title: [Emission spectrum analysis of laser ablation on the silicon surface].
abstract: The free electron density and temperature of laser-induced plasma and the damage on the silicon surface were investigated. The results show that the volume and the free electron density of laser induced plasma, as well as the plasma temperature will determine the profile and the size of silicon superficial damage. It was also found that the volume of laser plasma will increase continuously and the temperature will increase slightly with the increase in the energy of laser pulse, while the density of free electrons will remain invariable. The free electron density and the temperature reduce gradually from centre to edge, so the damage appearance has the following features: The interior area of damage was melted so well that the periodic stripes were formed. The periodic stripes were quite irregular for the area not melted very well. The boundary of damage is apparent and sometimes color changes induced by plasma spattering were observed.
authors.affiliation: College of Electronics & Information Engineering, Sichuan University, Chengdu 610064, China. hjh_scu@163.com
authors.forename: Jing-hua
authors.initials: JH
authors.lastname: Han
authors.forename: Guo-ying
authors.initials: GY
authors.lastname: Feng
authors.forename: Li-ming
authors.initials: LM
authors.lastname: Yang
authors.forename: Li-ling
authors.initials: LL
authors.lastname: Yang
authors.forename: Qiu-hui
authors.initials: QH
authors.lastname: Zhang
authors.forename: Xu-dong
authors.initials: XD
authors.lastname: Xie
authors.forename: Qi-hua
authors.initials: QH
authors.lastname: Zhu