title: Exposure-schedule study of uniform diffraction efficiency for DSSM holographic storage.
abstract: An exposure-schedule theory of uniform diffraction efficiency for a Dynamic-Static speckle multiplexing (DSSM) volume holographic storage system is proposed. The overlap-factor (? overlap) is introduced into the system to compensate for the erasure effect of the static speckle multiplexing scheme. The exposure-schedule which is an inverse recursion formula is determined. Experimental results are obtained in a LiNbO(3):Fe crystal and 400 holograms with uniform diffraction efficiency are achieved by the use of the new exposure-schedule.
authors.forename: Xiaosu
authors.initials: X
authors.lastname: Ma
authors.forename: Qingsheng
authors.initials: Q
authors.lastname: He
authors.forename: Jinnan
authors.initials: J
authors.lastname: Wang
authors.forename: Minxian
authors.initials: M
authors.lastname: Wu
authors.forename: Guofan
authors.initials: G
authors.lastname: Jin