title: Multiscale carbon structures fabricated by direct micropatterning of electrospun mats of SU-8 photoresist nanofibers.
abstract: A novel method for the direct fabrication of arrays of micropatterned polymeric and carbon nanofiber structures on any substrate is developed. First SU-8, an epoxy-based negative photoresist, is electrospun under optimized conditions to produce a layer of polymeric nanofibers. Next, this nanofibrous mat is micropatterned using photolithography, and finally, pyrolysis produces ordered arrays of microdomains containing carbon nanofibers. The nanotextured surfaces of carbon nanofibers are shown to be very hydrophobic (water contact angle approximately 130 degrees). Micropatterning thus generates a substantial wettability contrast of nanofiber domains with intervening micropatches of very hydrophilic carbon (approximately 20 degrees) or silicon substrates.
authors.affiliation: Department of Chemical Engineering and DST Unit on Nanosciences, Indian Institute of Technology, Kanpur-208016, UP, India.
authors.forename: Chandra S
authors.initials: CS
authors.lastname: Sharma
authors.forename: Ashutosh
authors.initials: A
authors.lastname: Sharma
authors.forename: Marc
authors.initials: M
authors.lastname: Madou
mesh_terms: D004852:Epoxy Compounds / Q000138:chemical synthesis / Q000737:chemistry*; D057927:Hydrophobic and Hydrophilic Interactions; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry; D037742:Nanotubes, Carbon / Q000737:chemistry*; D010316:Particle Size; D011108:Polymers / Q000138:chemical synthesis / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry; D013499:Surface Properties; D014466:Ultraviolet Rays; D017155:Wettability
chemical_list: D004852:Epoxy Compounds; D037742:Nanotubes, Carbon; D011108:Polymers; C520895:SU-8 compound; D012825:Silicon