title: Very large scale integration of nanopatterned YBa2Cu3O7-delta Josephson junctions in a two-dimensional array.
abstract: Very large scale integration of Josephson junctions in a two-dimensional series-parallel array has been achieved by ion irradiating a YBa(2)Cu(3)O(7-delta) film through slits in a nanofabricated mask created with electron beam lithography and reactive ion etching. The mask consisted of 15820 high aspect ratio (20:1), 35 nm wide slits that restricted the irradiation in the film below to form Josephson junctions. Characterizing each parallel segment k, containing 28 junctions, with a single critical current I(ck) we found a standard deviation in I(ck) of about 16%.
authors.affiliation: Department of Physics, University of California, Berkeley, California 94720, USA. scybart@berkeley.edu
authors.forename: Shane A
authors.initials: SA
authors.lastname: Cybart
authors.forename: Steven M
authors.initials: SM
authors.lastname: Anton
authors.forename: Stephen M
authors.initials: SM
authors.lastname: Wu
authors.forename: John
authors.initials: J
authors.lastname: Clarke
authors.forename: Robert C
authors.initials: RC
authors.lastname: Dynes