Simulation of parameter scaling in electron cyclotron resonance ion source plasmas using the GEM code.
Although heating power and gas pressure are two of the two of primary experimental "knobs" available to users of electron cyclotron resonance ion sources, there is still no clear understanding of how they interact in order to provide optimal plasma conditions. FAR-TECH, Inc. has performed a series of simulations with its generalized electron cyclotron resonance ion source model in which the power and pressure were varied over a wide range. Analysis of the numerical data produces scaling laws that predict the plasma parameters as a function of the power and pressure. These scaling laws are in general agreement with experimental data.
Cluggish
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FAR-TECH, Inc., 3550 General Atomics Court, MS 15-155, San Diego, California 92121, USA. cluggish@far-tech.com
Zhao
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Kim
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