title: Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist.
abstract: The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 A +/- 5 A/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.
authors.forename: A C
authors.initials: AC
authors.lastname: Livanos
authors.forename: A
authors.initials: A
authors.lastname: Katzir
authors.forename: J B
authors.initials: JB
authors.lastname: Shellan
authors.forename: A
authors.initials: A
authors.lastname: Yariv