Diffraction-limited soft-x-ray projection imaging using a laser plasma source.
Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-microm lines and spaces is observed in polymethylmethacrylate.
D A
DA
Tichenor
G D
GD
Kubiak
M E
ME
Malinowski
R H
RH
Stulen
S J
SJ
Haney
K W
KW
Berger
L A
LA
Brown
R R
RR
Freeman
W M
WM
Mansfield
O R
OR
Wood Ii
D M
DM
Tennant
J E
JE
Bjorkholm
A A
AA
Macdowell
J
J
Bokor
T E
TE
Jewell
D L
DL
White
D L
DL
Windt
W K
WK
Waskiewicz