title: Characterization of SiGe films for use as a National Institute of Standards and Technology Microanalysis Reference Material (RM 8905).
abstract: Bulk silicon-germanium (SiGe) alloys and two SiGe thick films (4 and 5 microm) on Si wafers were tested with the electron probe microanalyzer (EPMA) using wavelength dispersive spectrometers (WDS) for heterogeneity and composition for use as reference materials needed by the microelectronics industry. One alloy with a nominal composition of Si0.86Ge0.14 and the two thick films with nominal compositions of Si0.90Ge0.10 and Si0.75Ge0.25 on Si, evaluated for micro- and macroheterogeneity, will make good microanalysis reference materials with an overall expanded heterogeneity uncertainty of 1.1% relative or less for Ge. The bulk Ge composition in the Si0.86Ge0.14 alloy was determined to be 30.228% mass fraction Ge with an expanded uncertainty of the mean of 0.195% mass fraction. The thick films were quantified with WDS-EPMA using both the Si0.86Ge0.14 alloy and element wafers as reference materials. The Ge concentration was determined to be 22.80% mass fraction with an expanded uncertainty of the mean of 0.12% mass fraction for the Si0.90Ge0.10 wafer and 43.66% mass fraction for the Si0.75Ge0.25 wafer with an expanded uncertainty of the mean of 0.25% mass fraction. The two thick SiGe films will be issued as National Institute of Standards and Technology Reference Materials (RM 8905).
authors.affiliation: Surface and Microanalysis Science Division, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899, USA. ryna.marinenko@nist.gov
authors.forename: Ryna B
authors.initials: RB
authors.lastname: Marinenko
authors.forename: Shirley
authors.initials: S
authors.lastname: Turner
authors.forename: David S
authors.initials: DS
authors.lastname: Simons
authors.forename: Savelas A
authors.initials: SA
authors.lastname: Rabb
authors.forename: Rolf L
authors.initials: RL
authors.lastname: Zeisler
authors.forename: Lee L
authors.initials: LL
authors.lastname: Yu
authors.forename: Dale E
authors.initials: DE
authors.lastname: Newbury
authors.forename: Rick L
authors.initials: RL
authors.lastname: Paul
authors.forename: Nicholas W M
authors.initials: NW
authors.lastname: Ritchie
authors.forename: Stefan D
authors.initials: SD
authors.lastname: Leigh
authors.forename: Michael R
authors.initials: MR
authors.lastname: Winchester
authors.forename: Lee J
authors.initials: LJ
authors.lastname: Richter
authors.forename: Douglas C
authors.initials: DC
authors.lastname: Meier
authors.forename: Keana C K
authors.initials: KC
authors.lastname: Scott
authors.forename: Donna
authors.initials: D
authors.lastname: Klinedinst
authors.forename: John A
authors.initials: JA
authors.lastname: Small