One-shot deep-UV pulsed-laser-induced photomodification of hollow metal nanoparticles for high-density data storage on flexible substrates.
In this paper, we report a new optical data storage method: photomodification of hollow gold nanoparticle (HGN) monolayers induced by one-shot deep-ultraviolet (DUV) KrF laser recording. As far as we are aware, this study is the first to apply HGNs in optical data storage and also the first to use a recording light source for the metal nanoparticles (NPs) that is not a surface plasmon resonance (SPR) wavelength. The short wavelength of the recording DUV laser improved the optical resolution dramatically. We prepared HGNs exhibiting two absorbance regions: an SPR peak in the near-infrared (NIR) region and an intrinsic material extinction in the DUV region. A single pulse from a KrF laser heated the HGNs and transformed them from hollow structures to smaller solid spheres. This change in morphology for the HGNs was accompanied by a significant blue shift of the SPR peak. Employing this approach, we demonstrated its patterning ability with a resolving power of a half-micrometer (using a phase mask) and developed a readout method (using a blue-ray laser microscope). Moreover, we prepared large-area, uniform patterns of monolayer HGNs on various substrates (glass slides, silicon wafers, flexible plates). If this spectral recording technique could be applied onto thin flexible tapes, the recorded data density would increase significantly relative to that of current rigid discs (e.g., compact discs).
Wan
Dehui
D
Department of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan.
Chen
Hsuen-Li
HL
Tseng
Shao-Chin
SC
Wang
Lon A
LA
Chen
Yung-Pin
YP
D005898:Glass / Q000737:chemistry; D007834:Lasers; D053768:Metal Nanoparticles / Q000737:chemistry*; D008855:Microscopy, Electron, Scanning; D046529:Microscopy, Electron, Transmission; D055620:Optical Phenomena; D055668:Photochemical Processes; D012825:Silicon / Q000737:chemistry; D013057:Spectrum Analysis; D013696:Temperature; D014466:Ultraviolet Rays
D012825:Silicon