title: Ionic polishing of optical surfaces.
abstract: The controlled removal of material from the surface of insulators has been observed by using a positive ion beam. In the energy range 0.5-2.0 MeV the sputtering yield was observed to be unity. The application of this technique to the manufacture of high quality optical surfaces is discussed.
authors.affiliation: Research Department, The Perkin-Elmer Corporation, Norwalk, Connecticut, USA.
authors.forename: J B
authors.initials: JB
authors.lastname: Schroeder
authors.forename: S
authors.initials: S
authors.lastname: Bashkin
authors.forename: J F
authors.initials: JF
authors.lastname: Nester