title: Deposition and characterization of germanium sulphide glass planar waveguides.
abstract: Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12 microm/hr at 500oC. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5microm to 7microm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093+/-0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1+/-0.3 dB/cm.
authors.forename: C C
authors.initials: CC
authors.lastname: Huang
authors.forename: D
authors.initials: D
authors.lastname: Hewak
authors.forename: J
authors.initials: J
authors.lastname: Badding