title: Roll in and roll out: a path to high-throughput nanoimprint lithography.
abstract: Roller-type nanoimprint lithography is a technique that can potentially increase the throughput of the imprinting process to levels competitive for low-cost, large-area, nanoscale manufacturing. A paper in this issue by Ahn and Guo presents a large-area roll-to-roll and roll-to-plate imprint process that builds on earlier work, increasing the substrate width to 4 in. and transferring patterns of 300 nm width and 600 nm pitch at a rate of 1 m/min.
authors.affiliation: Mechanical & Aerospace Engineering Department, University of California, Los Angeles, California 90095, USA.
authors.forename: Colin
authors.initials: C
authors.lastname: Stuart
authors.forename: Yong
authors.initials: Y
authors.lastname: Chen