title: Sub-nanometer metrology of optical wafers using an angle-scanned Fabry-Perot interferometer.
abstract: An rms measurement repeatability of </=0.07 nm and a reproducibility of </=0.16 are reported from a series of thickness measurements made on a 280 microm thick, 37.5 mm diameter lithium niobate wafer. The measurements were taken on a custom made metrology rig based on accurate rotation of a Fabry-Perot etalon structure in a collimated beam from a wavelength stabilized Helium Neon laser. The measurements were made on different days with the wafer in three different orientations.
authors.forename: John
authors.initials: J
authors.lastname: Arkwright
authors.forename: David
authors.initials: D
authors.lastname: Farrant
authors.forename: Jun
authors.initials: J
authors.lastname: Zhang