title: Imprinted silicon-based nanophotonics.
abstract: We demonstrate and optically characterize silicon-on-insulator based nanophotonic devices fabricated by nanoimprint lithography. In our demonstration, we have realized ordinary and topology-optimized photonic crystal waveguide structures. The topology-optimized structures require lateral pattern definition on a sub 30-nm scale in combination with a deep vertical silicon etch of the order of ~300 nm. The nanoimprint method offers a cost-efficient parallel fabrication process with state-of-the-art replication fidelity, comparable to direct electron beam writing.
authors.forename: Peter I
authors.initials: PI
authors.lastname: Borel
authors.forename: Brian
authors.initials: B
authors.lastname: Bilenberg
authors.forename: Lars H
authors.initials: LH
authors.lastname: Frandsen
authors.forename: Theodor
authors.initials: T
authors.lastname: Nielsen
authors.forename: Jacob
authors.initials: J
authors.lastname: Fage-Pedersen
authors.forename: Andrei V
authors.initials: AV
authors.lastname: Lavrinenko
authors.forename: Jacob S
authors.initials: JS
authors.lastname: Jensen
authors.forename: Ole
authors.initials: O
authors.lastname: Sigmund
authors.forename: Anders
authors.initials: A
authors.lastname: Kristensen