The study of helicon plasma source.
Helicon plasma source is known as efficient generator of uniform and high density plasma. A helicon plasma source was developed for investigation of plasma neutralization and plasma lens in the Institute of Modern Physics in China. In this paper, the characteristics of helicon plasma have been studied by using Langmuir four-probe and a high argon plasma density up to 3.9x10(13) cm(-3) have been achieved with the Nagoya type III antenna at the conditions of the magnetic intensity of 200 G, working gas pressure of 2.8x10(-3) Pa, and rf power of 1200 W with a frequency of 27.12 MHz. In the experiment, the important phenomena have been found: for a given magnetic induction intensity, the plasma density became greater with the increase in rf power and tended to saturation, and the helicon mode appeared at the rf power between 200 and 400 W.
Miao
Ting-Ting
TT
Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, People's Republic of China.
Zhao
Hong-Wei
HW
Liu
Zhan-Wen
ZW
Shang
Yong
Y
Sun
Liang-Ting
LT
Zhang
Xue-Zhen
XZ
Zhao
Huan-Yu
HY