title: Synthesis and characterization of nanocrystalline Ti(1-x)Al(x)N by reactive magnetron sputtering.
abstract: Ti(1-x)Al(x)N metastable films were synthesized by reactive magnetron co-sputtering with different Ti to Al ratios. XRD studies showed that as-deposited films were crystalline for concentrations of Al (35, 40, 55 and 64%) and become amorphous at 81% Al. These films were annealed at 1073 K to study the phase separation. Films up to 55% Al did not show any phase separation after annealing. But films with 64% Al splits into c-TiAIN and c-AIN, whereas films with 81% Al split into cubic-TiN and hex-AIN. Distribution of crystallites and their size were analyzed by TEM. High density of crystallites with dimensions between 3-11 nm was dispersed in amorphous matrix for 64% Al films. Nanoindentation technique was used to determine the mechanical properties of these films without substrate effect. Maximum hardness obtained for as deposited and annealed films (64% Al) were 35 GPa and 38 GPa, respectively.
authors.affiliation: Materials and Metallurgy Group, Indira Gandhi Centre for Atomic Research, Kalpakkam 603102, TN, India.
authors.forename: Feby
authors.initials: F
authors.lastname: Jose
authors.forename: R
authors.initials: R
authors.lastname: Ramaseshan
authors.forename: S
authors.initials: S
authors.lastname: Dash
authors.forename: Arup
authors.initials: A
authors.lastname: Dasgupta
authors.forename: S
authors.initials: S
authors.lastname: Saroja
authors.forename: A K
authors.initials: AK
authors.lastname: Tyagi