Model of negative working photoresists as continuous tone photographic materials.
A four-parameter model is presented that describes the relief height response of negative working photoresists. It is shown that the resist thickness after development is directly proportional to the logarithm of the exposure over a wide range of exposures. A relationship between this thickness and exposure is derived and shown to predict resist response. Resists can usefully record exposures that vary by a factor of 10 million making them ideal materials for recording wide dynamic ranges. Several applications using these unique properties are presented.
Kirk
J P
JP
Fillmore
G L
GL