title: Maskless optical microscope lithography system.
abstract: A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns.
authors.affiliation: School of Electrical Engineering, Korea University, Seoul 136-701, Republic of Korea.
authors.forename: Eung Seok
authors.initials: ES
authors.lastname: Park
authors.forename: Doyoung
authors.initials: D
authors.lastname: Jang
authors.forename: Jaewoo
authors.initials: J
authors.lastname: Lee
authors.forename: Yun Jeong
authors.initials: YJ
authors.lastname: Kim
authors.forename: Junhong
authors.initials: J
authors.lastname: Na
authors.forename: Hyunjin
authors.initials: H
authors.lastname: Ji
authors.forename: Jae Wan
authors.initials: JW
authors.lastname: Choi
authors.forename: Gyu-Tae
authors.initials: GT
authors.lastname: Kim