title: Subsurface damage measurement of ground fused silica parts by HF etching techniques.
abstract: Detection and measurement of subsurface damage of ground optical surfaces are of major concern in the assessment of high damage thresholds fused silica optics for high power laser applications. We herein detail a new principle of SSD measurement based on the utilization of HF acid etching. We also review and compare different subsurface damage (SSD) characterization techniques applied to ground and fine ground fused silica samples. We demonstrate good concordance between the different measurements.
authors.affiliation: CEA CESTA, F-33114, Le Barp, France. jerome.neauport@cea.fr
authors.forename: J
authors.initials: J
authors.lastname: Neauport
authors.forename: C
authors.initials: C
authors.lastname: Ambard
authors.forename: P
authors.initials: P
authors.lastname: Cormont
authors.forename: N
authors.initials: N
authors.lastname: Darbois
authors.forename: J
authors.initials: J
authors.lastname: Destribats
authors.forename: C
authors.initials: C
authors.lastname: Luitot
authors.forename: O
authors.initials: O
authors.lastname: Rondeau
mesh_terms: D006858:Hydrofluoric Acid / Q000737:chemistry*; D007834:Lasers; D008422:Materials Testing / Q000379:methods*; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D012822:Silicon Dioxide; D006858:Hydrofluoric Acid