title: Simple approach to wafer-scale self-cleaning antireflective silicon surfaces.
abstract: A simple approach to wafer-scale self-cleaning antireflective hierarchical silicon structures is demonstrated. By employing the KOH etching and silver catalytic etching, pyramidal hierarchical structures were generated on the crystalline silicon wafer, which exhibit strong antireflection and superhydrophobic properties after fluorination. Furthermore, a flexible superhydrophobic substrate was fabricated by transferring the hierarchical Si structure to the NOA 63 film with UV-assisted imprint lithography. This method is of potential application in optical, optoelectronic, and wettability control devices.
authors.affiliation: State Key Laboratory of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, People's Republic of China.
authors.forename: Dianpeng
authors.initials: D
authors.lastname: Qi
authors.forename: Nan
authors.initials: N
authors.lastname: Lu
authors.forename: Hongbo
authors.initials: H
authors.lastname: Xu
authors.forename: Bingjie
authors.initials: B
authors.lastname: Yang
authors.forename: Chunyu
authors.initials: C
authors.lastname: Huang
authors.forename: Miaojun
authors.initials: M
authors.lastname: Xu
authors.forename: Liguo
authors.initials: L
authors.lastname: Gao
authors.forename: Zhouxiang
authors.initials: Z
authors.lastname: Wang
authors.forename: Lifeng
authors.initials: L
authors.lastname: Chi