Closely packed and aspect-ratio-controlled antireflection subwavelength gratings on GaAs using a lenslike shape transfer.
We report a simple and low-cost fabrication of antireflection subwavelength grating (SWG) structures on GaAs using the lenslike shape transfer by a holographic lithography and a reflowed photoresist mask. The use of an additional thermal reflow process enhances the close packing of two-dimensional SWGs with a conical shape. The aspect ratio of conical SWG was also controlled easily by adjusting the rf power during the dry etch process. The fabricated SWGs exhibited low reflection properties over a wide spectral range, in agreement with the calculated values using by a rigorous coupled-wave analysis simulation.
Song
Young Min
YM
Department of Information and Communications, Gwangju Institute of Science and Technology, 1 Oryong-dong,Buk-gu, Gwangju 500-712, Korea.
Bae
Si Young
SY
Yu
Jae Su
JS
Lee
Yong Tak
YT