title: 193-nm excimer-laser-induced densification of fused silica.
abstract: We report the densification of fused silica as a function of exposure to pulsed 193-nm excimer-laser irradiation. Defining a dose as the number of pulses N times the square of fluence I per pulse, we find that densification follows a universal function of dose, a x (NI(2))(b), where a and b can vary somewhat according to glass preparation. Densification is measured with interferometry and birefringence, interpreted with a finiteelement elastic model. Wave-front distortion for a typical photolithographic lens element in typical use conditions is described.
authors.forename: D C
authors.initials: DC
authors.lastname: Allan
authors.forename: C
authors.initials: C
authors.lastname: Smith
authors.forename: N F
authors.initials: NF
authors.lastname: Borrelli
authors.forename: T P
authors.initials: TP
authors.lastname: Seward Iii