title: Multilevel phase holograms manufactured by electron-beam lithography.
abstract: Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date.
authors.forename: M
authors.initials: M
authors.lastname: Ekberg
authors.forename: M
authors.initials: M
authors.lastname: Larsson
authors.forename: S
authors.initials: S
authors.lastname: Hård
authors.forename: B
authors.initials: B
authors.lastname: Nilsson