title: Direct photolithographic patterning of electrospun films for defined nanofibrillar microarchitectures.
abstract: In this letter, a method of generating spatially defined electrospun microarchitectures by direct photolithographic patterning of electrospun films is described. A photoinitiator, benzoin methyl ether, is incorporated into a solid thermoplastic electrospun polyurethane matrix selectively photo-cross-linked by standard photolithographic methods. Subsequent development in an organic solvent yields spatially defined electrospun microstructures on a single substrate. Utilizing a multilayer approach, the method allows for the assembly of complex hierarchical electrospun structures on single substrates using methods analogous to the conventional microfabrication of solid-state devices.
authors.affiliation: Department of Microtechnology and Nanoscience (MC2), Chalmers University of Technology, Göteborg SE-412 96, Sweden.
authors.forename: Björn
authors.initials: B
authors.lastname: Carlberg
authors.forename: Teng
authors.initials: T
authors.lastname: Wang
authors.forename: Johan
authors.initials: J
authors.lastname: Liu
mesh_terms: D015374:Biosensing Techniques / Q000379:methods*; D020099:Coated Materials, Biocompatible / Q000737:chemistry*; D008567:Membranes, Artificial; D043942:Nanotubes / Q000737:chemistry*; D010316:Particle Size; D010777:Photochemistry; D011140:Polyurethanes / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D020099:Coated Materials, Biocompatible; D008567:Membranes, Artificial; D011140:Polyurethanes