Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrates.
New uses for ALD: By applying standard metal oxide atomic layer deposition (ALD) to two types of porphyrins, site-specific chemical infiltration of substrate molecules is achieved: Diethylzinc can diffuse into the interior of porphyrin supramolecular structures and induce metalation of the porphyrin molecules from the vapor phase. A = Ph, p-HO(3)SC(6)H(4).
Zhang
Lianbing
L
Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, 06120 Halle/Saale, Germany. lianbing@mpi-halle.de
Patil
Avinash J
AJ
Li
Le
L
Schierhorn
Angelika
A
Mann
Stephen
S
Gösele
Ulrich
U
Knez
Mato
M
D008670:Metals / Q000737:chemistry*; D008956:Models, Chemical; D049329:Nanostructures; D009942:Organometallic Compounds / Q000737:chemistry; D011166:Porphyrins / Q000737:chemistry*
D008670:Metals; D009942:Organometallic Compounds; D011166:Porphyrins; C454811:diethylzinc