title: Annealing effect on the laser-induced damage resistance of ZrO(2) films in vacuum.
abstract: By modifying some structural characteristics, the annealing process can have considerable effects on the optical performance and laser-induced damage resistance of ZrO(2) thin films deposited by electron-beam deposition. Annealing at increased temperature gives rise to an increase of refractive index, the evolutions of packing density, and the structure order of the films due to the removal of adsorbed water in advance, material crystallization, and phase transformation. Thus, the combined effects of greatly strengthened endurance, crystal structure ordering, and stress transition after the annealing leads to an increase of the laser-induced damage threshold in a vacuum environment from 12 to 16 J/cm(2) (at 1064 nm, 12 ns pulse duration, and 1-on-1 testing mode).
authors.affiliation: Key Laboratory of High Power Laser Materials, Shanghai Institute of Opticsand Fine Mechanics, Shanghai 201800, China. nmlxlmiao@126.com
authors.forename: Xiulan
authors.initials: X
authors.lastname: Ling
authors.forename: Shuhong
authors.initials: S
authors.lastname: Li
authors.forename: Ming
authors.initials: M
authors.lastname: Zhou
authors.forename: Xiaofeng
authors.initials: X
authors.lastname: Liu
authors.forename: Yuanan
authors.initials: Y
authors.lastname: Zhao
authors.forename: Jianda
authors.initials: J
authors.lastname: Shao
authors.forename: Zhengxiu
authors.initials: Z
authors.lastname: Fan