title: Evaluation of the soft x-ray reflectivity of micropore optics using anisotropic wet etching of silicon wafers.
abstract: The x-ray reflectivity of an ultralightweight and low-cost x-ray optic using anisotropic wet etching of Si (110) wafers is evaluated at two energies, C K(alpha)0.28 keV and Al K(alpha)1.49 keV. The obtained reflectivities at both energies are not represented by a simple planar mirror model considering surface roughness. Hence, an geometrical occultation effect due to step structures upon the etched mirror surface is taken into account. Then, the reflectivities are represented by the theoretical model. The estimated surface roughness at C K(alpha) (approximately 6 nm rms) is significantly larger than approximately 1 nm at Al K(alpha). This can be explained by different coherent lengths at two energies.
authors.affiliation: Department of High Energy Astrophysics, Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency, 3-1-1 Yoshinodai, Sagamihara, Kanagawa 229-8510, Japan. mitsuisi@astro.isas.jaxa.jp
authors.forename: Ikuyuki
authors.initials: I
authors.lastname: Mitsuishi
authors.forename: Yuichiro
authors.initials: Y
authors.lastname: Ezoe
authors.forename: Masaki
authors.initials: M
authors.lastname: Koshiishi
authors.forename: Makoto
authors.initials: M
authors.lastname: Mita
authors.forename: Yoshitomo
authors.initials: Y
authors.lastname: Maeda
authors.forename: Noriko Y
authors.initials: NY
authors.lastname: Yamasaki
authors.forename: Kazuhisa
authors.initials: K
authors.lastname: Mitsuda
authors.forename: Takayuki
authors.initials: T
authors.lastname: Shirata
authors.forename: Takayuki
authors.initials: T
authors.lastname: Hayashi
authors.forename: Takayuki
authors.initials: T
authors.lastname: Takano
authors.forename: Ryutaro
authors.initials: R
authors.lastname: Maeda