title: A flexible amorphous Bi(5)Nb(3)O(15) film for the gate insulator of the low-voltage operating pentacene thin-film transistor fabricated at room temperature.
abstract: The amorphous Bi(5)Nb(3)O(15) film grown at room temperature under an oxygen-plasma sputtering ambient (BNRT-O(2) film) has a hydrophobic surface with a surface energy of 35.6 mJ m(-2), which is close to that of the orthorhombic pentacene (38 mJ m(-2)), resulting in the formation of a good pentacene layer without the introduction of an additional polymer layer. This film was very flexible, maintaining a high capacitance of 145 nF cm(-2) during and after 10(5) bending cycles with a small curvature radius of 7.5 mm. This film was optically transparent. Furthermore, the flexible, pentacene-based, organic thin-film transistors (OTFTs) fabricated on the poly(ether sulfone) substrate at room temperature using a BNRT-O(2) film as a gate insulator exhibited a promising device performance with a high field effect mobility of 0.5 cm(2) V(-1) s(-1), an on/off current modulation of 10(5), and a small subthreshold slope of 0.2 V decade(-1) under a low operating voltage of -5 V. This device also maintained a high carrier mobility of 0.45 cm(2) V(-1 )s(-1) during the bending with a small curvature radius of 9 mm. Therefore, the BNRT-O(2) film is considered a promising material for the gate insulator of the flexible, pentacene-based OTFT.
authors.affiliation: Department of Materials Science and Engineering, Korea University, 1-5 Ga, Anam-Dong, Seongbuk-Gu, Seoul 136-713, Korea.
authors.forename: Kyung-Hoon
authors.initials: KH
authors.lastname: Cho
authors.forename: Tae-Geun
authors.initials: TG
authors.lastname: Seong
authors.forename: Joo-Young
authors.initials: JY
authors.lastname: Choi
authors.forename: Jin-Seong
authors.initials: JS
authors.lastname: Kim
authors.forename: Jae-Hong
authors.initials: JH
authors.lastname: Kwon
authors.forename: Sang-Il
authors.initials: SI
authors.lastname: Shin
authors.forename: Myung-Ho
authors.initials: MH
authors.lastname: Chung
authors.forename: Byeong-Kwon
authors.initials: BK
authors.lastname: Ju
authors.forename: Sahn
authors.initials: S
authors.lastname: Nahm