Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist.
The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 A +/- 5 A/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.
Livanos
A C
AC
Katzir
A
A
Shellan
J B
JB
Yariv
A
A