.forename: Song U
authors.initials: SU
authors.lastname: Lee
authors.forename: Jun T
authors.initials: JT
authors.lastname: Kim
authors.forename: Sang-M
authors.initials: SM
authors.lastname: Koo
authors.forename: A
authors.initials: A
authors.lastname: Baunemann
authors.forename: Roland A
authors.initials: RA
authors.lastname: Fischer
authors.forename: Myung M
authors.initials: MM
authors.lastname: Sung