title: Advanced thin film technology for ultrahigh resolution X-ray microscopy.
abstract: Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metal organic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10nm in width were resolved.
authors.affiliation: Paul Scherrer Institut, CH-5232 Villigen, Switzerland. joan.vila@psi.ch
authors.forename: Joan
authors.initials: J
authors.lastname: Vila-Comamala
authors.forename: Konstantins
authors.initials: K
authors.lastname: Jefimovs
authors.forename: Jörg
authors.initials: J
authors.lastname: Raabe
authors.forename: Tero
authors.initials: T
authors.lastname: Pilvi
authors.forename: Rainer H
authors.initials: RH
authors.lastname: Fink
authors.forename: Mathias
authors.initials: M
authors.lastname: Senoner
authors.forename: Andre
authors.initials: A
authors.lastname: Maassdorf
authors.forename: Mikko
authors.initials: M
authors.lastname: Ritala
authors.forename: Christian
authors.initials: C
authors.lastname: David