title: Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology.
abstract: Fabrication of periodic nanodot or nanocolumn arrays on surfaces is performed by top-down lithographic procedures or bottom-up self-assembly methods, which both make use of plasma etching to transfer the periodic pattern. Could plasma etching alone act as an assembly--organization method to create the pattern and then transfer it to the substrate? We present data that support this idea and propose a mechanism of periodicity formation where etching and simultaneous deposition take place.
authors.affiliation: Institute of Microelectronics, NCSR Demokritos, Aghia Paraskevi, Attiki 15310, Greece.
authors.forename: N
authors.initials: N
authors.lastname: Vourdas
authors.forename: D
authors.initials: D
authors.lastname: Kontziampasis
authors.forename: G
authors.initials: G
authors.lastname: Kokkoris
authors.forename: V
authors.initials: V
authors.lastname: Constantoudis
authors.forename: A
authors.initials: A
authors.lastname: Goodyear
authors.forename: A
authors.initials: A
authors.lastname: Tserepi
authors.forename: M
authors.initials: M
authors.lastname: Cooke
authors.forename: E
authors.initials: E
authors.lastname: Gogolides