title: Simplifying the setup for vacuum-outlet GC: using a restriction inside the injection port.
abstract: The application of vacuum GC has several advantages over pressurized GC. One of the key characteristics is that the optimal gas velocity is very high. Combined with short capillary columns of wide internal diameter, this results in short analysis times using standard GC-MS equipment. To make vacuum GC possible using a GC-MS system, a restriction must be positioned at the injection side of the column. This restriction is usually made of deactivated 0.1 mm i.d. fused-silica tubing which is coupled to the analytical column. Such restrictions will work, but practical challenges are found in coupling, reducing dead volume and robustness. A new way of making restrictions is by incorporating the restriction into the injection port. Using well-defined short pieces of fused silica with internal diameter of 0.025 mm, one can make a restriction using a Press-Tight type connector, and position this inside the injection port. By doing this, the restriction is very short and at high temperature all the time. Activity plays a minimal role, and also leaks will not be an issue as the coupling is in 100% inert gas. Data obtained using this concept is promising as vacuum GC becomes easier and more robust.
authors.affiliation: Restek Corporation, Middelburg, The Netherlands. jaap.dezeeuw@restek.com
authors.forename: Jaap
authors.initials: J
authors.lastname: de Zeeuw
authors.forename: Shawn
authors.initials: S
authors.lastname: Reese
authors.forename: Jack
authors.initials: J
authors.lastname: Cochran
authors.forename: Scott
authors.initials: S
authors.lastname: Grossman
authors.forename: Tom
authors.initials: T
authors.lastname: Kane
authors.forename: Chris
authors.initials: C
authors.lastname: English
mesh_terms: D002849:Chromatography, Gas / Q000295:instrumentation* / Q000379:methods*; D012822:Silicon Dioxide / Q000737:chemistry; D014618:Vacuum
chemical_list: D012822:Silicon Dioxide