title: Au-PVA nanocomposite negative resist for one-step three-dimensional e-beam lithography.
abstract: Au nanoparticles are synthesized in situ upon the electron beam exposure of a poly(vinyl alcohol) (PVA) thin film containing Au(III). The e-beam-irradiated areas are insoluble in water (negative-tone resist), and Au-PVA nanocomposite patterns with a variable profile along the structure can be thus generated (3D lithography) in a single step. A local characterization of the generated patterns is performed by high-resolution transmission electron microscopy and UV-vis localized surface plasmon resonance microspectroscopy. This characterization confirms the presence of crystalline nanoparticles and aggregates.
authors.affiliation: Instituto de Ciencias de los Materiales, Universidad de Valencia, P.O. Box 22085, 46071 Valencia, Spain.
authors.forename: José
authors.initials: J
authors.lastname: Marqués-Hueso
authors.forename: Rafael
authors.initials: R
authors.lastname: Abargues
authors.forename: Josep
authors.initials: J
authors.lastname: Canet-Ferrer
authors.forename: Saïd
authors.initials: S
authors.lastname: Agouram
authors.forename: José Luís
authors.initials: JL
authors.lastname: Valdés
authors.forename: Juan P
authors.initials: JP
authors.lastname: Martínez-Pastor