Non-destructive depth compositional profiles by XPS peak-shape analysis.
The measured peak shape and intensity of the photoemitted signal in X-ray photoelectron spectroscopy (XPS) experiments (elastic and inelastic parts included) are strongly correlated, through electron-transport theory, with the depth distribution of photoelectron emitters within the analyzed surface. This is the basis of so-called XPS peak-shape analysis (also known as the Tougaard method) for non-destructive determination of compositional in-depth (up to 6-8 nm) profiles. This review describes the theoretical basis and reliability of this procedure for quantifying amounts and distributions of material within a surface. The possibilities of this kind of analysis are illustrated with several case examples related to the study of the initial steps of thin-film growth and the modifications induced in polymer surfaces after plasma treatments.
López-Santos
M C
MC
Instituto de Ciencia de Materiales de Sevilla, C/ Américo Vespucio 49, 41092 Sevilla, Spain.
Yubero
F
F
Espinós
J P
JP
González-Elipe
A R
AR