title: Magnetron sputtered nc-Al/alpha-Al2O3 nanocomposite thin films for nonvolatile memory application.
abstract: In this paper, we developed nc-Al/a-Al2O3 nanocomposite thin films using magnetron sputtering. The nc-Al/a-Al2O3 films were sputtered on p-type Si substrates from pure Al target in gas mixture of Ar and O2. X-ray photoelectron spectroscopy and high resolution transmission electron microscope studies confirm that the nanocrystalline Al are embedded in amorphous Al2O3 matrix thus nc-Al/ a-Al2O3 nanocomposite forms. This nanocomposite thin film exhibits memory effect as a result of charge trapping.
authors.affiliation: School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
authors.forename: Yibin
authors.initials: Y
authors.lastname: Li
authors.forename: Sam
authors.initials: S
authors.lastname: Zhang
authors.forename: Y
authors.initials: Y
authors.lastname: Liu
authors.forename: T P
authors.initials: TP
authors.lastname: Chen
authors.forename: Thirumany
authors.initials: T
authors.lastname: Sritharan
authors.forename: Cong
authors.initials: C
authors.lastname: Xu