title: Improvement of thermal properties of ultra-high Q silicon microdisk resonators.
abstract: We present a detailed study of the thermal properties of ultra-high quality factor (Q) microdisk resonators on silicon-on-insulator (SOI) platforms. We show that by preserving the buried oxide layer underneath the Si resonator and by adding a thin Si pedestal layer at the interface between the resonator and the oxide layer we can increase the overall thermal conductivity of the structure while the ultra-high Q property is preserved. This allows higher field intensities inside the resonator which are crucial for nonlinear optics applications.
authors: Mohammad
authors: M
authors: Soltani
authors: Qing
authors: Q
authors: Li
authors: Siva
authors: S
authors: Yegnanarayanan
authors: Ali
authors: A
authors: Adibi