Grayscale photomask fabricated by laser direct writing in metallic nano-films.
The grayscale photomask plays a key role in grayscale lithography for creating 3D microstructures like micro-optical elements and MEMS structures, but how to fabricate grayscale masks in a cost-effective way is still a big challenge. Here we present novel low cost grayscale masks created in a two-step method by laser direct writing on Sn nano-films, which demonstrate continuous-tone gray levels depended on writing powers. The mechanism of the gray levels is due to the coexistence of the metal and the oxides formed in a laser-induced thermal process. The photomasks reveal good technical properties in fabricating 3D microstructures for practical applications.
Guo
Chuan Fei
CF
National Center for Nanoscience and Technology, China, No. 11Beiyitiao, Zhongguancun, Beijing100190, China.
Cao
Sihai
S
Jiang
Peng
P
Fang
Ying
Y
Zhang
Jianming
J
Fan
Yongtao
Y
Wang
Yongsheng
Y
Xu
Wendong
W
Zhao
Zhensheng
Z
Liu
Qian
Q
D007834:Lasers; D008567:Membranes, Artificial; D053768:Metal Nanoparticles / Q000737:chemistry / Q000528:radiation effects* / Q000648:ultrastructure; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D011829:Radiation Dosage; D013499:Surface Properties; D014001:Tin / Q000737:chemistry / Q000528:radiation effects*
D008567:Membranes, Artificial; D014001:Tin