Infrared transmission polarizers by photolithography.
The design of a grid polarizer is discussed and the effect of supporting it on various substrates is evaluated using a transmission line analogy. A method of making such a grid polarizer by photolithographic techniques is described, and measurements on a device suitable for use at wavelengths between 20 micro and several hundred microns are presented. Their performance compares favorably with polarizers made by other methods.
Auton
J P
JP
The Marconi Company Ltd., Great Baddow Laboratories, C'helmsford, Essex, England.