Ionic polishing of optical surfaces.
The controlled removal of material from the surface of insulators has been observed by using a positive ion beam. In the energy range 0.5-2.0 MeV the sputtering yield was observed to be unity. The application of this technique to the manufacture of high quality optical surfaces is discussed.
Schroeder
J B
JB
Research Department, The Perkin-Elmer Corporation, Norwalk, Connecticut, USA.
Bashkin
S
S
Nester
J F
JF