Placement control of nanomaterial arrays on the surface-reconstructed block copolymer thin films.
We present a control strategy for the facile placement of densely packed nanomaterial arrays (i.e., nanoparticles and nanorods) on surface reconstructed polystyrene-block-poly(methyl methacrylate) thin film patterns. The surface reconstruction of perpendicularly oriented block copolymer thin films, which were produced by a treatment with selective solvent vapors for both blocks, created the topographical nanopatterns with enough height contrast for nanoparticle deposition without the need for additional selective etching of a single block domain. The deposition method of nanomaterials was also optimized, and densely packed one- and two-dimensional nanomaterials arrays in the grooves of the block copolymer film patterns were fabricated efficiently. Then, we demonstrated that height contrast of the surface reconstructed block copolymer films could be reversed by electron beam irradiation resulting in nanomaterial arrays placed at the mesa phase of the nanopatterns. On the basis of this nanomaterial placement control strategy, dual nanomaterial arrays on a single block copolymer pattern were also realized.
Son
Jeong Gon
JG
School of Chemical and Biological Engineering, Seoul National University, Seoul, 151-744, Korea.
Bae
Wan Ki
WK
Kang
Huiman
H
Nealey
Paul F
PF
Char
Kookheon
K
D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*; D013499:Surface Properties
D046911:Macromolecular Substances; D008567:Membranes, Artificial; D011137:Polystyrenes; D019904:Polymethyl Methacrylate