Maskless photoencoded selective etching for glass-based microtechnology applications.
Two-photon excitation of carriers in boron E'-center-containing borosilicate glasses results in a photoencoding of selectively etchable regions. Using a turbulent etching process followed by polishing, we have demonstrated a number of patterning capabilities for microtechnology applications such as ultrafast capillary electrophoresis chips and rapid prototyping of diffractive optical elements.
J H
JH
Kyung
N M
NM
Lawandy