Normal emission photoelectron diffraction studies at Stanford Synchrotron Radiation Laboratory.
A series of experiments designed to characterize the surface structural sensitivity of photoelectron diffraction (PhD) is described. The technique's relation to low energy electron diffraction and to surface extended x-ray absorption fine structure (SEXAFS) is explored, and useful comparisons with the latter are pointed out. The application of normal emission photoelectron diffraction to disordered overlayers is shown to be reasonably straightforward. Data on both 2-D and 3-D (multiple-site) disordered overlayers are presented. The localized atom-specific nature of PhD is shown to lend the technique real potential in the study of molecular adsorbate systems.
Kevan
S D
SD