title: Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass.
abstract: Ultrashort pulsed laser irradiation of bulk fused silica may result under specific energetic conditions in the self-organization of subwavelength material redistribution regions within the laser trace. The modulated structures have birefringent properties and show unusual anisotropic light scattering and reflection characteristics. We report here on the formation of waveguiding structures with remarkable polarization effects for infrared light. The photoinscription process using 800 nm femtosecond laser pulses is accompanied by third harmonic generation and polarization dependent anisotropic scattering of UV photons. The photowritten structures can be arranged in three-dimensional patterns generating complex propagation and polarization effects due to the anisotropic optical properties.
authors.affiliation: Laboratoire Hubert Curien, UMR 5516 CNRS, Université Jean Monnet, 42000 Saint Etienne, Université de Lyon, 42023 Saint Etienne, France.
authors.forename: G
authors.initials: G
authors.lastname: Cheng
authors.forename: K
authors.initials: K
authors.lastname: Mishchik
authors.forename: C
authors.initials: C
authors.lastname: Mauclair
authors.forename: E
authors.initials: E
authors.lastname: Audouard
authors.forename: R
authors.initials: R
authors.lastname: Stoian
mesh_terms: D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D005898:Glass / Q000737:chemistry / Q000528:radiation effects; D007834:Lasers; D010777:Photochemistry / Q000379:methods*; D012031:Refractometry / Q000295:instrumentation* / Q000379:methods*; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity; D012822:Silicon Dioxide / Q000737:chemistry* / Q000528:radiation effects*
chemical_list: D012822:Silicon Dioxide