title: Fluorinated acid amplifiers for EUV lithography.
abstract: Five new compounds were synthesized for use as acid amplifiers in EUV (13.5 nm) photoresists. Four compounds act as acid amplifiers and decompose by autocatalytic kinetics to generate fluorinated sulfonic acids, essential for the simultaneous improvement of resolution, sensitivity, and line edge roughness (LER) in EUV photoresists. The decomposition rates were studied using (19)F NMR in the presence and absence of 1.2 equiv of tri-tert-butylpyridine. Three acid amplifiers decomposed 490, 1360, and 1430 times faster without base than with base. Preliminary lithographic evaluations show that cis-1-methyl-2-(4-(trifluoromethyl)phenylsulfonyloxy)cyclohexyl acetate simultaneously improves the resolution, LER, and sensitivity of an EUV photoresist.
authors: College of Nanoscale Science and Engineering, University at Albany, Albany, New York 12203, USA.
authors: Seth
authors: S
authors: Kruger
authors: Sri
authors: S
authors: Revuru
authors: Craig
authors: C
authors: Higgins
authors: Sarah
authors: S
authors: Gibbons
authors: Daniel A
authors: DA
authors: Freedman
authors: Wang
authors: W
authors: Yueh
authors: Todd R
authors: TR
authors: Younkin
authors: Robert L
authors: RL
authors: Brainard
mesh_terms: D000143:Acids / Q000737:chemistry*; D002384:Catalysis; D006845:Hydrocarbons, Fluorinated / Q000737:chemistry*; D013997:Time Factors; D014466:Ultraviolet Rays
chemical_list: D000143:Acids; D006845:Hydrocarbons, Fluorinated