title: Gas phase controlled deposition of high quality large-area graphene films.
abstract: A gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 degrees C.
authors.affiliation: Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Dublin 2, Ireland.
authors.forename: Shishir
authors.initials: S
authors.lastname: Kumar
authors.forename: Niall
authors.initials: N
authors.lastname: McEvoy
authors.forename: Tarek
authors.initials: T
authors.lastname: Lutz
authors.forename: Gareth P
authors.initials: GP
authors.lastname: Keeley
authors.forename: Valeria
authors.initials: V
authors.lastname: Nicolosi
authors.forename: Chris P
authors.initials: CP
authors.lastname: Murray
authors.forename: Werner J
authors.initials: WJ
authors.lastname: Blau
authors.forename: Georg S
authors.initials: GS
authors.lastname: Duesberg