title: Gamma model and its analysis for phase measuring profilometry.
abstract: Phase measuring profilometry is a method of structured light illumination whose three-dimensional reconstructions are susceptible to error from nonunitary gamma in the associated optical devices. While the effects of this distortion diminish with an increasing number of employed phase-shifted patterns, gamma distortion may be unavoidable in real-time systems where the number of projected patterns is limited by the presence of target motion. A mathematical model is developed for predicting the effects of nonunitary gamma on phase measuring profilometry, while also introducing an accurate gamma calibration method and two strategies for minimizing gamma's effect on phase determination. These phase correction strategies include phase corrections with and without gamma calibration. With the reduction in noise, for three-step phase measuring profilometry, analysis of the root mean squared error of the corrected phase will show a 60x reduction in phase error when the proposed gamma calibration is performed versus 33x reduction without calibration.
authors.affiliation: Electrical and Computer Engineering, University of Kentucky, Lexington, Kentucky 40506, USA. kai.liu@uky.edu
authors.forename: Kai
authors.initials: K
authors.lastname: Liu
authors.forename: Yongchang
authors.initials: Y
authors.lastname: Wang
authors.forename: Daniel L
authors.initials: DL
authors.lastname: Lau
authors.forename: Qi
authors.initials: Q
authors.lastname: Hao
authors.forename: Laurence G
authors.initials: LG
authors.lastname: Hassebrook