title: Evaporative lithographic patterning of binary colloidal films.
abstract: Evaporative lithography offers a promising new route for patterning a broad array of soft materials. In this approach, a mask is placed above a drying film to create regions of free and hindered evaporation, which drive fluid convection and entrained particles to regions of highest evaporative flux. We show that binary colloidal films exhibit remarkable pattern formation when subjected to a periodic evaporative landscape during drying.
authors.affiliation: Department of Materials Science and Engineering and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.
authors.forename: Daniel J
authors.initials: DJ
authors.lastname: Harris
authors.forename: Jacinta C
authors.initials: JC
authors.lastname: Conrad
authors.forename: Jennifer A
authors.initials: JA
authors.lastname: Lewis
mesh_terms: D002516:Ceramics; D003102:Colloids / Q000737:chemistry*; D004247:DNA / Q000032:analysis; D004563:Electrochemistry; D008422:Materials Testing; D008962:Models, Theoretical; D036103:Nanotechnology; D013499:Surface Properties
chemical_list: D003102:Colloids; D004247:DNA