Step-and-repeat process for thermal nanoimprint lithography.
We present a step-and-repeat process for thermal nanoimprint lithography. For the selective heating and imprinting, a spin-coated polystyrene layer is exposed to infra-red rays from a halogen lamp (intensity approximately 500 W) with a metal-covered glass while pressed with a transparent polymer mold (Young's modulus approximately 300 MPa) under a pressure of approximately 4 bar for 60-120 s. During imprinting, the non-irradiated region is protected by a metal screen and a heat sink consisting of a copper block at the bottom which prevents the pattern collapse by lateral heat conduction from the irradiated region.
Yoon
Hyunsik
H
School of Chemical and Biological Engineering, The WCU Program of Chemical Convergence for Energy and Environment, Seoul National University, Seoul 151-744, Korea.
Cho
Hye Sung
HS
Suh
Kahp Y
KY
Char
Kookheon
K
D007259:Infrared Rays; D008567:Membranes, Artificial; D008855:Microscopy, Electron, Scanning; D008962:Models, Theoretical; D036103:Nanotechnology / Q000379:methods*; D011108:Polymers / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*; D011327:Printing / Q000379:methods*; D013696:Temperature
D008567:Membranes, Artificial; D011108:Polymers; D011137:Polystyrenes