Plasmonic nano lithography with a high scan speed contact probe.
We demonstrate plasmonic lithography with an optical contact probe to achieve high speed patterning without external gap distance control between the probe and the photoresist. The bottom surface of the probe is covered with a 10 nm thickness silica glass film for the gap distance control and coated with self-assembled monolayer (SAM) to reduce friction between the probe and the photoresist. We achieve a patterning resolution of ~50 nm and a patterning speed of ~10 mm/s. We obtain the quality of line patterning comparable to that in conventional optical lithography.
Kim
Yongwoo
Y
Nano Photonics Laboratory, School of Mechanical Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul, 120-749, Republic of Korea.
Kim
Seok
S
Jung
Howon
H
Lee
Eungman
E
Hahn
Jae W
JW
D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation*; D010781:Photography / Q000295:instrumentation*; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity; D020349:Surface Plasmon Resonance / Q000295:instrumentation*; D014159:Transducers