Imprinted silicon-based nanophotonics.
We demonstrate and optically characterize silicon-on-insulator based nanophotonic devices fabricated by nanoimprint lithography. In our demonstration, we have realized ordinary and topology-optimized photonic crystal waveguide structures. The topology-optimized structures require lateral pattern definition on a sub 30-nm scale in combination with a deep vertical silicon etch of the order of ~300 nm. The nanoimprint method offers a cost-efficient parallel fabrication process with state-of-the-art replication fidelity, comparable to direct electron beam writing.
Borel
Peter I
PI
Bilenberg
Brian
B
Frandsen
Lars H
LH
Nielsen
Theodor
T
Fage-Pedersen
Jacob
J
Lavrinenko
Andrei V
AV
Jensen
Jacob S
JS
Sigmund
Ole
O
Kristensen
Anders
A