title: Adjusting resonant wavelengths and spectral shapes of ring resonators using a cladding SiN layer or KOH solution.
abstract: It is shown that the resonant frequencies and the transmission spectra of ring resonators can be adjusted by depositing or etching the cladding nitride layer on the ring waveguide without introducing an extra loss or extra variations of channel spacing. The cladding nitride layer increases the minimum width of the gap in the coupling region to larger than 150nm which makes it possible to consider photolithography instead of E-beam lithography for the typical design rule of ring filters. KOH silicon etching can also adjust not only the resonance frequencies but also coupling coefficients with a small sacrifice of guiding loss.
authors: Electronics and Telecommunications Research Institute, Yusong-gu, Daejeon 305-350, Korea.
authors: Sahnggi
authors: S
authors: Park
authors: Kap-Joong
authors: KJ
authors: Kim
authors: Jong-Moo
authors: JM
authors: Lee
authors: In-Gyoo
authors: IG
authors: Kim
authors: Gyungock
authors: G
authors: Kim
mesh_terms: D000465:Algorithms; D004867:Equipment Design; D006878:Hydroxides / Q000737:chemistry*; D008422:Materials Testing; D015233:Models, Statistical; D055095:Optics and Photonics; D017680:Potassium Compounds / Q000737:chemistry*; D012825:Silicon; D017655:Silicon Compounds / Q000737:chemistry*; D013059:Spectrum Analysis, Raman / Q000379:methods; D013696:Temperature; D013997:Time Factors
chemical_list: D006878:Hydroxides; D017680:Potassium Compounds; D017655:Silicon Compounds; C032734:silicon nitride; C029943:potassium hydroxide; D012825:Silicon