Oxygen distribution in nickel silicide films analyzed by time-of-flight secondary ion mass spectrometry.
Kobayashi
Kiyoteru
K
Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan. kkbys@keyaki.cc.u-tokai.ac.jp
Watanabe
Hiroaki
H
Maekawa
Kazuyoshi
K
Kashihara
Keiichiro
K
Yamaguchi
Tadashi
T
Asai
Koyu
K
Hirose
Yukinori
Y