Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography.
Here we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus fabricating arrays of hexagonally packed nanopores with tunable diameters, interspacing and aspect ratios. This technology is compatible with integration into a standard microtechnology sequence for wafer-scale fabrication of ultrathin silicon nitride nanoporous membranes with 80 nm mean pore diameter.
Popa
Ana-Maria
AM
Centre Suisse d'Electronique et de Microtechnique SA, Jaquet Droz 1, CH-2000 Neuchâtel, Switzerland. ana-maria.popa@empa.ch
Niedermann
Philippe
P
Heinzelmann
Harry
H
Hubbell
Jeffrey A
JA
Pugin
Raphaël
R