Soft-x-ray projection lithography: printing of 0.2-microm features using a 20:1 reduction.
We demonstrate nearly diffraction-limited printing of 0.2-microm features, using soft x rays of approximately 36-nm wavelength. An open-stencil transmission mask with minimum features of 4 microm was imaged by a twentyfold-reduction Schwarzschild-type objective onto silicon wafers coated with various e-beam resists. Implications for soft-x-ray projection lithography are discussed.
Berreman
D W
DW
Bjorkholm
J E
JE
Eichner
L
L
Freeman
R R
RR
Jewell
T E
TE
Mansfield
W M
WM
Macdowell
A A
AA
O'Malley
M L
ML
Raab
E L
EL
Silfvast
W T
WT
Szeto
L H
LH
Tennant
D M
DM
Waskiewicz
W K
WK
White
D L
DL
Windt
D L
DL
Wood Ii
O R
OR
Bruning
J H
JH