title: Quantum lithography by coherent control of classical light pulses.
abstract: The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the "quantum weight" from the electromagnetic field to the lithographic material. We show how a practical complete lithographic scheme can be developed and demonstrate the underlying principles experimentally by two-photon interference in atomic Rubidium, to obtain focal spots that beat the diffraction limit by a factor of 2.
authors.forename: Avi
authors.initials: A
authors.lastname: Pe'er
authors.forename: Barak
authors.initials: B
authors.lastname: Dayan
authors.forename: Marija
authors.initials: M
authors.lastname: Vucelja
authors.forename: Yaron
authors.initials: Y
authors.lastname: Silberberg
authors.forename: Asher
authors.initials: A
authors.lastname: Friesem