Maskless optical microscope lithography system.
A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns.
Park
Eung Seok
ES
School of Electrical Engineering, Korea University, Seoul 136-701, Republic of Korea.
Jang
Doyoung
D
Lee
Jaewoo
J
Kim
Yun Jeong
YJ
Na
Junhong
J
Ji
Hyunjin
H
Choi
Jae Wan
JW
Kim
Gyu-Tae
GT