A self-sputtering ion source: a new approach to quiescent metal ion beams.
A new metal ion source is presented based on sustained self-sputtering plasma in a magnetron discharge. Metals exhibiting high self-sputtering yield such as Cu, Ag, Zn, and Bi can be used in a high-power impulse magnetron sputtering discharge such that the plasma almost exclusively contains singly charged metal ions of the target material. The plasma and extracted ion beam are quiescent. The ion beams consist mostly of singly charged ions with a space-charge limited current density which reached about 10 mA/cm(2) at an extraction voltage of 45 kV and a first gap spacing of 12 mm.
Oks
Efim
E
High Current Electronics Institute, Russian Academy of Sciences, 2/3 Academichesky Ave., Tomsk 634055, Russia.
Anders
André
A