title: Deep-ultraviolet spatial-period division using an excimer laser.
abstract: We have used the deep-UV output from an ArF laser and a grating mask with 199-nm spatial period to fabricate a 99.5-nm-period grating pattern in polymethyl methacrylate resist by spatial-period division. For sub 100 nm, lithography of periodic and quasi-periodic patterns (including Fresnel zone plates) by spatial-period division, deep-UV radiation offers a number of advantages over soft x rays.
authors.forename: A M
authors.initials: AM
authors.lastname: Hawryluk
authors.forename: H I
authors.initials: HI
authors.lastname: Smith
authors.forename: R M
authors.initials: RM
authors.lastname: Osgood
authors.forename: D J
authors.initials: DJ
authors.lastname: Ehrlich