Soft-lithography-based optical interconnection with high misalignment tolerance.
A low-cost, versatile optical coupling structure featuring a monolithic integration of a polymeric waveguide, beam ducts, and end-reflectors has been designed, prototyped, and demonstrated to be capable of sustaining high misalignment errors whilst maintaining a reasonable coupling efficiency. The soft lithography fabrication process of this interconnection design allows for significant advantages over traditional designs in terms of misalignment tolerance, manufacture cost and speed, as well as 3-D integration capability.
Wu
Junhao
J
Wu
Jing
J
Bao
Junfeng
J
Wu
X
X