title: Thickness-dependent reversible hydrogenation of graphene layers.
abstract: In this work, graphene layers on SiO(2)/Si substrate have been chemically decorated by radio frequency hydrogen plasma. Hydrogen coverage investigation by Raman spectroscopy and micro-X-ray photoelectron spectroscopy characterization demonstrates that the hydrogenation of single layer graphene on SiO(2)/Si substrate is much less feasible than that of bilayer and multilayer graphene. Both the hydrogenation and dehydrogenation process of the graphene layers are controlled by the corresponding energy barriers, which show significant dependence on the number of layers. The extent of decorated carbon atoms in graphene layers can be manipulated reversibly up to the saturation coverage, which facilitates engineering of chemically decorated graphene with various functional groups via plasma techniques.
authors.affiliation: Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore 637371.
authors.forename: Zhiqiang
authors.initials: Z
authors.lastname: Luo
authors.forename: Ting
authors.initials: T
authors.lastname: Yu
authors.forename: Ki-Jeong
authors.initials: KJ
authors.lastname: Kim
authors.forename: Zhenhua
authors.initials: Z
authors.lastname: Ni
authors.forename: Yumeng
authors.initials: Y
authors.lastname: You
authors.forename: Sanhua
authors.initials: S
authors.lastname: Lim
authors.forename: Zexiang
authors.initials: Z
authors.lastname: Shen
authors.forename: Shanzhong
authors.initials: S
authors.lastname: Wang
authors.forename: Jianyi
authors.initials: J
authors.lastname: Lin