Step-and-repeat process for thermal nanoimprint lithography.
We present a step-and-repeat process for thermal nanoimprint lithography. For the selective heating and imprinting, a spin-coated polystyrene layer is exposed to infra-red rays from a halogen lamp (intensity approximately 500 W) with a metal-covered glass while pressed with a transparent polymer mold (Young's modulus approximately 300 MPa) under a pressure of approximately 4 bar for 60-120 s. During imprinting, the non-irradiated region is protected by a metal screen and a heat sink consisting of a copper block at the bottom which prevents the pattern collapse by lateral heat conduction from the irradiated region.
School of Chemical and Biological Engineering, The WCU Program of Chemical Convergence for Energy and Environment, Seoul National University, Seoul 151-744, Korea.
Hyunsik
H
Yoon
Hye Sung
HS
Cho
Kahp Y
KY
Suh
Kookheon
K
Char
D007259:Infrared Rays; D008567:Membranes, Artificial; D008855:Microscopy, Electron, Scanning; D008962:Models, Theoretical; D036103:Nanotechnology / Q000379:methods*; D011108:Polymers / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*; D011327:Printing / Q000379:methods*; D013696:Temperature
D008567:Membranes, Artificial; D011108:Polymers; D011137:Polystyrenes