title: Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrates.
abstract: New uses for ALD: By applying standard metal oxide atomic layer deposition (ALD) to two types of porphyrins, site-specific chemical infiltration of substrate molecules is achieved: Diethylzinc can diffuse into the interior of porphyrin supramolecular structures and induce metalation of the porphyrin molecules from the vapor phase. A = Ph, p-HO(3)SC(6)H(4).
authors.affiliation: Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, 06120 Halle/Saale, Germany. lianbing@mpi-halle.de
authors.forename: Lianbing
authors.initials: L
authors.lastname: Zhang
authors.forename: Avinash J
authors.initials: AJ
authors.lastname: Patil
authors.forename: Le
authors.initials: L
authors.lastname: Li
authors.forename: Angelika
authors.initials: A
authors.lastname: Schierhorn
authors.forename: Stephen
authors.initials: S
authors.lastname: Mann
authors.forename: Ulrich
authors.initials: U
authors.lastname: Gösele
authors.forename: Mato
authors.initials: M
authors.lastname: Knez
mesh_terms: D008670:Metals / Q000737:chemistry*; D008956:Models, Chemical; D049329:Nanostructures; D009942:Organometallic Compounds / Q000737:chemistry; D011166:Porphyrins / Q000737:chemistry*
chemical_list: D008670:Metals; D009942:Organometallic Compounds; D011166:Porphyrins; C454811:diethylzinc