Binary phase digital reflection holograms: fabrication and potential applications.
A novel technique for the fabrication of binary-phase computer-generated reflection holograms is described. By use of integrated circuit technology, the holographic pattern is etched into a silicon wafer and then aluminum coated to make a reflection hologram. Because these holograms reflect virtually all the incident radiation, they may find application in machining with high-power lasers. A number of possible modifications of the hologram fabrication procedure are discussed.
Gallagher
N C
NC
Angus
J C
JC
Coffield
F E
FE
Edwards
R V
RV
Mann
J A
JA