title: Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography.
abstract: Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact table-top set up.
authors.forename: P W
authors.initials: PW
authors.lastname: Wachulak
authors.forename: M G
authors.initials: MG
authors.lastname: Capeluto
authors.forename: M C
authors.initials: MC
authors.lastname: Marconi
authors.forename: C S
authors.initials: CS
authors.lastname: Menoni
authors.forename: J J
authors.initials: JJ
authors.lastname: Rocca