title: Robust block copolymer mask for nanopatterning polymer films.
abstract: The formation of well-oriented cylinders with perpendicular morphology for polystyrene-b-polydimethylsiloxane (PS-PDMS) thin films was achieved by spin coating. The self-assembled PS-PDMS nanostructured thin films were used as templates for nanopatterning; the PDMS blocks can be oxidized as silicon oxy carbide microdomains, whereas the PS blocks were degenerated by a simple oxygen plasma treatment for one-step oxidization. As a result, freestanding silicon oxy carbide thin films with hexagonally packed nanochannels were directly fabricated and used as masks for pattern transfer to underlying polymeric materials by oxygen reaction ion etching (RIE) to generate topographic nanopatterns. By taking advantage of robust property and high etching selectivity of the SiOC thin films under oxygen RIE, this nanoporous thin film can be used as an etch-resistant and reusable mask for pattern transfer to various polymeric materials. This approach demonstrates a simple, convenient, and cost-effective nanofabrication technique to create the topographic nanopatterns of polymeric materials.
authors.affiliation: Institute of Nanoengineering and Microsystems, National Tsing Hua University, Hsinchu 30013, Taiwan, R.O.C.
authors.forename: Chia-Cheng
authors.initials: CC
authors.lastname: Chao
authors.forename: Tzu-Chung
authors.initials: TC
authors.lastname: Wang
authors.forename: Rong-Ming
authors.initials: RM
authors.lastname: Ho
authors.forename: Prokopios
authors.initials: P
authors.lastname: Georgopanos
authors.forename: Apostolos
authors.initials: A
authors.lastname: Avgeropoulos
authors.forename: Edwin L
authors.initials: EL
authors.lastname: Thomas