title: Manifold enhancement of electron beam induced deposition rate at grazing incidence.
abstract: It is shown how a significant drawback of the electron beam induced deposition technique, namely its low deposition rate, can be circumvented. By tilting a sample, a larger part of the primary electron beam energy becomes dissipated closer to the interface. This in turn increases the emission of secondary electrons, largely responsible for the deposition of the adsorbed molecule components on the surface. An order of magnitude increase in the deposition rate is reported in the fabrication of metal nanowires from organic precursor gas.
authors: Quantum Dot Research Center, National Institute for Materials Science, Tsukuba, Ibaraki, Japan.
authors: Ilya
authors: I
authors: Sychugov
authors: Yoshiko
authors: Y
authors: Nakayama
authors: Kazutaka
authors: K
authors: Mitsuishi
mesh_terms: D003460:Crystallization / Q000379:methods*; D004583:Electrons; D004595:Electroplating / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry / Q000528:radiation effects; D008422:Materials Testing; D008968:Molecular Conformation / Q000528:radiation effects; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects* / Q000648:ultrastructure; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D012542:Scattering, Radiation; D013499:Surface Properties / Q000528:radiation effects
chemical_list: D046911:Macromolecular Substances