title: Radio frequency ion source operated with field effect transistor based radio frequency system.
abstract: Characteristics of radio frequency (RF) plasma production are investigated using a field effect transistor inverter power supply as an RF wave source. With the frequency of around 0.3 MHz, an electron density over 10(18) m(-3) is produced in argon plasma. Although lower densities are obtained in hydrogen plasma, it drastically increased up to 5x10(18) m(-3) with an axial magnetic field of around 100 G applied in the driver region. Effects of the magnetic field and gas pressure are investigated in the RF produced plasma with the frequency of several hundred kilohertz.
authors.affiliation: Department of Electrical Engineering, Tohoku University, Sendai 980-8759, Japan. akira@ecei.tohoku.ac.jp
authors.forename: A
authors.initials: A
authors.lastname: Ando
authors.forename: A
authors.initials: A
authors.lastname: Komuro
authors.forename: T
authors.initials: T
authors.lastname: Matsuno
authors.forename: K
authors.initials: K
authors.lastname: Tsumori
authors.forename: Y
authors.initials: Y
authors.lastname: Takeiri