Production of electron cyclotron resonance plasma by using multifrequencies microwaves and active beam profile control on a large bore electron cyclotron resonance ion source with permanent magnets.
A new concept on magnetic field with all magnets on plasma production and confinement has been proposed to enhance efficiency of an electron cyclotron resonance (ECR) plasma for broad and dense ion beam source under the low pressure. The magnetic field configuration is constructed by a pair of magnets assembly, i.e., comb-shaped magnet which cylindrically surrounds the plasma chamber. The resonance zones corresponding to the fundamental ECR for 2.45 GHz and 11-13 GHz frequencies are constructed at different positions. The profiles of the plasma parameters in the ECR ion source are different from each frequency of microwave. Large bore extractor is set at the opposite side against the microwave feeds. It is found that differences of their profiles also appear at those of ion beam profiles. We conducted to launch simultaneously multiplex frequencies microwaves controlled individually, and tried to control the profiles of the plasma parameters and then those of extracted ion beam.
Kato
Yushi
Y
Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan. kato@eei.eng.osaka-u.ac.jp
Watanabe
Takeyoshi
T
Matsui
Yuuki
Y
Hirai
Yoshiaki
Y
Kutsumi
Osamu
O
Sakamoto
Naoki
N
Sato
Fuminobu
F
Iida
Toshiyuki
T