title: Soft x-ray free electron laser microfocus for exploring matter under extreme conditions.
abstract: We have focused a beam (BL3) of FLASH (Free-electron LASer in Hamburg: lambda = 13.5 nm, pulse length 15 fs, pulse energy 10-40 microJ, 5 Hz) using a fine polished off-axis parabola having a focal length of 270 mm and coated with a Mo/Si multilayer with an initial reflectivity of 67% at 13.5 nm. The OAP was mounted and aligned with a picomotor controlled six-axis gimbal. Beam imprints on poly(methyl methacrylate) - PMMA were used to measure focus and the focused beam was used to create isochoric heating of various slab targets. Results show the focal spot has a diameter of < or =1 microm. Observations were correlated with simulations of best focus to provide further relevant information.
authors.affiliation: LawrenceLivermore National Laboratory, 7000 East Avenue, Livermore, CA 94550, USA. nelson63@llnl.gov
authors.forename: A J
authors.initials: AJ
authors.lastname: Nelson
authors.forename: S
authors.initials: S
authors.lastname: Toleikis
authors.forename: H
authors.initials: H
authors.lastname: Chapman
authors.forename: S
authors.initials: S
authors.lastname: Bajt
authors.forename: J
authors.initials: J
authors.lastname: Krzywinski
authors.forename: J
authors.initials: J
authors.lastname: Chalupsky
authors.forename: L
authors.initials: L
authors.lastname: Juha
authors.forename: J
authors.initials: J
authors.lastname: Cihelka
authors.forename: V
authors.initials: V
authors.lastname: Hajkova
authors.forename: L
authors.initials: L
authors.lastname: Vysin
authors.forename: T
authors.initials: T
authors.lastname: Burian
authors.forename: M
authors.initials: M
authors.lastname: Kozlova
authors.forename: R R
authors.initials: RR
authors.lastname: Fäustlin
authors.forename: B
authors.initials: B
authors.lastname: Nagler
authors.forename: S M
authors.initials: SM
authors.lastname: Vinko
authors.forename: T
authors.initials: T
authors.lastname: Whitcher
authors.forename: T
authors.initials: T
authors.lastname: Dzelzainis
authors.forename: O
authors.initials: O
authors.lastname: Renner
authors.forename: K
authors.initials: K
authors.lastname: Saksl
authors.forename: A R
authors.initials: AR
authors.lastname: Khorsand
authors.forename: P A
authors.initials: PA
authors.lastname: Heimann
authors.forename: R
authors.initials: R
authors.lastname: Sobierajski
authors.forename: D
authors.initials: D
authors.lastname: Klinger
authors.forename: M
authors.initials: M
authors.lastname: Jurek
authors.forename: J
authors.initials: J
authors.lastname: Pelka
authors.forename: B
authors.initials: B
authors.lastname: Iwan
authors.forename: J
authors.initials: J
authors.lastname: Andreasson
authors.forename: N
authors.initials: N
authors.lastname: Timneanu
authors.forename: M
authors.initials: M
authors.lastname: Fajardo
authors.forename: J S
authors.initials: JS
authors.lastname: Wark
authors.forename: D
authors.initials: D
authors.lastname: Riley
authors.forename: T
authors.initials: T
authors.lastname: Tschentscher
authors.forename: J
authors.initials: J
authors.lastname: Hajdu
authors.forename: R W
authors.initials: RW
authors.lastname: Lee
mesh_terms: D017076:Computer-Aided Design; D004583:Electrons; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007834:Lasers; D007909:Lenses; D008422:Materials Testing / Q000295:instrumentation* / Q000379:methods*; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity; D014961:X-Ray Diffraction / Q000295:instrumentation* / Q000379:methods*