title: High-aspect-ratio imageable top-surface lithography using UV-assisted inkless contact printing.
authors.affiliation: Minuta Tech. Co., Ltd. R&D Center Seongnam, Gyeonggi-Do 513-15, Korea. saltchoi@snu.ac.kr
authors.forename: Se-Jin
authors.initials: SJ
authors.lastname: Choi
authors.forename: Jeong-Yong
authors.initials: JY
authors.lastname: Park
mesh_terms: D007281:Ink; D049329:Nanostructures / Q000737:chemistry / Q000648:ultrastructure; D036103:Nanotechnology / Q000379:methods*; D011327:Printing / Q000379:methods*; D017550:Spectroscopy, Fourier Transform Infrared; D013499:Surface Properties / Q000528:radiation effects; D013997:Time Factors; D014466:Ultraviolet Rays