A low-temperature-grown TiO2-based device for the flexible stacked RRAM application.
Flexible TiO(2) crossbar memory device arrays were fabricated on plastic substrates using amorphous titanium oxide thin films grown by the low-temperature plasma-enhanced atomic layer deposition method. Al/ TiO(2)/Al memory cells on polyethersulfone (PES) showed an enhanced endurance property (up to 10(4) cycles) and low switching voltages compared to the cells on rigid substrates. The multi-stacked memory arrays were constructed by forming the additional Al/ TiO(2)/Al layer on the first memory device layer. Memory cells on each layer exhibited stable switching characteristics and mechanical robustness without interlayer cell-to-cell interference.
Jeong
Hu Young
HY
Department of Materials Science and Engineering, KAIST, Daejeon, Korea.
Kim
Yong In
YI
Lee
Jeong Yong
JY
Choi
Sung-Yool
SY