Radio frequency ion source operated with field effect transistor based radio frequency system.
Characteristics of radio frequency (RF) plasma production are investigated using a field effect transistor inverter power supply as an RF wave source. With the frequency of around 0.3 MHz, an electron density over 10(18) m(-3) is produced in argon plasma. Although lower densities are obtained in hydrogen plasma, it drastically increased up to 5x10(18) m(-3) with an axial magnetic field of around 100 G applied in the driver region. Effects of the magnetic field and gas pressure are investigated in the RF produced plasma with the frequency of several hundred kilohertz.
Ando
A
A
Department of Electrical Engineering, Tohoku University, Sendai 980-8759, Japan. akira@ecei.tohoku.ac.jp
Komuro
A
A
Matsuno
T
T
Tsumori
K
K
Takeiri
Y
Y