title: Application of angle-resolved X-ray photon electron spectroscopy for interface and layer growth studies demonstrated on Ti/Ta-based films deposited on SiO2.
authors.affiliation: IFW Dresden, Postfach 270116, 01171 Dresden, Germany. s.oswald@ifw-dresden.de
authors.forename: S
authors.initials: S
authors.lastname: Oswald
authors.forename: F
authors.initials: F
authors.lastname: Oswald