Characterization of patterned poly(methyl methacrylate) brushes under various structures upon solvent immersion.
In this paper we describe a graft polymerization/solvent immersion method for generating various patterns of polymer brushes. We used a very-large-scale integration (VLSI) process and oxygen plasma system to generate well-defined patterns of polymerized methyl methacrylate (MMA) on patterned Si(100) surfaces through atom transfer radical polymerization (ATRP). After immersion of wafers presenting lines of these PMMA brushes in water and tetrahydrofuran, we observed mushroom- and brush-like regimes through grafting densities and surface coverages, respectively, for the PMMA brushes with various pattern resolutions. In the mushroom-like regime, the distance between lines of PMMA brushes was smaller than that of the lines patterned lithographically on the wafer; in the brush-like regime, this distance was approximately the same. This new strategy allows polymer brushes to be prepared through graft polymerization and then have their patterns varied through solvent immersion.
Chen
Jem-Kun
JK
Department of Polymer Engineering, National Taiwan University of Science and Technology, 43, Sec 4, Keelung Rd, Taipei, 106 Taiwan, People's Republic of China. jkchen@mail.ntust.edu.tw
Hsieh
Chih-Yi
CY
Huang
Chih-Feng
CF
Li
Po-min
PM
D005663:Furans / Q000737:chemistry*; D015394:Molecular Structure; D010316:Particle Size; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry; D012997:Solvents / Q000737:chemistry; D013499:Surface Properties; D014867:Water / Q000737:chemistry*
D005663:Furans; D012997:Solvents; D014867:Water; C018674:tetrahydrofuran; D019904:Polymethyl Methacrylate; D012825:Silicon