title: Soft-x-ray projection lithography: printing of 0.2-microm features using a 20:1 reduction.
abstract: We demonstrate nearly diffraction-limited printing of 0.2-microm features, using soft x rays of approximately 36-nm wavelength. An open-stencil transmission mask with minimum features of 4 microm was imaged by a twentyfold-reduction Schwarzschild-type objective onto silicon wafers coated with various e-beam resists. Implications for soft-x-ray projection lithography are discussed.
authors.forename: D W
authors.initials: DW
authors.lastname: Berreman
authors.forename: J E
authors.initials: JE
authors.lastname: Bjorkholm
authors.forename: L
authors.initials: L
authors.lastname: Eichner
authors.forename: R R
authors.initials: RR
authors.lastname: Freeman
authors.forename: T E
authors.initials: TE
authors.lastname: Jewell
authors.forename: W M
authors.initials: WM
authors.lastname: Mansfield
authors.forename: A A
authors.initials: AA
authors.lastname: Macdowell
authors.forename: M L
authors.initials: ML
authors.lastname: O'Malley
authors.forename: E L
authors.initials: EL
authors.lastname: Raab
authors.forename: W T
authors.initials: WT
authors.lastname: Silfvast
authors.forename: L H
authors.initials: LH
authors.lastname: Szeto
authors.forename: D M
authors.initials: DM
authors.lastname: Tennant
authors.forename: W K
authors.initials: WK
authors.lastname: Waskiewicz
authors.forename: D L
authors.initials: DL
authors.lastname: White
authors.forename: D L
authors.initials: DL
authors.lastname: Windt
authors.forename: O R
authors.initials: OR
authors.lastname: Wood Ii
authors.forename: J H
authors.initials: JH
authors.lastname: Bruning