title: Monolithic double-grating phase mask for large-period highly coherent grating printing.
abstract: A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k(1) and k(2) collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k(2)-k(1). When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings.
authors.affiliation: Université de Lyon, F-42023 Saint-Etienne, France.
authors.forename: Y
authors.initials: Y
authors.lastname: Bourgin
authors.forename: S
authors.initials: S
authors.lastname: Bakkali
authors.forename: Y
authors.initials: Y
authors.lastname: Jourlin
authors.forename: S
authors.initials: S
authors.lastname: Tonchev
authors.forename: O
authors.initials: O
authors.lastname: Parriaux