Advanced thin film technology for ultrahigh resolution X-ray microscopy.
Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metal organic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10nm in width were resolved.
Vila-Comamala
Joan
J
Paul Scherrer Institut, CH-5232 Villigen, Switzerland. joan.vila@psi.ch
Jefimovs
Konstantins
K
Raabe
Jörg
J
Pilvi
Tero
T
Fink
Rainer H
RH
Senoner
Mathias
M
Maassdorf
Andre
A
Ritala
Mikko
M
David
Christian
C