Diffraction-limited soft-x-ray projection imaging using a laser plasma source.
Projection imaging of 0.1-microm lines and spaces is demonstrated with a Mo/Si multilayer coated Schwarzschild objective and 14-nm illumination from a laser plasma source. This structure has been etched into a silicon wafer by using a trilevel resist and reactive ion etching. Low-contrast modulation at 0.05-microm lines and spaces is observed in polymethylmethacrylate.
Tichenor
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Kubiak
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Malinowski
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Stulen
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Haney
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Berger
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Brown
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Freeman
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Mansfield
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Wood Ii
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Tennant
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Bjorkholm
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Macdowell
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Bokor
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Jewell
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White
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Windt
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Waskiewicz
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