title: Large area uniform nanostructures fabricated by direct femtosecond laser ablation.
abstract: An approach for fabricating large area uniform nanostructures by direct femtosecond (fs) laser ablation is presented. By the simple scanning technique with appropriate irradiation conditions, arbitrary size of uniform, complanate nano-grating, nano-particle, and nano-square structures can be produced on wide bandgap materials as well as graphite. The feature sizes of the formed nanostructures, which can be tuned in a wide range by varying the irradiation wavelength, is about 200 nm with 800 nm fs laser irradiation. The physical properties of the nano-structured surfaces are changed greatly, especially the optical property, which is demonstrated by the extraordinary enhancement of light transmission of the treated area. This technique is efficient, universal, and environmentally friendly, which exhibits great potential for applications in photoelectron devices.
authors: State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, Guangzhou, China. syshm@163.com
authors: Min
authors: M
authors: Huang
authors: Fuli
authors: F
authors: Zhao
authors: Ya
authors: Y
authors: Cheng
authors: Ningsheng
authors: N
authors: Xu
authors: Zhizhan
authors: Z
authors: Xu
mesh_terms: D007834:Lasers; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation*; D011829:Radiation Dosage; D013499:Surface Properties