title: On the existence of negative excess isotherms for argon adsorption on graphite surfaces and in graphitic pores under supercritical conditions at pressures up to 10,000 atm.
abstract: In this paper, we consider in detail the computer simulation of argon adsorption on a graphite surface and inside graphitic slit pores under supercritical conditions. Experimental results in the literature for graphitic adsorbents show that excess isotherms pass through a maximum and then become negative at high pressures (even for adsorption on open surfaces) when a helium void volume is used in the calculation of the excess amount. Here we show that, by using the appropriate accessible volume (which is smaller than the helium void volume), the excess isotherms still have a maximum but are always positive. The existence and the magnitude of this maximum is because the rate of change of the adsorbed density is equal to that of the bulk gas, which has a large change in bulk gas density for a small variation in pressure for temperatures not far above the critical point. However for temperatures far above T(c), this change in the bulk gas density is no longer significant and the maximum in the surface excess density becomes less pronounced and even disappears at high enough temperatures. The positivity of the adsorption excess persists for all pressures up to 10,000 atm for adsorption on surfaces and in slit pores of all sizes. For adsorption on a surface, the surface excess density eventually reaches a plateau at high pressures as expected, because the change in the adsorbed phase is comparable to that of the bulk gas. Positive excess lends support to our physical argument that the adsorbed phase is denser than the bulk gas, and this is logical as the forces exerted by the pore walls should aid to the compression of the adsorbed phase.
authors.affiliation: School of Chemical Engineering, University of Queensland, St. Lucia, Qld 4072, Australia. d.d.do@uq.edu.au
authors.forename: D D
authors.initials: DD
authors.lastname: Do
authors.forename: H D
authors.initials: HD
authors.lastname: Do
authors.forename: Chunyan
authors.initials: C
authors.lastname: Fan
authors.forename: D
authors.initials: D
authors.lastname: Nicholson