Atomic layer deposited (ALD) TiO(2) and TiO(2-x)-N(x) thin film photocatalysts in salicylic acid decomposition.
Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO(2)) and nitrogen-doped TiO(2) (TiO(2-x)-N(x)) combined with ultraviolet (UV) radiation was studied. TiO(2) film with thickness of 15 and 65 nm was tested. The TiO(2-x)-N(x) film had thickness of 15 nm on top of TiO(2) (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3-10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.
Vilhunen
S H
SH
Laboratory of Applied Environmental Chemistry, Department of Environmental Sciences, University of Kuopio, Patteristonkatu 1, FI-50100, Mikkeli, Finland. sari.vilhunen@uku.fi
Sillanpää
M E T
ME
D002384:Catalysis; D006863:Hydrogen-Ion Concentration; D009584:Nitrogen / Q000737:chemistry*; D055668:Photochemical Processes; D020156:Salicylic Acid / Q000737:chemistry*; D014025:Titanium / Q000737:chemistry*; D014466:Ultraviolet Rays; D014874:Water Pollutants, Chemical / Q000737:chemistry*; D018508:Water Purification
D014874:Water Pollutants, Chemical; C009495:titanium dioxide; D014025:Titanium; D009584:Nitrogen; D020156:Salicylic Acid