title: Binary phase digital reflection holograms: fabrication and potential applications.
abstract: A novel technique for the fabrication of binary-phase computer-generated reflection holograms is described. By use of integrated circuit technology, the holographic pattern is etched into a silicon wafer and then aluminum coated to make a reflection hologram. Because these holograms reflect virtually all the incident radiation, they may find application in machining with high-power lasers. A number of possible modifications of the hologram fabrication procedure are discussed.
authors.forename: N C
authors.initials: NC
authors.lastname: Gallagher
authors.forename: J C
authors.initials: JC
authors.lastname: Angus
authors.forename: F E
authors.initials: FE
authors.lastname: Coffield
authors.forename: R V
authors.initials: RV
authors.lastname: Edwards
authors.forename: J A
authors.initials: JA
authors.lastname: Mann