Au-PVA nanocomposite negative resist for one-step three-dimensional e-beam lithography.
Au nanoparticles are synthesized in situ upon the electron beam exposure of a poly(vinyl alcohol) (PVA) thin film containing Au(III). The e-beam-irradiated areas are insoluble in water (negative-tone resist), and Au-PVA nanocomposite patterns with a variable profile along the structure can be thus generated (3D lithography) in a single step. A local characterization of the generated patterns is performed by high-resolution transmission electron microscopy and UV-vis localized surface plasmon resonance microspectroscopy. This characterization confirms the presence of crystalline nanoparticles and aggregates.
Marqués-Hueso
José
J
Instituto de Ciencias de los Materiales, Universidad de Valencia, P.O. Box 22085, 46071 Valencia, Spain.
Abargues
Rafael
R
Canet-Ferrer
Josep
J
Agouram
Saïd
S
Valdés
José Luís
JL
Martínez-Pastor
Juan P
JP