Large-area maskless surface plasmon interference for one- and two-dimensional periodic nanoscale feature patterning.
A promising maskless surface-plasmon-interference nanoscale lithographic technique is proposed and demonstrated experimentally in this paper. One-dimensional (grating-type) and two-dimensional (pillar-type) nanocale features were patterned on the photoresist layer using a 364 nm illumination wavelength source with a single exposure, by employing a custom-made prism layer configuration. Large-area patterns of grating lines and pillars with feature size approximately 90 nm were realized experimentally using this configuration.
Sreekanth
K V
KV
School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
Murukeshan
V M
VM