title: Two-stage design method for realization of photonic bandgap structures with desired symmetries by interference lithography.
abstract: Interference lithography for the fabrication of photonic crystals is considered. A two-stage design method for realization of photonic bandgap structures with desired symmetries is developed. An optimal photonic crystal with a large bandgap is searched by adjusting some parameters while keeping some basic symmetry of the unit cell unchanged. A nonlinear programming method is then used to find the optimal electric field vectors of the laser beams and realize the desired interference pattern. The present method is useful for a rational and systematical design of new photonic bandgap structures.
authors.forename: Xianyu
authors.initials: X
authors.lastname: Ao
authors.forename: Sailing
authors.initials: S
authors.lastname: He