Fabrication and testing of freestanding Si nanogratings for UV filtration on space-based particle sensors.
We demonstrate complete fabrication process integration and device performance of sturdy, self-supported transmission gratings in silicon. Gratings are patterned with nanoimprint lithography and aluminum liftoff on silicon-on-insulator wafers. Double-sided deep reactive ion etching (DRIE) creates freestanding 120 nm half-pitch gratings with 2000 nm depth and built-in 1 mm pitch bulk silicon support structures. Optical characterization demonstrates 10(-4) transmission of UV in the 190-250 nm band while a 25-30% geometric transparency allows particles to pass unimpeded for space plasma measurements.
Mukherjee
Pran
P
The University of Michigan, 2417A SRB, 2455 Hayward Street, Ann Arbor, MI 48109-2143, USA. pran@umich.edu
Zurbuchen
Thomas H
TH
Guo
L Jay
LJ