title: Non-destructive depth compositional profiles by XPS peak-shape analysis.
abstract: The measured peak shape and intensity of the photoemitted signal in X-ray photoelectron spectroscopy (XPS) experiments (elastic and inelastic parts included) are strongly correlated, through electron-transport theory, with the depth distribution of photoelectron emitters within the analyzed surface. This is the basis of so-called XPS peak-shape analysis (also known as the Tougaard method) for non-destructive determination of compositional in-depth (up to 6-8 nm) profiles. This review describes the theoretical basis and reliability of this procedure for quantifying amounts and distributions of material within a surface. The possibilities of this kind of analysis are illustrated with several case examples related to the study of the initial steps of thin-film growth and the modifications induced in polymer surfaces after plasma treatments.
authors: Instituto de Ciencia de Materiales de Sevilla, C/ Américo Vespucio 49, 41092 Sevilla, Spain.
authors: M C
authors: MC
authors: López-Santos
authors: F
authors: F
authors: Yubero
authors: J P
authors: JP
authors: Espinós
authors: A R
authors: AR
authors: González-Elipe