title: Oxygen distribution in nickel silicide films analyzed by time-of-flight secondary ion mass spectrometry.
authors.affiliation: Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan. kkbys@keyaki.cc.u-tokai.ac.jp
authors.forename: Kiyoteru
authors.initials: K
authors.lastname: Kobayashi
authors.forename: Hiroaki
authors.initials: H
authors.lastname: Watanabe
authors.forename: Kazuyoshi
authors.initials: K
authors.lastname: Maekawa
authors.forename: Keiichiro
authors.initials: K
authors.lastname: Kashihara
authors.forename: Tadashi
authors.initials: T
authors.lastname: Yamaguchi
authors.forename: Koyu
authors.initials: K
authors.lastname: Asai
authors.forename: Yukinori
authors.initials: Y
authors.lastname: Hirose