High-resolution laser lithography system based on two-dimensional acousto-optic deflection.
We present an advanced high-resolution, compact laser lithography system for fast prototyping of complex integrated optics devices comprising microring resonators and photonic crystal structures. Precise and flexible structuring of photoresist patterns is achieved by combing three linear stages (xyz) for sample positioning and a two-dimensional acousto-optical deflector for laser beam steering and intensity control. A continuous wave diode laser operating at a wavelength of 375 nm is used to illuminate all types of photoresists including SU-8. Using a microscope objective with a numerical aperture of 1.40, structure widths of approximately 200 nm can be obtained. The write-field covered by acousto-optic deflection can be as large as 200x200 microm(2) when using an objective with a focal length of 4.5 mm. With a two-step lithography process, gaps as small as 150 nm between adjacent structures have been achieved, yielding superior photoresist masks for microring resonators with coupling ports.
Koechlin
Manuel
M
Institute of Quantum Electronics, Nonlinear Optics Laboratory, ETH Zurich, 8093 Zurich, Switzerland. koechlin@phys.ethz.ch
Poberaj
Gorazd
G
Günter
Peter
P